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Keywords = ferroelectric thin films

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29 pages, 14906 KiB  
Article
Hydrothermal Engineering of Ferroelectric PZT Thin Films Tailoring Electrical and Ferroelectric Properties via TiO2 and SrTiO3 Interlayers for Advanced MEMS
by Chun-Lin Li and Guo-Hua Feng
Micromachines 2025, 16(8), 879; https://doi.org/10.3390/mi16080879 - 29 Jul 2025
Viewed by 238
Abstract
This work presents an innovative hydrothermal approach for fabricating flexible piezoelectric PZT thin films on 20 μm titanium foil substrates using TiO2 and SrTiO3 (STO) interlayers. Three heterostructures (Ti/PZT, Ti/TiO2/PZT, and Ti/TiO2/STO/PZT) were synthesized to enable low-temperature [...] Read more.
This work presents an innovative hydrothermal approach for fabricating flexible piezoelectric PZT thin films on 20 μm titanium foil substrates using TiO2 and SrTiO3 (STO) interlayers. Three heterostructures (Ti/PZT, Ti/TiO2/PZT, and Ti/TiO2/STO/PZT) were synthesized to enable low-temperature growth and improve ferroelectric performance for advanced flexible MEMS. Characterizations including XRD, PFM, and P–E loop analysis evaluated crystallinity, piezoelectric coefficient d33, and polarization behavior. The results demonstrate that the multilayered Ti/TiO2/STO/PZT structure significantly enhances performance. XRD confirmed the STO buffer layer effectively reduces lattice mismatch with PZT to ~0.76%, promoting stable morphotropic phase boundary (MPB) composition formation. This optimized film exhibited superior piezoelectric and ferroelectric properties, with a high d33 of 113.42 pm/V, representing an ~8.65% increase over unbuffered Ti/PZT samples, and displayed more uniform domain behavior in PFM imaging. Impedance spectroscopy showed the lowest minimum impedance of 8.96 Ω at 10.19 MHz, indicating strong electromechanical coupling. Furthermore, I–V measurements demonstrated significantly suppressed leakage currents in the STO-buffered samples, with current levels ranging from 10−12 A to 10−9 A over ±3 V. This structure also showed excellent fatigue endurance through one million electrical cycles, confirming its mechanical and electrical stability. These findings highlight the potential of this hydrothermally engineered flexible heterostructure for high-performance actuators and sensors in advanced MEMS applications. Full article
(This article belongs to the Special Issue Manufacturing and Application of Advanced Thin-Film-Based Device)
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13 pages, 3623 KiB  
Article
Fabrication and Characterization of Ferroelectric Capacitors with a Symmetric Hybrid TiN/W/HZO/W/TiN Electrode Structure
by Ha-Jung Kim, Jae-Hyuk Choi, Seong-Eui Lee, So-Won Kim and Hee-Chul Lee
Materials 2025, 18(15), 3547; https://doi.org/10.3390/ma18153547 - 29 Jul 2025
Viewed by 270
Abstract
In this study, Hf0.5Zr0.5O2 (HZO) thin-films were deposited using a Co-plasma atomic layer deposition (CPALD) process that combined both remote plasma and direct plasma, for the development of ferroelectric memory devices. Ferroelectric capacitors with a symmetric hybrid TiN/W/HZO/W/TiN [...] Read more.
