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Advances in Block Copolymers: Synthesis, Characterization and Applications

A special issue of Polymers (ISSN 2073-4360). This special issue belongs to the section "Polymer Analysis and Characterization".

Deadline for manuscript submissions: 31 October 2025 | Viewed by 569

Special Issue Editors


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Guest Editor
Aachen Maastricht Institute for Biobased Materials (AMIBM), Maastricht University, Urmonderbaan 22, 6167 RD Geleen, The Netherlands
Interests: polymer synthesis; polymer crystallization kinetics; structure–property relations of polymers; morphology of crystalline polymers

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Guest Editor
Dipartimento di Scienza dei Materiali, Università Milano Bicocca, Via R. Cozzi 53, 20125 Milano, Italy
Interests: synthesis and characterization of polymers; polymeric nanocomposites; micro- and mesoporous materials; solid state nuclear magnetic resonance spectroscopy
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Special Issue Information

Dear Colleagues,

Block copolymers are vital in driving forward research in polymer science and engineering. This Special Issue aims to highlight the diverse aspects of block copolymer research, showcasing significant progress in various areas such as synthesis, chemical modification, and self-assembly, as well as covering crystallization kinetic studies, which are crucial for understanding these materials’ behaviour under different conditions. This Issue also explores the impact of block copolymers on cutting-edge technologies such as 3D printing, hybrid materials, drug delivery, and energy storage, where they play a vital role in creating new materials with tailored properties.

As the Guest Editors, We believe that a significant contribution to the field of polymer science will be made by these studies. Original research papers and review articles related to block copolymers are warmly welcomed from leading research groups globally, ensuring a comprehensive and diverse representation of the latest developments in this dynamic field.

Dr. Maryam Safari
Prof. Dr. Roberto Simonutti
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Polymers is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2700 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • block copolymers
  • self-assembly
  • synthesis
  • crystallization
  • morphology
  • applications

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Published Papers (1 paper)

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Research

12 pages, 3536 KiB  
Article
Rapid Assembly of Block Copolymer Thin Films via Accelerating the Swelling Process During Solvent Annealing
by Tian-en Shui, Tongxin Chang, Zhe Wang and Haiying Huang
Polymers 2025, 17(9), 1242; https://doi.org/10.3390/polym17091242 - 2 May 2025
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Abstract
Block copolymer (BCP) lithography is widely regarded as a promising next-generation nanolithography technique. However, achieving rapid assembly with defect-free morphology remains a significant challenge for its practical application. In this study, we presented a facile and efficient solvent annealing method for fabricating well-ordered [...] Read more.
Block copolymer (BCP) lithography is widely regarded as a promising next-generation nanolithography technique. However, achieving rapid assembly with defect-free morphology remains a significant challenge for its practical application. In this study, we presented a facile and efficient solvent annealing method for fabricating well-ordered BCP thin films within minutes on both flat and topographically patterned substrates. By accelerating the swelling process, rapid film swelling was observed within just 10 s of annealing, leading to well-ordered morphologies in 1~3 min. Furthermore, we systematically investigated the influence of swelling ratio (SR) on film morphology by precisely tuning solvent vapor pressure. For cylinder-forming poly(styrene-block-2-vinylpyridine) (PS-b-P2VP) films, we identified three distinct SR-dependent ordering regimes: (I) Excessive SR led to a disordered morphology; (II) near-optimal SR balanced long-range and short-range orders, and a slight increase in SR enhanced the long-range order but introduced short-range defects. (III) Insufficient SR failed to provide adequate chain mobility, limiting long-range order development. These findings highlight the critical role of SR in controlling defect density in nanopatterned surfaces. Long-range-ordered BCP nanopatterns can only be achieved under optimal SR conditions that ensure sufficient chain mobility. We believe this rapid annealing strategy, which is also applicable to other solvent-based annealing systems for BCP films, may contribute to next-generation nanolithography for microfabrication. Full article
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