Guan, H.; Lei, X.; Chu, Y.; Zhao, X.; Kuang, D.; Song, M.; Ling, M.; Hong, J. Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography. Photonics 2026, 13, 481. https://doi.org/10.3390/photonics13050481

AMA Style

Guan H, Lei X, Chu Y, Zhao X, Kuang D, Song M, Ling M, Hong J. Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography. Photonics. 2026; 13(5):481. https://doi.org/10.3390/photonics13050481

Chicago/Turabian Style

Guan, Hengrui, Xuefeng Lei, Yuheng Chu, Xinxin Zhao, Dapeng Kuang, Maoxin Song, Mingchun Ling, and Jin Hong. 2026. "Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography" Photonics 13, no. 5: 481. https://doi.org/10.3390/photonics13050481

APA Style

Guan, H., Lei, X., Chu, Y., Zhao, X., Kuang, D., Song, M., Ling, M., & Hong, J. (2026). Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography. Photonics, 13(5), 481. https://doi.org/10.3390/photonics13050481

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