Special Issue "Physical Vapor Deposition"
A special issue of Coatings (ISSN 2079-6412).
Deadline for manuscript submissions: 30 September 2020.
Interests: sputter deposition; Industrial-scale sputtering; PVD coatings; surface enginering; pulsed DC sputtering; HiPIMS; HPPMS; oxides; nitrides; carbides; DLC; tribology; ion-beam assisted deposition (IBAD); ion implantation; photocatalysis; X-ray diffraction (XRD, XRR, pole figures); electron microscopy (SEM, TEM); Rutherford backscattering; EDX
Physical vapor deposition (PVD) is a vacuum deposition method of producing thin films and coatings. In a PVD process, the source material is changed from the solid phase to the vapor phase and then is deposited on a substrate surface, by returning to a condensed phase. The most common PVD processes are evaporation and sputtering with the assistance of various of techniques. PVD technology is applied in applications that require thin films or coatings for mechanical, physical, chemical, optical, and electronic functions. PVD technology is developing with advances in theory and technique, and providing extensive opportunities for advanced thin films and coatings in an expanding area of applications. This Special Issue of Coatings on "Physics Vapor Deposition" is open to all original research and critical reviews on the latest advances on all aspects of PVD.
In particular, the topics of interest include, but are not limited to:
- PVD physics and modeling
- PVD processes, technoques, and equipment
- PVD coating characterization
- PVD coating properties, behaviors, and performances
- PVD coating applications
Dr. Klaus Pagh Almtoft
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
The below list represents only planned manuscripts. Some of these manuscripts have not been received by the Editorial Office yet. Papers submitted to MDPI journals are subject to peer-review.
Title: Effects of Nitrogen Flow Ratio on Structures, Bonding Characteristics, and Mechanical Properties of ZrNx Films
Authors: Yi-En Ke and Yung-I Chen
Affiliation: 1 Institute of Materials Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan 2 Department of Optoelectronics and Materials Technology, National Taiwan Ocean University, Keelung 20224, Taiwan 3 Center of Excellence for Ocean Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan
Abstract: ZrNx (x = 0.92–1.38) films were fabricated through direct current magnetron sputtering by varying nitrogen flow ratio [N2/(Ar + N2)] ranging from 0.5 to 1.0. The structural variation, bonding characteristics, and mechanical properties of the ZrNx films were investigated. The results indicated that the structure of the films prepared using a nitrogen flow ratio of 0.5 exhibited crystalline ZrN and o-Zr3N4 phases. The phase gradually changed to o-Zr3N4 dominant as further increasing the N2 flow ratio. Finally, only a nanocrystalline o-Zr3N4 phase was observed as the N2 flow ratio was set above 0.85. The bonding characterictics of the ZrNx films comprised Zr–N bonds of ZrN and Zr3N4 compounds examined by X-ray photoelectron spectroscopy were well correlated with the structural variation. The nanoindentation hardness and Young’s modulus levels of the ZrNx films exhibited insignificant variations ranging from 16.8 to 17.7 GPa and from 190 to 211 GPa, respectively.