In this study, Hf0.5Zr0.5O2 (HZO) thin-films were deposited using a Co-plasma atomic layer deposition (CPALD) process that combined both remote plasma and direct plasma, for the development of ferroelectric memory devices. Ferroelectric capacitors with a symmetric hybrid TiN/W/HZO/W/TiN electrode structure, incorporating W electrodes as insertion layers, were fabricated. Rapid thermal annealing (RTA) was subsequently employed to control the crystalline phase of the films. The electrical and structural properties of the capacitors were analyzed based on the RTA temperature, and the presence, thickness, and position of the W insertion electrode layer. Consequently, the capacitor with 5 nm-thick W electrode layers inserted on both the top and bottom sides and annealed at 700 °C exhibited the highest remnant polarization (2Pr = 61.0 μC/cm2). Moreover, the symmetric hybrid electrode capacitors annealed at 500–600 °C also exhibited high 2Pr values of approximately 50.4 μC/cm2, with a leakage current density of approximately 4 × 10−5 A/cm2 under an electric field of 2.5 MV/cm. The findings of this study are expected to contribute to the development of electrode structures for improved performance of HZO-based ferroelectric memory devices. Full article
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10 pages, 3121 KiB  
Article
Influence of Niobium Substitution on the Properties of Pb2Fe2O5 Thin Films Synthesized via Reactive Magnetron Sputtering
by Benas Beklešovas, Vytautas Stankus and Aleksandras Iljinas
Coatings 2025, 15(8), 863; https://doi.org/10.3390/coatings15080863 - 23 Jul 2025
Viewed by 240
Abstract
Lead ferrite (Pb2Fe2O5) is a promising multiferroic material that exhibits both ferroelectric and magnetic properties at room temperature. This study investigates how substituting niobium and adjusting the synthesis temperature affect the structural, morphological, and ferroelectric properties of [...] Read more.
Lead ferrite (Pb2Fe2O5) is a promising multiferroic material that exhibits both ferroelectric and magnetic properties at room temperature. This study investigates how substituting niobium and adjusting the synthesis temperature affect the structural, morphological, and ferroelectric properties of lead ferrite thin films deposited via reactive magnetron sputtering. Niobium-substituted PFO films (Pb2Fe2(1−x)Nb2xO5), where x corresponds to Nb2O5 contents of 3 wt.%, 5 wt.% and 10 wt.%, were prepared for this study, and denoted as PFONb3, PFONb5 and PFONb10, respectively. X-ray diffraction analysis confirmed the formation of Nb-substituted PFO phases, while polarization–electric field measurements demonstrated an increase in remnant polarization (Pr), with higher Nb content reaching a maximum Pr of 65 µC/cm2 at 10 wt.% Nb and a substrate temperature of 500 °C. Scanning electron microscopy and energy-dispersive spectroscopy revealed a uniform distribution of elements and a well-defined surface structure. These results highlight the need to fine tune synthesis parameters, such as temperature and substitution concentrations, to achieve optimal ferroelectric characteristics. Full article
(This article belongs to the Special Issue Advances in Novel Coatings)
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17 pages, 3084 KiB  
Article
Microstructural Evolution and Domain Engineering in Porous PZT Thin Films
by Evgeny Zhemerov, Arseniy Buryakov, Dmitry Seregin and Maxim Ivanov
Surfaces 2025, 8(2), 37; https://doi.org/10.3390/surfaces8020037 - 1 Jun 2025
Viewed by 2903
Abstract
Porous PZT films offer significant potential due to tunable electromechanical properties, yet the polarization behavior remains insufficiently understood because of discontinuous morphology and domain structures. In this work, we study the impact of porosity on the spontaneous polarization and electromechanical response of PZT [...] Read more.
