Glancing Angle Deposited and Anisotropic Thin Films and Coatings

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".

Deadline for manuscript submissions: closed (31 December 2021) | Viewed by 8261

Special Issue Editor


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Guest Editor
Research Computing Center, Lomonosov Moscow State University, Moscow 119234, Russia
Interests: molecular modeling; thin-film deposition; simulation of thin films' properties; computer-aided drug design
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Special Issue Information

Dear Colleagues,

We would like to invite you to contribute with original works and reviews to the Special Issue “Glancing Angle Deposited and Anisotropic Thin Films and Coatings”. Due to high-porosity, low-reflectance, anisotropy properties and high-surface area, glancing angle deposited (GLAD) films and coatings are now implemented in a large range of technological fields, including optic and electronic devices, sensors, energy storage, etc. Along with the development of experimental techniques, progress in high-performance computing now allows us to simulate the deposition process in the atomistic level and study the influence of deposition conditions on films and coatings properties. The aim of this Special Issue is to present the latest progress in the production, application, and modeling of GLAD and anisotropic thin films and coatings through original research papers and reviews.

The topics of interest include but are not limited to:

  • The latest developments in producing GLAD and anisotropic films and coatings via different processes;
  • Applications of GLAD in antireflection coatings, photovoltaic cells, sensor technology, etc.;
  • Structural, mechanical, and optical properties of GLAD and anisotropic films and coatings;
  • Computer modeling of the deposition process, including classical, quantum, and multiscale simulation. Calculation of structural, mechanical, and optic properties of thin films and coatings;
  • Design of multilayer coatings;
  • Theoretical models of glancing angle deposition, including influence of deposition conditions on the structure and properties of films and coatings. 

Dr. Fedor Vasilievich Grigoriev
Guest Editor

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Keywords

  • Oblique angle deposition
  • Glancing angle deposition
  • Anisotropic thin films
  • Simulation of thin films
  • Application of thin films

Published Papers (4 papers)

