The properties of thin films are often influenced by the crystal’s preferred orientation. In the present study, we report the strong dependence of surface conductivity on the preferred orientation of TiN film that acts as the coating material f...
The wide application of Mg alloys has been restricted because of their poor corrosion and wear resistance. Titanium nitride ceramic films prepared via magnetron sputtering can improve the corrosion and wear resistance of Mg alloys. However, residual...
With the rapid development of the Internet of Things (IoT), micro-energy storage devices face increasing demands for miniaturization, high energy density, and high power density. Owing to their excellent electrical conductivity and mechanical strengt...
A series of experiments has been conducted to investigate the tribological properties of a TiN film sliding against GCr15 steel balls in ambient air, low vacuum and high vacuum environments. Various friction loads and sliding velocities were also app...
To suppress the Secondary Electron Yield (SEY) of Al2O3 ceramic surfaces for accelerator ceramic windows, a synergistic strategy integrating TiN film deposition and laser surface texturing was developed. TiN films were first deposited on Al2O3 substr...
In this work, to investigate the physical vapor deposition (PVD)-deposited TiN coating on the TiN(001) substrate, the process was simulated using the molecular dynamics (MD) method with the 2NN-MEAM (nearest-neighbor modified embedded atom method) po...
In this study, TiN films doped with different copper contents (TiCuN) were prepared by using direct current magnetron sputtering method. The effects of Cu doping on composition, structure, and mechanical properties of TiN films were studied by energy...
In this work, the deposition of titanium nitride (TiN) thin film using direct current (DC) sputtering technique and its application as diffusion barriers against copper interconnect was presented. The deposited film was analyzed by using X-ray diffra...
The measurement of cutting force is an effective method for machining condition monitoring in intelligent manufacturing. Titanium nitride films and silicon nitride films were prepared on 304 stainless steel substrates by DC-reactive magnetron sputter...
Ultrathin titanium nitride (TiN) is a novel material platform for constructing active metasurfaces in the near-infrared region (NIR). Here, we realized tunable polarization-selective absorption by gating ultrathin TiN in an Ultrathin TiN Grating Meta...
NiTi alloys and thin film/NiTi composites are extensively utilized in frictional environments, particularly those experiencing extreme temperature fluctuations. Current studies mainly focus on preparing wear-resistant films on NiTi alloy surfaces but...
Depleted uranium (DU) is oxidized readily due to its chemical activities, which limits its applications in nuclear industry. TiN film has been applied widely due to its good mechanical properties and its excellent corrosion resistance. In this work,...
The discovery of ferroelectricity in HfO2-based materials in 2011 provided new research directions and opportunities. In particular, for atomic layer deposited Hf0.5Zr0.5O2 (HZO) films, it is possible to obtain homogenous thin films with satisfactory...
In this study, TiN thin films fabricated based on the substrate temperature process parameters of a DC magnetron sputtering device and their characteristics are analyzed. TiN thin films are deposited on Si wafer (100) substrates by setting the substr...
The objective of this study was to investigate the effect of varying bias parameters (−50 V, −100 V, and −150 V) on the properties of TiN/CrN multilayer films deposited on Ti-6Al-4V alloy using the cathodic arc deposition (CAD) tech...
A direct current magnetron sputtering (DCMS) system at room temperature was applied to deposit the Ti/TiN/TiCN films. In order to research the effect of the microstructure of the TiN/TiCN layer on the Ti/TiN/TiCN films, the deposition time ratio of t...
Steel surface protection with hard coatings is essential in metalworking, yet developing high-performance coatings is challenging. TiAlSiN coatings grown on various substrates using commercial targets have been extensively studied, but consistent dat...
In this paper, TiN-Ni nanostructured composite films with different Ni contents are prepared using the magnetron sputtering method. The composition, microstructure, and mechanical properties of composite films are analyzed using an X-ray energy spect...
Deposition techniques of direct current and radio-frequency magnetron sputtering were used to separately prepare TiN/C microstructural composite layer and fluorinated diamond-like carbon (FDLC) film on monocrystalline silicon. The aim was to investig...
TiN thin films were obliquely bideposited with different subdeposit thicknesses. The morphology of the bideposited film was varied from a nano-zigzag array to a vertically grown columnar structure by reducing the subdeposit thickness. The principal i...
In this study, the effect of deposition temperature of TiN thin films deposited using the thermal atomic layer deposition (ALD) method was investigated. TiCl4 precursor and NH3 reactive gas were used, and the deposition rate, resistivity change, and...
Zinc–Tin Oxide (ZTO) films potentially offer desirable properties for next-generation devices and are considered promising candidates due to the following merits: (I) zinc and tin are abundant on Earth, with estimated reserves of approximately...
TiN-Ag ceramic coatings deposited by magnetron sputtering on silicon wafers and AISI F138 stainless-steel substrates with different Ag concentrations were evaluated for their application as decorative coatings. The results obtained indicated an almos...
TiCrAlN hard films based on TiN or CrN show superior properties in terms of hardness, wear resistance, and thermal stability due to the addition of alloying elements. AlCrTiN films based on AlN may have higher thermal shock properties, but the knowle...
Indium tin oxide (ITO) thin-film thermocouples monitor the temperature of hot section components in gas turbines. As an in situ measuring technology, the main challenge of a thin-film thermocouple is its installation on complex geometric surfaces. In...
This paper reports on the fabrication of indium-zinc-tin-oxide (IZTO) transparent conductive film deposited by direct current (DC) reactive magnetron sputtering. The electrical, structural, and optical properties of IZTO film were investigated by Hal...