Porous PZT films offer significant potential due to tunable electromechanical properties, yet the polarization behavior remains insufficiently understood because of discontinuous morphology and domain structures. In this work, we study the impact of porosity on the spontaneous polarization and electromechanical response of PZT thin films fabricated using a multilayer spin-coating technique with various concentrations (0–14%) of polyvinylpyrrolidone (PVP) as a porogen. Atomic force microscopy (AFM) and piezoresponse force microscopy (PFM) were employed to analyze the local topography, domain distribution, and polarization behavior of the films. The results indicate that increasing porosity leads to substantial changes in grain morphology, dielectric permittivity, and polarization response. Films with higher porosity exhibit a more fragmented polarization distribution and reduced piezoresponse, while certain orientations demonstrate enhanced domain mobility. Despite the decrease in overall polarization, the local coercive field remains relatively stable, suggesting structural stability during the local polarization switching. The findings highlight the crucial role of grain boundaries and local charge redistribution in determining local polarization behavior. Full article
(This article belongs to the Collection Featured Articles for Surfaces)
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25 pages, 3962 KiB  
Review
Tailoring the Functional Properties of Ferroelectric Perovskite Thin Films: Mechanisms of Dielectric and Photoelectrochemical Enhancement
by Ioan-Mihail Ghitiu, George Alexandru Nemnes and Nicu Doinel Scarisoreanu
Crystals 2025, 15(6), 496; https://doi.org/10.3390/cryst15060496 - 23 May 2025
Cited by 1 | Viewed by 732
Abstract
Various types of strain, as well as chemical pressure induced by dopants, can effectively tailor the performance of perovskite thin films, including their optical, electrical or photoelectrochemical properties. The control of these functional properties through such engineering techniques is key to fulfilling the [...] Read more.
Various types of strain, as well as chemical pressure induced by dopants, can effectively tailor the performance of perovskite thin films, including their optical, electrical or photoelectrochemical properties. The control of these functional properties through such engineering techniques is key to fulfilling the application-specific requirements of ferroelectric devices in various fields. Numerous models and experimental data have been published on this subject, especially on ferrite-based ferroelectric materials. Within this paper, the mechanisms of tuning ferroelectric intrinsic properties, such as polarization and ferroelectric domain configurations, through epitaxial strain and doping, as well as the role of these techniques in influencing functional properties such as dielectric and photoelectrochemical ones, are presented. This review examines the significant improvements in dielectric properties and photoelectrochemical efficiency achieved by the strategical control of key functionalities including dielectric losses, domain structures, charge separation and surface reactions in strained/doped ferroelectric thin films, highlighting the advancements and research progress made in this field in recent years. Full article
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15 pages, 5437 KiB  
Article
Evaluation of Physical Properties of Ti-Doped BiFeO3 Thin Films Deposited on Fluorine Tin Oxide and Indium Tin Oxide Substrates
by Anel Rocío Carrasco-Hernández, Armando Reyes-Rojas, Gabriel Rojas-George, Antonio Ramírez-De la Cruz and Hilda Esperanza Esparza-Ponce
Materials 2025, 18(10), 2395; https://doi.org/10.3390/ma18102395 - 21 May 2025
Viewed by 472
Abstract
BiFeO3 is a fascinating material with a rhombohedral crystal structure (R3c) at room temperature. This unique structure makes it suitable for use in solar cells, as the interaction of light with the polarized octahedral enhances electron movement. Evaluating its properties [...] Read more.
BiFeO3 is a fascinating material with a rhombohedral crystal structure (R3c) at room temperature. This unique structure makes it suitable for use in solar cells, as the interaction of light with the polarized octahedral enhances electron movement. Evaluating its properties on different substrates helps to identify the specific characteristics of thin films. The thin films presented in this work were deposited using reactive RF cathodic sputtering with a homemade 1-inch diameter ceramic target. Their morphology, phase composition, optical, piezoelectric, and ferroelectric properties were evaluated. Fluorine Tin Oxide (FTO) and Indium Tin Oxide (ITO) substrates were used for the presented thin films. The thin films deposited on FTO displayed the “butterfly” behavior typically associated with ferroelectric materials. A d33 value of 2.71 nm/V was determined using SSPFM-DART mode. In contrast, the thin films deposited on ITO at 550 °C reached a maximum saturation polarization of 40.89 μC/cm2 and a remnant polarization of 44.87 μC/cm2, which are the highest values recorded, but did not present the typical “butterfly” behavior. As the grain size increased, the influence of charge defects became more pronounced, leading to an increase in the leakage current. Furthermore, the presence of secondary phases also contributed to this behavior. Full article
(This article belongs to the Special Issue The Optical, Ferroelectric and Dielectric Properties of Thin Films)
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22 pages, 4727 KiB  
Review
Review of Magnetoelectric Effects on Coaxial Fibers of Ferrites and Ferroelectrics
by Sujoy Saha, Sabita Acharya, Ying Liu, Peng Zhou, Michael R. Page and Gopalan Srinivasan
Appl. Sci. 2025, 15(9), 5162; https://doi.org/10.3390/app15095162 - 6 May 2025
Viewed by 560
Abstract
Composites of ferromagnetic and ferroelectric phases are of interest for studies on mechanical strain-mediated coupling between the two phases and for a variety of applications in sensors, energy harvesting, and high-frequency devices. Nanocomposites are of particular importance since their surface area-to-volume ratio, a [...] Read more.
