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Journal: NanomaterialsVolume: 9Number: 55
Article: Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
- Authors:
- Hong-Ping Ma1,
- Jia-He Yang1 and
- Hong-Liang Lu1,*
- et al.
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