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Special Issue "Magnetron Sputtering and Cathodic Arc-Deposited Thin Films and Its Applications"
A special issue of Coatings (ISSN 2079-6412).
Deadline for manuscript submissions: 30 September 2019.
Prof. Frederic Sanchette Website E-Mail
Univ Technol Troyes, ICD LASMIS, CNRS, UMR 6281, Antenne Nogent, Pole Technol Sud Champagn, F-52800 Nogent, France
Interests: high entropy alloys; energy; environment; fuel cells; PEMFC; SOFC; chemical vapor deposition; physical vapor deposition; ceramic, hydrogen; corrosion; thin film materials; nanomaterials and nanotechnology
Magnetron sputtering or cathodic arc-deposited thin films are now widely used on an industrial scale for various applications. The cathodic arc technique, which is characterized by high-ionized plasma, is used for hard coatings deposition on cutting or forming tools, whereas Magnetron sputtering technology is used for microelectronic, optic applications or for components (sensors, mems, etc.).
Many applications are addressed by these physical vapour deposition (PVD) technologies. This Special Issue is focused on links between deposition parameters, physico-chemical characteristics, and functional properties of thin films deposited by one of these methods. Papers with the “from deposition to application” approach are targeted. Topics of interest include, but are not limited to, the following:
- Cathodic arc and magnetron sputtering technologies evolution;
- Plasma diagnostic;-Structure, microstructure, and morphology;
- New thin films materials;
- Hard and barriers coatings;
- Low friction solid lubricants;
- Anti-corrosion and anti-biofouling, oxidation resistance;
- Films for biomedical;
- Films for energy devices (fuel cells, photovoltaic, concentrated solar thermal power applications…);
- Optical applications;
- Surface functionalization.
Prof. Dr. Frederic Sanchette
Prof. Dr. Alain Billard
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
- Magnetron sputtering
- Cathodic arc deposition
- Thin films
- Structure and microstructure
- Functional properties
The below list represents only planned manuscripts. Some of these manuscripts have not been received by the Editorial Office yet. Papers submitted to MDPI journals are subject to peer-review.
1. Effect of thermal stresses formed during air annealing of amorphous lanthanum cuprate thin films deposited on silicon substrate
Prof. Jean-François Pierson
2. Synthesis and oxidation behavior of orthorhombic MoAlB coatings
Jan-Ole Achenbacha, Rajib Sahub, Bernhard Völkera,b, Marcus Hansa,
Daniel Primetzhoferc, Danilo J. Miljanovica, Christina Scheua,b, Jochen M. Schneidera,b
aMaterials Chemistry, RWTH Aachen University, Kopernikusstr. 10, 52074 Aachen, Germany;
bMax-Planck-Institut für Eisenforschung GmbH, Max-Planck-Str. 1, 40237 Düsseldorf, Germany;
cDepartment of Physics and Astronomy, Uppsala University, Lägerhyddsvägen 1, 75120 Uppsala, Sweden
3. texture and stress evolution in sputtered HfN films deposited at oblique angles
Prof. Gregory Abadias
4. Prof. Albano Cavaleiro