Composites of ferromagnetic and ferroelectric phases are of interest for studies on mechanical strain-mediated coupling between the two phases and for a variety of applications in sensors, energy harvesting, and high-frequency devices. Nanocomposites are of particular importance since their surface area-to-volume ratio, a key factor that determines the strength of magneto-electric (ME) coupling, is much higher than for bulk or thin-film composites. Core–shell nano- and microcomposites of the ferroic phases are the preferred structures, since they are free of any clamping due to substrates that are present in nanobilayers or nanopillars on a substrate. This review concerns recent efforts on ME coupling in coaxial fibers of spinel or hexagonal ferrites for the magnetic phase and PZT or barium titanate for the ferroelectric phase. Several recent studies on the synthesis and ME measurements of fibers with nickel ferrite, nickel zinc ferrite, or cobalt ferrite for the spinel ferrite and M-, Y-, and W-types for the hexagonal ferrites were considered. Fibers synthesized by electrospinning were found to be free of impurity phases and had uniform core and shell structures. Piezo force microscopy (PFM) and scanning microwave microscopy (SMM) measurements of strengths of direct and converse ME effects on individual fibers showed evidence for strong coupling. Results of low-frequency ME voltage coefficient and magneto-dielectric effects on 2D and 3D films of the fibers assembled in a magnetic field, however, were indicative of ME couplings that were weaker than in bulk or thick-film composites. A strong ME interaction was only evident from data on magnetic field-induced variations in the remnant ferroelectric polarization in the discs of the fibers. Follow-up efforts aimed at further enhancement in the strengths of ME coupling in core–shell composites are also discussed in this review. Full article
(This article belongs to the Special Issue Applied Electronics and Functional Materials)
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15 pages, 5870 KiB  
Article
High Dielectric Tunability and Figure of Merit at Low Voltage in (001)-Oriented Epitaxial Tetragonal Pb0.52Zr0.48TiO3 Thin Films
by Hongwang Li, Chao Liu and Jun Ouyang
Nanomaterials 2025, 15(9), 695; https://doi.org/10.3390/nano15090695 - 5 May 2025
Viewed by 490
Abstract
Ferroelectric thin films with a high dielectric tunability (η) have great potential in electrically tunable applications, including microwave tunable devices such as phase shifters, filters, delay lines, etc. Using a modified Landau–Devonshire type thermodynamic potential, we show that the dielectric tunability [...] Read more.
