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Preparation and Application of Nanowires

This special issue belongs to the section “Nanoelectronics, Nanosensors and Devices“.

Special Issue Information

Dear colleagues,

The first semiconductor microwires were grown using the vapor–liquid–solid method in 1964. At the beginning of the 2000s, a rapid development of semiconductor nanowires began through the use of modern epitaxy techniques. This has resulted in tremendous progress in nanowire synthesis, characterization, and applications. One important advantage of nanowires is that they allow for a very efficient relaxation of elastic stress induced by lattice mismatch, thus enabling dislocation-free growth on dissimilar substrates such as silicon for III-V nanowires, and in nanowire heterostructures. Semiconductor nanowires are now widely considered as fundamental blocks of nanoscience and nanotechnology. This Special Issue will share the latest achievements in preparation, fundamental studies, and applications of nanowires in different material systems. Special emphasis will be put on the synthesis methods for fabrication of highly regular arrays of nanowires, ternary III–V nanowires and heterostructures based on such nanowires, morphological and crystal phase control in nanowires, advanced characterization techniques, and nanowires applications in electronics, photonics, and sensing.

Prof. Vladimir G. Dubrovskii
Guest Editor

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Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • semiconductor nanowires
  • vapor–liquid–solid growth
  • heterostructures
  • molecular beam epitaxy
  • ternary III–V material systems
  • modeling
  • optical and structural characterization
  • crystal phase
  • applications of nanowires

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Nanomaterials - ISSN 2079-4991