Vacuum Deposition Technologies and Semiconductor Applications

Dear Colleagues,

Nanoscale thin films play a fundamental role in various applications, encompassing coatings, surface treatments, semiconductor devices, and so on. The deposition of thin films allows for the refinement of elemental surface layers, ensuring specific functional properties while potentially utilizing cost-effective core materials. Among the many techniques enhancing the functional properties of engineering materials surfaces, vacuum methods play an important role in industrial practice. The aim of this Special Issue is to provide a platform where academics, industry experts, and researchers worldwide can share their research achievements and exchange experiences within the field of vacuum deposition and semiconductor applications. This SI warmly welcomes the works from the Conference on Chinese Vacuum Technologies and Semiconductor Applications 2023.

Topics of interest include but are not limited to:

1. Theoretical and experimental research in vacuum thin-film deposition methods;
2. Thin-film processes and related devices, including chemical vapour deposition (CVD); physical vapour deposition (PVD) and atomic layer deposition (ALD)...;
3. The application of vacuum thin-film deposition, including memory, metal oxide semiconductor field effect transistors (MOSFETs), thin-film transistors (TFTs), sensors, ...

Prof. Dr. Hongliang Lu
Prof. Dr. Gang He
Guest Editors

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