Ferroelectric thin films with a high dielectric tunability (η) have great potential in electrically tunable applications, including microwave tunable devices such as phase shifters, filters, delay lines, etc. Using a modified Landau–Devonshire type thermodynamic potential, we show that the dielectric tunability η of a (001) tetragonal ferroelectric film can be analytically solved. After a survey of materials, a large η value above 60% was predicted to be achievable in a (001)-oriented tetragonal Pb(Zr0.52Ti0.48)O3 (PZT) film. Experimentally, (001)-oriented PZT thin films were prepared on LaNiO3-coated (100) SrTiO3 substrates by using pulsed laser deposition (PLD). These films exhibited good dielectric tunability (η ~ 67.6%) measured at a small electric field E of ~250 kV/cm (corresponding to 5 volts for a 200 nm thick film). It only dropped down to ~54.2% when E was further reduced to 125 kV/cm (2.5 volts for 200 nm film). The measured dielectric tunability η as functions of the applied electric field E and measuring frequency f are discussed for a 500 nm thick PZT film, with the former well described by the theoretical η(E) curves and the latter showing a weak frequency dependence. These observations validate our integrated approach rooted in a theoretical understanding. Full article
(This article belongs to the Section Nanoelectronics, Nanosensors and Devices)
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19 pages, 7029 KiB  
Article
Bipolar Switching Properties and Reaction Decay Effect of BST Ferroelectric Thin Films for Applications in Resistance Random Access Memory Devices
by Yao-Chin Wang, Kai-Huang Chen, Ming-Cheng Kao, Hsin-Chin Chen, Chien-Min Cheng, Hong-Xiang Huang and Kai-Chi Huang
Nanomaterials 2025, 15(8), 602; https://doi.org/10.3390/nano15080602 - 14 Apr 2025
Cited by 1 | Viewed by 506
Abstract
In this manuscript, strontium barium titanate (BST) ferroelectric memory film materials for applications in the feasibility of applying to non-volatile RAM devices were obtained and compared. Solutions were synthesized with a proportional ratio and through the deposition of BST films on titanium nitride/silicon [...] Read more.
In this manuscript, strontium barium titanate (BST) ferroelectric memory film materials for applications in the feasibility of applying to non-volatile RAM devices were obtained and compared. Solutions were synthesized with a proportional ratio and through the deposition of BST films on titanium nitride/silicon substrates using the sol–gel method, using rapid thermal annealing for defect repair and re-crystallization processing. The crystallization structure and surface morphology of annealed and as-deposited BST films were obtained by XPS, XRD, and SEM measurements. Additionally, the ferroelectric and resistive switching properties for the memory window, the maximum capacitance, and the leakage current were examined for Al/BST/TiN and Cu/BST/TiN structure memory devices. In addition, the first-order reaction equation of the decay reaction behavior for the BST film RRAM devices in the reset state revealed that r=0.19[O2]1. Finally, the Cu/BST/TiN and Al/BST/TiN structures of the ferroelectric BST films RRAM devices exhibited good memory window properties, bipolar switching properties, and non-volatile properties for applications in non-volatile memory devices. Full article
(This article belongs to the Section Synthesis, Interfaces and Nanostructures)
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15 pages, 6277 KiB  
Article
High-Performance Ferroelectric Capacitors Based on Pt/BaTiO3/SrRuO3/SrTiO3 Heterostructures for Nonvolatile Memory Applications
by Zengyuan Fang, Yiming Peng, Haiou Li, Xingpeng Liu and Jianghui Zhai
Crystals 2025, 15(4), 337; https://doi.org/10.3390/cryst15040337 - 2 Apr 2025
Viewed by 764
Abstract
BaTiO3 (BTO), a lead-free chalcogenide ferroelectric material, has emerged as a promising candidate for ferroelectric memories due to its advantageous ferroelectric properties, notable flexibility, and mechanical stability, along with a high dielectric constant and minimal leakage. These attributes lay a crucial foundation [...] Read more.
