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Editorial

Acknowledgement to Reviewers of Appl. Syst. Innov. in Volume 2, 2019

by
Appl. Syst. Innov. Editorial Office
MDPI, St. Alban-Anlage 66, 4052 Basel, Switzerland
Appl. Syst. Innov. 2020, 3(1), 9; https://doi.org/10.3390/asi3010009
Published: 20 January 2020

Graphical Abstract

Rigorous peer-review is the corner-stone of high-quality academic publishing. The editorial team greatly appreciates the reviewers who contributed their knowledge and expertise to the journal’s editorial process over the past 12 months. In Volume 2 of 2019, a total of 37 papers were published in the journal, with a median time to first decision of 15.5 days and a median time to publication of 35.5 days. The editors would like to express their sincere gratitude to the following reviewers for their cooperation and dedication in 2019:
Abayomi OtebolakuKwok Tai Chui
Abdullah M. IliyasuKwok Tai CHUI
Adelino J. C. PereiraL. Huraj
Adolfo DannierLaura Gastaldi
Adul SalamLeszek Czechowski
Akrivi KatiforiLili Nemec Zlatolas
Aldo MuroLuigi Fortuna
Aleksandra TutuevaMadhav Patil
Alessandro MengarelliMarcin Wachowski
Alessandro TonacciMarco Antonio Sotelo Monge
Alexander PyattaevMarco Claudio De Simone
Álvaro Rodríguez-SanzMarco Picone
Amir AsifMarco Sorrentino
Ángel VarelaMaria Malvoni
Anton RassõlkinMarko Hölbl
Antonino CrivelloMartin Ibl
Antonio Jesus Yuste-DelgadoMateo Gašparović
Ariana PiteaMatloob Khushi
Barbara ReMax Bleiweiss
Baris AksanliMehdi Foumani
Benjamin AnsaMichael Koch
Benjamin D. McPheronMuhammad Omer Khan
Borja BordelMustafa E. Amiryar
Christopher SiorisMyriam Ferreira-Fernandez
Constantin VolosencuNancy Rodriguez
Daniele BibboNdolane Sene
Diane PalmerNikolaos Katsoulas
Eirini Eleni TsiropoulouNima Dadashzadeh
Elias David Niño-RuizNipun Popli
Erin I. WalshOndrej Krejcar
Evangelos BellosOsama Sohaib
Feng HuPhilippe Gourbesville
Feras AlasaliPierre-Olivier Goffard
Francesco FidaleoQing Li
Ganesh R NaikQing Wang
George AdamRafael Maestre
George SuciuRahul Sehgal
Gianni BosiReinhard Langmann
Giovanni PauReza Shirazinejad
Giovanni SchmidRobertas Damasevicius
Hab. Ludovico MinatiSankar Prasad Mondal
Hana TomáškováSaptarshi Sengupta
Hannu LaaksonenSauvey Christophe
Hao WangSérgio Correia
Hsiang-Hsi HuangSergio Maria Patella
Ioan FilipSeweryn Lipiński
Iosif SzeidertShen-Tsu Wang
Itshak TkachShreya Dey
Jabar H. YousifShuo Zhao
Jan PašekStamatios Amanatiadis
Jan WitowskiStelios Kazadzis
Janusz DudczykTao Li
Javier Roldán PérezTero Tuovinen
Joao FerreiraTianhao Wang
Jorge Maestre VidalTianyi LI
Jovana RadulovicTom Nadarzynski
Juan Antonio Sicilia-MontalvoTomas Sochor
Juan RodríguezTsutomu Tsuboi
Julia BilbaoVictor Ramos
Julien LepineVinodh Chellamuthu
Julio Ruiz-PalmeroVladimir Eliseev
Juri BelikovWahiba Yaïci
Juris SmirnovsWenbing Zhao
Kaja AntlejXin Yang
Kamran KowsariXuan Sun
Konstantinos TsagarakisZahra Pooranian
Kostas VergidisZhaohui Yang
Krzysztof Prażmowski

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MDPI and ACS Style

Appl. Syst. Innov. Editorial Office. Acknowledgement to Reviewers of Appl. Syst. Innov. in Volume 2, 2019. Appl. Syst. Innov. 2020, 3, 9. https://doi.org/10.3390/asi3010009

AMA Style

Appl. Syst. Innov. Editorial Office. Acknowledgement to Reviewers of Appl. Syst. Innov. in Volume 2, 2019. Applied System Innovation. 2020; 3(1):9. https://doi.org/10.3390/asi3010009

Chicago/Turabian Style

Appl. Syst. Innov. Editorial Office. 2020. "Acknowledgement to Reviewers of Appl. Syst. Innov. in Volume 2, 2019" Applied System Innovation 3, no. 1: 9. https://doi.org/10.3390/asi3010009

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