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Research

12 pages, 6849 KiB  
Article
Obliquely Bideposited TiN Thin Film with Morphology-Dependent Optical Properties
by Yi-Jun Jen, Wei-Chieh Ma and Ting-Yen Lin
Coatings 2021, 11(11), 1418; https://doi.org/10.3390/coatings11111418 - 20 Nov 2021
Viewed by 1613
Abstract
TiN thin films were obliquely bideposited with different subdeposit thicknesses. The morphology of the bideposited film was varied from a nano-zigzag array to a vertically grown columnar structure by reducing the subdeposit thickness. The principal index of refraction and extinction coefficient were obtained [...] Read more.
TiN thin films were obliquely bideposited with different subdeposit thicknesses. The morphology of the bideposited film was varied from a nano-zigzag array to a vertically grown columnar structure by reducing the subdeposit thickness. The principal index of refraction and extinction coefficient were obtained to explain the measured reflectance and transmittance spectra. The loss of the bideposited thin film decreased as the thickness of the subdeposit decreased. The principal indices for normal incidence were near or under unity, indicating the low reflection by the bideposited thin films. A TiN film with a subdeposit thickness of 3 nm demonstrated an average index of refraction of 0.83 and extinction coefficient of below 0.2 for visible wavelengths. The retrieved principal refractive indexes explained the anisotropic transmission and reflection. For most normal incident cases, the analysis offers the tunable anisotropic property of a TiN nanostructured film for multilayer design in the future. Full article
(This article belongs to the Special Issue Glancing Angle Deposited and Anisotropic Thin Films and Coatings)
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11 pages, 8441 KiB  
Article
Statistical Analysis on the Structural Size of Simulated Thin Film Growth with Molecular Dynamics for Glancing Angle Incidence Deposition
by Holger Badorreck, Lars Jensen, Detlev Ristau and Marco Jupé
Coatings 2021, 11(4), 469; https://doi.org/10.3390/coatings11040469 - 17 Apr 2021
Cited by 2 | Viewed by 1767
Abstract
For the purpose of a deeper understanding of thin film growth, in the last two decades several groups developed models for simulation on the atomistic scale. Models using molecular dynamics as their simulation method already give results comparable to experiments, however statistical analysis [...] Read more.
For the purpose of a deeper understanding of thin film growth, in the last two decades several groups developed models for simulation on the atomistic scale. Models using molecular dynamics as their simulation method already give results comparable to experiments, however statistical analysis of the simulations themselves are lacking so far, reasoned by the limits imposed by the computational power and parallelization that can only be used in lateral dimensions. With advancements of software and hardware, an increase in simulation speed by a factor of up to 10 can be reached. This allows either larger structures and/or more throughput of the simulations. The paper analyses the significance of increasing the structure size in lateral dimensions and also the repetition of simulations to gain more insights into the statistical fluctuation contained in the simulations and how well the coincidence with the experiment is. For that, glancing angle incidence deposition (GLAD) coatings are taken as an example. The results give important insights regarding the used interaction potential, the structure size and resulting important differences for the density, surface morphology, roughness and anisotropy. While larger structures naturally can reproduce the real world in more detail, the results show which structure sizes are needed for these aspects without wasting computational resources. Full article
(This article belongs to the Special Issue Glancing Angle Deposited and Anisotropic Thin Films and Coatings)
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13 pages, 2117 KiB  
Article
Tuning the Optical Properties of WO3 Films Exhibiting a Zigzag Columnar Microstructure
by Charalampos Sakkas, Jean-Yves Rauch, Jean-Marc Cote, Vincent Tissot, Joseph Gavoille and Nicolas Martin
Coatings 2021, 11(4), 438; https://doi.org/10.3390/coatings11040438 - 10 Apr 2021
Cited by 6 | Viewed by 2003
Abstract
Tungsten oxide WO3 thin films are deposited by DC reactive magnetron sputtering. The Reactive Gas Pulsing Process (RGPP) associated with the GLancing Angle Deposition method (GLAD) are implemented to produce zigzag columnar structures. The oxygen injection time (tON time) and [...] Read more.
Tungsten oxide WO3 thin films are deposited by DC reactive magnetron sputtering. The Reactive Gas Pulsing Process (RGPP) associated with the GLancing Angle Deposition method (GLAD) are implemented to produce zigzag columnar structures. The oxygen injection time (tON time) and the pulsing period are kept constant. Three tilt angles α are used: 75, 80, and 85° and the number of zigzags N is progressively changed from N = 0.5, 1, 2, 4, 8 to 16. For each film, refractive index, extinction coefficient, and absorption coefficient are calculated from optical transmission spectra of the films measured in the visible region from wavelength values only. Absorption and extinction coefficients monotonously drop as the number of zigzags increases. Refractive indices are the lowest for the most grazing tilt angle α = 85°. The highest refractive index is nevertheless obtained for a number of zigzags close to four. This optimized optical property is directly correlated to changes of the microstructure, especially a porous architecture, which is favored for high tilt angles, and tunable as a function of the number of zigzags. Full article
(This article belongs to the Special Issue Glancing Angle Deposited and Anisotropic Thin Films and Coatings)
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11 pages, 5481 KiB  
Article
Laser-Induced Thermal Stresses in Dense and Porous Silicon Dioxide Films
by Fedor Vasilievich Grigoriev, Vladimir Borisovich Sulimov and Alexander Vladimirovich Tikhonravov
Coatings 2021, 11(4), 394; https://doi.org/10.3390/coatings11040394 - 30 Mar 2021
Cited by 4 | Viewed by 1922
Abstract
The laser-induced thermal stresses in silicon dioxide films are calculated using molecular dynamics simulations. The absorption of the laser energy is simulated by the linear temperature growth from room temperature to 1300 K in a time equal to the laser pulse duration. The [...] Read more.
The laser-induced thermal stresses in silicon dioxide films are calculated using molecular dynamics simulations. The absorption of the laser energy is simulated by the linear temperature growth from room temperature to 1300 K in a time equal to the laser pulse duration. The maximum values of stresses for picosecond pulses are approximately twice as high as for nanosecond pulses. The stresses in highly porous glancing angle deposited films are approximately two times lower than in dense films. Stress waves caused by picosecond pulses are observed in dense films. An increase in the heating temperature to 1700 K leads to an increase in the absolute stress values for picosecond pulses, and a decrease for nanosecond pulses. Full article
(This article belongs to the Special Issue Glancing Angle Deposited and Anisotropic Thin Films and Coatings)
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