Special Issue "Atomic Layer Deposition of Thin-Films"
A special issue of Coatings (ISSN 2079-6412).
Deadline for manuscript submissions: 31 December 2020.
Interests: surface chemistry; atomic layer deposition; area-selective atomic layer deposition; molecular layer deposition
Interests: atomic layer deposition; atomic layer etching; area-selective atomic layer deposition; bottom-up nanofabrication; semiconductor processing
Atomic layer deposition (ALD) is a thin film deposition technique based on sequential surface reactions of gas phase precursors and reactants. Currently, ALD is adopted as an essential process in the fabrication of microelectronic devices, and its applications toward controlled synthesis of various nanomaterials are expanding. Several techniques related to ALD are also emerging, such as atomic layer etching (ALE), area-selective atomic layer deposition (AS-ALD), and molecular layer deposition (MLD). Fundamental aspects of ALD, such as surface chemistry and nucleation theory, still demand further research.
The topics of interest of this Special Issue include, but are not limited to:
- Deposition of thin films by ALD
- Atomic layer etching (ALE)
- Area-selective ALD (AS-ALD)
- Molecular layer deposition (MLD)
- Applications of ALD materials
- Applications of ALD processes
- Fundamental aspects of ALD
Prof. Woo-Hee Kim
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
- atomic layer deposition (ALD)
- atomic layer etching (ALE)
- area-selective atomic layer deposition (AS-ALD)
- molecular layer deposition (MLD)