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Molecules 2012, 17(1), 527-555;

Recent Applications of the (TMS)3SiH Radical-Based Reagent

ISOF, Consiglio Nazionale delle Ricerche, 40129 Bologna, Italy
Institut de Science des Matériaux de Mulhouse IS2M, LRC CNRS 7228-ENSCMu-UHA, 15, rue Jean Starcky, 68057 Mulhouse Cedex, France
Author to whom correspondence should be addressed.
Received: 29 November 2011 / Revised: 29 December 2011 / Accepted: 2 January 2012 / Published: 6 January 2012
(This article belongs to the Special Issue Organosilicon Chemistry)


This review article focuses on the recent applications of tris(trimethylsilyl)silane as a radical-based reagent in organic chemistry. Numerous examples of the successful use of (TMS)3SiH in radical reductions, hydrosilylation and consecutive radical reactions are given. The use of (TMS)3SiH allows reactions to be carried out under mild conditions with excellent yields of products and remarkable chemo-, regio-, and stereoselectivity. The strategic role of (TMS)3SiH in polymerization is underlined with emphasis on the photo-induced radical polymerization of olefins and photo-promoted cationic polymerization of epoxides. View Full-Text
Keywords: tris(trimethylsilyl)silane; radical reactions; silyl radical; reduction; hydrosilylation; photopolymerization tris(trimethylsilyl)silane; radical reactions; silyl radical; reduction; hydrosilylation; photopolymerization

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This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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Chatgilialoglu, C.; Lalevée, J. Recent Applications of the (TMS)3SiH Radical-Based Reagent. Molecules 2012, 17, 527-555.

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