New Applications of Ion Beams in Modification and Creation of Nanostructures
A special issue of Coatings (ISSN 2079-6412).
Deadline for manuscript submissions: closed (31 May 2019) | Viewed by 5571
Special Issue Editor
Special Issue Information
Dear Colleagues,
Ion beams of energy from tens to hundreds of keV to MeV have provided a powerful means to tailor material properties through atomic doping, ion sputtering and defect engineering processes. For example, ion implantation of dopant atoms in semiconductors is a standard microelectronics technology for modulating the semiconductor conduction properties. As recent research efforts are geared toward the search and synthesis of novel nanostructured materials, it is interesting to explore the applications of energetic ion beams in modifying the properties of a variety of nanomaterials that have been discovered, as well as in creating nanostructures within existing materials. These ion-beam created or modified nanomaterials and nanostructures could find potential applications in areas related to advanced computing, energy harnessing, quantum information technology and biochemical detection. This special issue will introduce and review recent research work on the following topics:
This special issue will introduce and review recent research work on the following topics:
- Ion beam modification of nanoscale surfaces;
- Ion beam doping in nanowires and two dimensional materials;
- Ion beam synthesis of nanostructures within materials;
- Ion beam creation of atomic-like photonic and magnetic devices;
- Focused ion beam processing and fabrication;
- Single ion implantation.
Prof. Dr. Mengbing Huang
Guest Editor
Manuscript Submission Information
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