Thin-Film Technology in Atomic Scale and Micro/Nano Manufacturing: From Preparation to Application
A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D：Materials and Processing".
Deadline for manuscript submissions: 15 March 2026 | Viewed by 447
Special Issue Editors
Interests: thin film materials; interface coupling; heterostructure; physical vapor deposition
Special Issue Information
Dear Colleagues,
The study of thin-film fabrication and characterization techniques holds significant scientific and practical value. At the fundamental research level, precise control over film composition, structure, and thickness helps uncover the distinctive physicochemical properties of low-dimensional materials, such as quantum confinement effects and interfacial coupling effects, providing a theoretical foundation for novel material design. In terms of technological applications, high-performance thin films serve as critical components in semiconductor devices, optoelectronic elements, and energy storage/conversion systems, where optimized synthesis and accurate characterization directly determine device performance. Furthermore, emerging thin-film technologies (flexible films, ultrathin two-dimensional materials) have driven advancements in wearable electronics, flexible displays, and other cutting-edge fields.
Therefore, in-depth research on thin-film preparation and characterization techniques is of great importance for advancing materials science and industrial innovation.
This Special Issue aims to present high-quality research papers, short communications, and review articles that focus on the atomic-scale and micro/nano-manufacturing field. Research areas may include (but are not limited to) the following:
- Magnetic/electrical thin films;
- Metal/semiconductor/insulating/ceramic thin films;
- Heterostructures and superlattices.
We look forward to receiving your contributions.
Prof. Dr. Fengguang Liu
Prof. Dr. Baicheng Mei
Guest Editors
Manuscript Submission Information
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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2100 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- growth of thin films
- interface coupling
- defect control
- material morphology characterization
- functional coatings
- nanoclusters
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