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Quantum Beam Science, Volume 4, Issue 2
June 2020 - 7 articles
Cover Story: The spatially-selective lamellar orientation of polystyrene-block-poly (methyl methacrylate) (PS-b-PMMA) can be achieved by the modification of underlying self-assembled monolayers (SAM), which is induced by an electron beam (EB). Using EB lithography to change the polarity of different regions of SAM controls the lamellar orientation of PS-b-PMMA. The reduction of SAM substrates plays a crucial role in the ordering. View this paper.
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Quantum Beam Sci. - ISSN 2412-382X