Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering
Abstract
1. Introduction
2. Materials and Methods
3. Results and Discussion
4. Conclusions
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
References
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Power W | In | Sn | Zn | O |
---|---|---|---|---|
100 | 52.13 (±0.1) at % | 4.03 (±0.1) at % | 1.12 (±0.1) at % | 42.71 (±0.1) at % |
200 | 52.72 (±0.1) at % | 3.40 (±0.1) at % | 1.06 (±0.1) at % | 42.82 (±0.1) at % |
300 | 52.91 (±0.1) at % | 3.56 (±0.1) at % | 1.03 (±0.1) at % | 42.50 (±0.1) at % |
400 | 51.02 (±0.1) at % | 4.33 (±0.1) at % | 1.15 (±0.1) at % | 43.51 (±0.1) at % |
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Li, Z.-Y.; Chen, S.-C.; Huo, Q.-H.; Liao, M.-H.; Dai, M.-J.; Lin, S.-S.; Yang, T.-L.; Sun, H. Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering. Coatings 2019, 9, 715. https://doi.org/10.3390/coatings9110715
Li Z-Y, Chen S-C, Huo Q-H, Liao M-H, Dai M-J, Lin S-S, Yang T-L, Sun H. Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering. Coatings. 2019; 9(11):715. https://doi.org/10.3390/coatings9110715
Chicago/Turabian StyleLi, Zhi-Yue, Sheng-Chi Chen, Qiu-Hong Huo, Ming-Han Liao, Ming-Jiang Dai, Song-Sheng Lin, Tian-Lin Yang, and Hui Sun. 2019. "Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering" Coatings 9, no. 11: 715. https://doi.org/10.3390/coatings9110715
APA StyleLi, Z.-Y., Chen, S.-C., Huo, Q.-H., Liao, M.-H., Dai, M.-J., Lin, S.-S., Yang, T.-L., & Sun, H. (2019). Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering. Coatings, 9(11), 715. https://doi.org/10.3390/coatings9110715