Titanium nitride (TiN) thin film coatings were grown over silicon (
Top-contact bottom-gate thin film transistors (TFTs) with zinc-rich indium zinc tin oxide (IZTO) active layer were prepared at room temperature by radio frequency magnetron sputtering. Sintered ceramic target was prepared and used for deposition from...
The present study reports the tribological properties and residual stress of titanium chromium nitride (TiCrN) coatings. Thin films of TiCrN were deposited on tungsten carbide substrates at 400 °C in a vacuum of 5 × 10−6 mbar using th...
Recently, tin oxide (SnO2) has been the preferred thin film material for semiconductor devices such as thin-film transistors (TFTs) due to its low cost, non-toxicity, and superior electrical performance. However, the high oxygen vacancy (VO) concentr...
In this paper, we present a flexible, breathable and optically transparent metasurface with ultra-wideband absorption. The designed double layer of indium tin oxide (ITO) films with specific carved structure realizes absorption and electromagnetic (E...
The limited choice of materials for large area electronics limits the expansion of applications. Polycrystalline silicon (poly-Si) and indium gallium zinc oxide (IGZO) lead to thin-film transistors (TFTs) with high field-effect mobilities (>10 cm2...
We studied the impact of NF3 plasma treatment on the HfO2 gate insulator of amorphous tin oxide (a-SnOx) thin-film transistors (TFTs). The plasma treatment was for 0, 10, or 30 s. The HfO2 insulator demonstrated a slightly higher breakdown voltage, w...
The resistance to cavitation erosion and sliding wear of stainless steel grade AISI 304 can be improved by using physical vapor deposited (PVD) coatings. The aim of this study was to investigate the cavitation erosion and sliding wear mechanisms of m...
In this study, the Cr-Ti-B-N composite thin films with different Ti and B contents in the films were fabricated by a reactive magnetron sputtering system using chromium (Cr) and TiB2 targets. The microstructure, mechanical properties, and friction pr...
Nitrides of aluminum (Al) and titanium (Ti) mixtures have long been studied and used as commercial coatings because of their high hardness and high oxidation resistance due to the formation of an alumina layer on the coating surface. To fully underst...
Cavitation erosion severely limits the service life of marine hydraulic components. Magnetron sputtering was utilized to fabricate TiSiN/AlCrTiVNbN high-entropy nitride nanomultilayer films, whose modulation periods ranged from 4 nm to 23 nm. The eff...
The titanium nitride (Ti2N) films have good mechanical properties, such as high hardness and chemical stability, giving Ti2N good resistance to wear and corrosion. The properties of films deposited by PVD techniques are determined by their structure,...
TixZr1−xN hard films with Zr/(Zr+Ti) molar ratios from 20% to 80% were prepared by multi-arc ion plating using any two of elemental Ti, elemental Zr, and TiZr alloy targets. The as-deposited TixZr1−xN films displayed similar surface and fracture cros...
The solution-processed deposition of metal-oxide semiconducting materials enables the fabrication of large-area and low-cost electronic devices by using printing technologies. Additionally, the simple patterning process of these types of materials be...
In order to investigate the effect of Co contents on the structure and cavitation erosion property, NiTiAlCrCoxN films were prepared by the magnetron sputtering system. The X-ray diffractometer (XRD), the scanning electron microscope (SEM) and the en...
We focused on the importance of solvent evaporation governed by the temperature of the pre-annealing stage (TS) in solution-processed zinc tin oxide (ZTO) thin-film transistors (TFTs). We controlled TS based on the boiling point (BP) of the solvent u...
In this study, TiN, TiCN, and Ti-diamond-like carbon (Ti-DLC) films were coated on 316 L stainless steel (AISI 316 L) substrate surface by physical vapor deposition. The biocompatibility of the three films (TiN, TiCN, and Ti-DLC) and three metals (AI...
Metal oxide semiconductor material has great potential to act as window layer in p–n heterojunction solar cell thin film owing to low production cost and significant properties in photovoltaic mechanism. In this work, n-TiO2/ZnO bilayer thin fi...
In this study, we examined the effects of the annealing atmosphere on the electrical performance and stability of high-mobility indium-gallium-tin oxide (IGTO) thin-film transistors (TFTs). The annealing process was performed at a temperature of 180...
This study investigated the effect of purge gas flow rate and purge gas flow time on the properties of TiN thin films via chemical reaction simulation and the plasma-enhanced atomic layer deposition (PEALD) process along purge gas flow rates and time...
(AlCrMoNiTi)N high-entropy alloy nitride (HEAN) films were synthesized at various bias voltages using the co-filter cathodic vacuum arc (co-FCVA) deposition technique. This study systematically investigates the effect of bias voltage on the microstru...
The titanium nitride (TiN) columnar structure results in a rapid diffusion of copper atoms into the substrate along a vertical path. In this paper, the TiN columnar growth process was modified, which resulted in the deposition of amorphous-like films...
TiN and TiNxOy thin films share many properties such as electrical and optical properties. In this work, a comparison is conducted between TiN (with and without annealing at 400 °C in air and vacuum) and TiNxOy thin films deposited by using RF ma...
A series of (AlCrTiZrV)-Six-N films with different silicon contents were deposited on monocrystalline silicon substrates by direct-current (DC) magnetron sputtering. The films were characterized by the X-ray diffractometry (XRD), scanning electron mi...
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