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Journal: Nanomaterials, 2019
Volume: 9
Number: 55

Article: Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
Authors: by Hong-Ping Ma, Jia-He Yang, Jian-Guo Yang, Li-Yuan Zhu, Wei Huang, Guang-Jie Yuan, Ji-Jun Feng, Tien-Chien Jen and Hong-Liang Lu
Link: https://www.mdpi.com/2079-4991/9/1/55

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