BaTiO3 (BTO), a lead-free chalcogenide ferroelectric material, has emerged as a promising candidate for ferroelectric memories due to its advantageous ferroelectric properties, notable flexibility, and mechanical stability, along with a high dielectric constant and minimal leakage. These attributes lay a crucial foundation for multi-value storage. In this study, high-quality BaTiO3 ferroelectric thin films have been successfully prepared on STO substrates by pulsed laser deposition (PLD), and Pt/BaTiO3/SrRuO3/SrTiO3 ferroelectric heterojunctions were finally prepared by a combination of UV lithography and magnetron sputtering. Characterization and performance tests were carried out by AFM, XRD, and a semiconductor analyzer. The results demonstrate that the ferroelectric heterojunction prepared in this study exhibits excellent ferroelectric properties. Furthermore, the device demonstrates fatigue-free operation after 107 bipolar switching cycle tests, and the polarization value exhibits no significant decrease in the holding characteristic test at 104 s, thereby further substantiating its exceptional reliability and durability. These findings underscore the considerable promise of BTO ferroelectric memories for nonvolatile storage applications and lay the foundation for the development in the fields of both in-memory computing systems and neuromorphic computing. Full article
(This article belongs to the Special Issue Recent Research on Electronic Materials and Packaging Technology)
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20 pages, 4358 KiB  
Article
The Conversion Polymorphism of Perovskite Phases in the BiCrO3–BiFeO3 System
by Alexei A. Belik
Inorganics 2025, 13(3), 91; https://doi.org/10.3390/inorganics13030091 - 18 Mar 2025
Viewed by 822
Abstract
Perovskite-type materials containing Bi3+ cations at A sites are interesting from the viewpoints of applications and fundamental science as the lone pair of Bi3+ cations often stabilizes polar, ferroelectric structures. This can be illustrated by a lot of discoveries of different [...] Read more.
Perovskite-type materials containing Bi3+ cations at A sites are interesting from the viewpoints of applications and fundamental science as the lone pair of Bi3+ cations often stabilizes polar, ferroelectric structures. This can be illustrated by a lot of discoveries of different new functionalities in bulk and thin films of BiFeO3 and its derivatives. In this work, we investigated solid solutions of BiCr1−xFexO3 with 0.1 ≤ x ≤ 0.4 prepared by a high-pressure (HP) method and post-synthesis annealing at ambient pressure (AP). HP-BiCr1−xFexO3 modifications with 0.1 ≤ x ≤ 0.3 were mixtures of two phases with space groups C2/c and Pbam, and the amount of the C2/c phase decreased with increasing x. The amount of the C2/c phase was also significantly decreased in AP-BiCr1−xFexO3 modifications, and the C2/c phase almost disappeared in AP-BiCr1−xFexO3 with 0.2 ≤ x ≤ 0.3. Fundamental, strong reflections of HP-BiCr1−xFexO3 and AP-BiCr1−xFexO3 were almost unchanged; on the other hand, weak superstructure reflections were different and showed clear signs of strong anisotropic broadening and incommensurate positions. These structural features prevented us from determining their room-temperature structures. On the other hand, HP-BiCr1−xFexO3 and AP-BiCr1−xFexO3 showed high-temperature structural phase transitions to the GdFeO3-type Pnma modification at Tsrt = 450 K (x = 0.1), Tsrt = 480 K (x = 0.2), Tsrt = 510 K (x = 0.3), and Tsrt = 546 K (x = 0.4). Crystal structures of the GdFeO3-type Pnma modifications of all the samples were investigated by synchrotron powder X-ray diffraction. Magnetic properties of HP-BiCr1−xFexO3 and AP-BiCr1−xFexO3 were quite close to each other (HP vs. AP), and the x = 0.2 samples demonstrated negative magnetization phenomena without signs of the exchange bias effect. Full article
(This article belongs to the Special Issue Photoelectric Research in Advanced Energy Materials)
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11 pages, 15832 KiB  
Article
A Pathway for the Integration of Novel Ferroelectric Thin Films on Non-Planar Photonic Integrated Circuits
by Enes Lievens, Kobe De Geest, Ewout Picavet, Liesbet Van Landschoot, Henk Vrielinck, Gilles Freddy Feutmba, Hannes Rijckaert, Klaartje De Buysser, Dries Van Thourhout, Peter Bienstman and Jeroen Beeckman
Micromachines 2025, 16(3), 334; https://doi.org/10.3390/mi16030334 - 13 Mar 2025
Viewed by 984
Abstract
The heterogeneous integration of ferroelectric thin films on silicon- or silicon nitride-based platforms for photonic integrated circuits plays a crucial role in the development of nanophotonic thin film modulators. For this purpose, an ultrathin seed film was recently introduced as an integration method [...] Read more.
