Vacuum Deposition Technologies and Semiconductor Applications
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".
Deadline for manuscript submissions: closed (30 August 2024) | Viewed by 1809
Special Issue Editors
Interests: atomic layer deposition of thin films and their applications in nano devices
Interests: functional thin-film deposition; thin-film transistors; CMOS devices; integration
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
Nanoscale thin films play a fundamental role in various applications, encompassing coatings, surface treatments, semiconductor devices, and so on. The deposition of thin films allows for the refinement of elemental surface layers, ensuring specific functional properties while potentially utilizing cost-effective core materials. Among the many techniques enhancing the functional properties of engineering materials surfaces, vacuum methods play an important role in industrial practice. The aim of this Special Issue is to provide a platform where academics, industry experts, and researchers worldwide can share their research achievements and exchange experiences within the field of vacuum deposition and semiconductor applications. This SI warmly welcomes the works from the Conference on Chinese Vacuum Technologies and Semiconductor Applications 2023.
Topics of interest include but are not limited to:
- Theoretical and experimental research in vacuum thin-film deposition methods;
- Thin-film processes and related devices, including chemical vapour deposition (CVD); physical vapour deposition (PVD) and atomic layer deposition (ALD)...;
- The application of vacuum thin-film deposition, including memory, metal oxide semiconductor field effect transistors (MOSFETs), thin-film transistors (TFTs), sensors, ...
Prof. Dr. Hongliang Lu
Prof. Dr. Gang He
Guest Editors
Manuscript Submission Information
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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- vacuum thin-film deposition
- surface and interface
- memory device
- MOSFET
- thin-film transistors
- sensors
- semiconductor
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