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Editorial

Advanced Strategies in Thin Films Engineering by Magnetron Sputtering

1
Instituto de Ciencia de Materiales de Sevilla (CSIC-Universidad de Sevilla), Americo Vespucio 49, 41092 Sevilla, Spain
2
Institut FEMTO-ST, UMR 6174, CNRS, University Bourgogne Franche-comté, 15B, Avenue des Montboucons, 25030 Besançon, France
*
Authors to whom correspondence should be addressed.
Coatings 2020, 10(4), 419; https://doi.org/10.3390/coatings10040419
Received: 27 March 2020 / Accepted: 20 April 2020 / Published: 23 April 2020
(This article belongs to the Special Issue Advanced Strategies in Thin Film Engineering by Magnetron Sputtering)
This Special Issue contains a series of reviews and papers representing some recent results and some exciting perspectives focused on advanced strategies in thin films growth, thin films engineering by magnetron sputtering and related techniques. Innovative fundamental and applied research studies are then reported, emphasizing correlations between structuration process parameters, new ideas and approaches for thin films engineering and resulting properties of as-deposited coatings. View Full-Text
Keywords: magnetron sputtering; nanostructures; growth mechanism; functional properties; HiPIMS; oblique angle deposition magnetron sputtering; nanostructures; growth mechanism; functional properties; HiPIMS; oblique angle deposition
MDPI and ACS Style

Palmero, A.; Martin, N. Advanced Strategies in Thin Films Engineering by Magnetron Sputtering. Coatings 2020, 10, 419. https://doi.org/10.3390/coatings10040419

AMA Style

Palmero A, Martin N. Advanced Strategies in Thin Films Engineering by Magnetron Sputtering. Coatings. 2020; 10(4):419. https://doi.org/10.3390/coatings10040419

Chicago/Turabian Style

Palmero, Alberto, and Nicolas Martin. 2020. "Advanced Strategies in Thin Films Engineering by Magnetron Sputtering" Coatings 10, no. 4: 419. https://doi.org/10.3390/coatings10040419

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