The heterogeneous integration of ferroelectric thin films on silicon- or silicon nitride-based platforms for photonic integrated circuits plays a crucial role in the development of nanophotonic thin film modulators. For this purpose, an ultrathin seed film was recently introduced as an integration method for ferroelectric thin films such as BaTiO3 and Pb(Zr,Ti)O3. One issue with this self-orienting seed film is that for non-planarized circuits, it fails to act as a template film for the thin films. To circumvent this problem, we propose a method of planarization without the need for wafer-scale chemical mechanical polishing by using hydrogen silsesquioxane as a precursor to forming amorphous silica, in order to create an oxide cladding similar to the thermal oxide often present on silicon-based platforms. Additionally, this oxide cladding is compatible with the high annealing temperatures usually required for the deposition of these novel ferroelectric thin films (600–800 °C). The thickness of this silica film can be controlled through a dry etch process, giving rise to a versatile platform for integrating nanophotonic thin film modulators on a wider variety of substrates. Using this method, we successfully demonstrate a hybrid BaTiO3-Si ring modulator with a high Pockels coefficient of rwg=155.57±10.91 pm V−1 and a half-wave voltage-length product of VπL=2.638±0.084 V cm, confirming the integration of ferroelectric thin films on an initially non-planar substrate. Full article
(This article belongs to the Special Issue Emerging Trends in Optoelectronic Device Engineering)
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15 pages, 6315 KiB  
Article
Effect of Various Nanofillers on Piezoelectric Nanogenerator Performance of P(VDF-TrFE) Nanocomposite Thin Film
by Sangkwon Park and Hafiz Muhammad Abid Yaseen
Nanomaterials 2025, 15(5), 403; https://doi.org/10.3390/nano15050403 - 6 Mar 2025
Viewed by 986
Abstract
Flexible polymer-based piezoelectric nanogenerators (PENGs) have gained significant interest due to their ability to deliver clean and sustainable energy for self-powered electronics and wearable devices. Recently, the incorporation of fillers into the ferroelectric polymer matrix has been used to improve the relatively low [...] Read more.
Flexible polymer-based piezoelectric nanogenerators (PENGs) have gained significant interest due to their ability to deliver clean and sustainable energy for self-powered electronics and wearable devices. Recently, the incorporation of fillers into the ferroelectric polymer matrix has been used to improve the relatively low piezoelectric properties of polymer-based PENGs. In this study, we investigated the effect of various nanofillers such as titania (TiO2), zinc oxide (ZnO), reduced graphene oxide (rGO), and lead zirconate titanate (PZT) on the PENG performance of the nanocomposite thin films containing the nanofillers in poly(vinylidene fluoride-co-trifluoro ethylene) (P(VDF-TrFE)) matrix. The nanocomposite films were prepared by depositing molecularly thin films of P(VDF-TrFE) and nanofiller nanoparticles (NPs) spread at the air/water interface onto the indium tin oxide-coated polyethylene terephthalate (ITO-PET) substrate, and they were characterized by measuring their microstructures, crystallinity, β-phase contents, and piezoelectric coefficients (d33) using SEM, FT-IR, XRD, and quasi-static meter, respectively. Multiple PENGs incorporating various nanofillers within the polymer matrix were developed by assembling thin film-coated substrates into a sandwich-like structure. Their piezoelectric properties, such as open-circuit output voltage (VOC) and short-circuit current (ISC), were analyzed. As a result, the PENG containing 4 wt% PZT, which was named P-PZT-4, showed the best performance of VOC of 68.5 V with the d33 value of 78.2 pC/N and β-phase content of 97%. The order of the maximum VOC values for the PENGs of nanocomposite thin films containing various nanofillers was PZT (68.5 V) > rGO (64.0 V) > ZnO (50.9 V) > TiO2 (48.1 V). When the best optimum PENG was integrated into a simple circuit comprising rectifiers and a capacitor, it demonstrated an excellent two-dimensional power density of 20.6 μW/cm2 and an energy storage capacity of 531.4 μJ within 3 min. This piezoelectric performance of PENG with the optimized nanofiller type and content was found to be superior when it was compared with those in the literature. This PENG comprising nanocomposite thin film with optimized nanofiller type and content shows a potential application for a power source for low-powered electronics such as wearable devices. Full article
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15 pages, 4641 KiB  
Article
Low-Bandgap Ferroelectric h-LuMnO3 Thin Films for Photovoltaic Applications
by Abderrazzak Ait Bassou, Lisete Fernandes, Denis O. Alikin, Mafalda S. Moreira, Bogdan Postolnyi, Rui Vilarinho, José Ramiro Fernandes, Fábio Gabriel Figueiras and Pedro B. Tavares
Materials 2025, 18(5), 1058; https://doi.org/10.3390/ma18051058 - 27 Feb 2025
Viewed by 731
Abstract
This work explores the deposition of hexagonal (h-) LuMnO3 thin films in the P63cm phase and investigates the conditions under which the synergy of ferroelectric and photoactive properties, can be achieved to confirm the potential of this material [...] Read more.
This work explores the deposition of hexagonal (h-) LuMnO3 thin films in the P63cm phase and investigates the conditions under which the synergy of ferroelectric and photoactive properties, can be achieved to confirm the potential of this material for applications in the development of next-generation photovoltaic devices. Single-phase h-LuMnO3 was successfully deposited on different substrates, and the thermal stability of the material was confirmed by Micro-Raman spectroscopy analysis from 77 to 850 K, revealing the suitable ferro- to para-electric transition near 760 K. Optical measurements confirm the relatively narrow band gap at 1.5 eV, which corresponds to the h-LuMnO3 system. The presence of domain structures and the signature of hysteresis loops consistent with ferroelectric behaviour were confirmed by piezoresponse force microscopy. In addition, light-dependent photocurrent measurements revealed the photoactive sensitivity of the material. Full article
(This article belongs to the Special Issue Advanced Photovoltaic Materials: Properties and Applications)
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33 pages, 6303 KiB  
Review
Advanced Crystallization Methods for Thin-Film Lithium Niobate and Its Device Applications
by Rongbang Yang, Haoming Wei, Gongbin Tang, Bingqiang Cao and Kunfeng Chen
Materials 2025, 18(5), 951; https://doi.org/10.3390/ma18050951 - 21 Feb 2025
Cited by 1 | Viewed by 1638
Abstract
Lithium niobate (LiNbO3) has remarkable ferroelectric properties, and its unique crystal structure allows it to undergo significant spontaneous polarization. Lithium niobate plays an important role in the fields of electro-optic modulation, sensing and acoustics due to its excellent electro-optic and piezoelectric [...] Read more.
Lithium niobate (LiNbO3) has remarkable ferroelectric properties, and its unique crystal structure allows it to undergo significant spontaneous polarization. Lithium niobate plays an important role in the fields of electro-optic modulation, sensing and acoustics due to its excellent electro-optic and piezoelectric properties. Thin-film LiNbO3 (TFLN) has attracted much attention due to its unique physical properties, stable properties and easy processing. This review introduces several main preparation methods for TFLN, including chemical vapor deposition (CVD), molecular beam epitaxy (MBE), pulsed laser deposition (PLD), magnetron sputtering and Smartcut technology. The development of TFLN devices, especially the recent research on sensors, memories, optical waveguides and EO modulators, is introduced. With the continuous advancement of manufacturing technology and integration technology, TFLN devices are expected to occupy a more important position in future photonic integrated circuits. Full article
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