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Photonics
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Advances in Micro-Nano Optical Manufacturing
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Advances in Micro-Nano Optical Manufacturing

A special issue of Photonics (ISSN 2304-6732). This special issue belongs to the section "Optoelectronics and Optical Materials".

Deadline for manuscript submissions: 31 August 2027 | Viewed by 8399

Editors

Dr. Shuo Qiao

E-Mail Website
Guest Editor
Laboratory of Science and Technology on Integrated Logistics Support, National University of Defense Technology, Changsha 410003, China
Interests: micro-nano manufacturing; optical components; nanoscale fabrication technologies; process-characterization co-design; precision measurements and metrology; freeform design; manufacturing technology; opto-mechanical design; additive micro-optics; advanced optical manufacturing and detection
Special Issues, Collections and Topics in MDPI journals
Dr. Xing Peng

E-Mail Website
Guest Editor
College of Intelligent Science and Technology, National University of Defense Technology, Changsha 410003, China
Interests: precision manufacturing; micro-nano optics; defect inspection; optical design; illumination design; visible light communication; machine vision; image processing
Special Issues, Collections and Topics in MDPI journals
Dr. Xiao Shen

E-Mail
Guest Editor
College of Intelligence Science and Technology, National University of Defense Technology, Changsha 410073, China
Interests: process-characterization co-design; optical design; image fusion; defect inspection; machine learning; metasurface manufacturing; ultra-precision maching

Special Issue Information

Dear Colleagues,

The field of micro-nano optical manufacturing has witnessed transformative progress in recent years, driven by the urgent need for subwavelength-scale optical components and systems across photonics, biomedical sensing, and quantum technology applications. Breakthroughs in nanoscale fabrication methodologies, ultra-precision metrology, and functional material engineering are enabling unprecedented control over light–matter interactions at micro-nano dimensions. This Special Issue highlights cutting-edge innovations in micro-nano optical manufacturing technologies, with a particular focus on bridging fundamental research to industrial-scale implementations. Key areas of interest include, but are not limited to, the following: advanced nanolithography techniques (e.g., multi-photon lithography, nanoimprint replication), functional micro-optics fabrication (including metasurfaces, photonic crystals, and hybrid plasmonic devices), precision characterization methods for sub-100 nm features, and system-level integration strategies for wafer-scale optical systems. Emerging topics such as quantum dot/nanorod manufacturing, AI-driven process optimization, and 3D-printed micro-optical arrays are particularly encouraged.

We believe that this collection of articles will serve as a valuable resource for those interested in micro-nano optical manufacturing and its applications. We hope that it will inspire further innovation and collaboration in the field, leading to new perspectives and breakthroughs in micro-nano optical manufacturing. It is within this context that we announce the Special Issue of Photonics on ‘Micro-Nano Optical Manufacturing’.

This Special Issue intends to provide a timely opportunity for scientists, researchers, as well as engineers to discuss and summarize the latest inspection methods in industrial applications. We invite papers that include, but are not exclusive to, the following topics: micro-nano manufacturing, optical component, nanoscale fabrication technologies, process-characterization co-design, optical design, image fusion, defect inspection, machine learning, metasurface manufacturing, ultra-precision machining, machine vision, functional optical materials, precision measurements and metrology, freeform design, manufacturing technology, opto-mechanical design, additive micro-optics, and advanced optical manufacturing and detection. Both theoretical and experimental studies are welcome, as are comprehensive reviews and survey papers.

Dr. Shuo Qiao
Dr. Xing Peng
Dr. Xiao Shen
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-anonymized peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • micro-nano manufacturing
  • optical component
  • nanoscale fabrication technologies
  • process-characterization co-design
  • optical design
  • image fusion
  • defect inspection
  • machine learning
  • metasurface manufacturing
  • ultra-precision machining
  • machine vision
  • functional optical materials
  • precision measurements and metrology
  • freeform design
  • manufacturing technology
  • opto-mechanical design
  • additive micro-optics
  • advanced optical manufacturing and detection

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Published Papers (5 papers)

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Research

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10 pages, 5013 KB  
Communication
Sandwich-Multilayer-Film Perfect Absorber Spanning the Entire Visible Spectrum
by Xuan Zou, Hong Li, Yijia Huang, Ling Li and Jie Zheng
Photonics 2026, 13(7), 652; https://doi.org/10.3390/photonics13070652 - 5 Jul 2026
Viewed by 421
Abstract
High-efficiency perfect absorption, spanning the entire visible region, plays an increasingly significant role in applications such as solar energy harvesting, photodetection, and thermal radiation management. However, the complexity and manufacturing difficulty of the currently proposed structures hinder large-scale application. In this work, we [...] Read more.
High-efficiency perfect absorption, spanning the entire visible region, plays an increasingly significant role in applications such as solar energy harvesting, photodetection, and thermal radiation management. However, the complexity and manufacturing difficulty of the currently proposed structures hinder large-scale application. In this work, we propose a broadband perfect absorber based on a tungsten–silicon nitride–tungsten (W-Si3N4-W) sandwich multilayer film. We combine the unique broadband absorption capability and high-temperature stability of material W with the low-loss characteristic of material Si3N4. By optimizing the geometrical parameters of the structure, we successfully achieved an average absorption efficiency exceeding 94% across a wide wavelength ranging from 500 nm to 900 nm. This work paves the way for developing high-performance, stable, and broadband absorption devices. Full article
(This article belongs to the Special Issue Advances in Micro-Nano Optical Manufacturing)
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16 pages, 3467 KB  
Article
Robust Four-Wavelength Achromatic Metalens Design for Long Wave Infrared Multispectral Focusing
by Junya Wang, Jun Chang, Ting Zheng and Yanhong Xie
Photonics 2026, 13(7), 648; https://doi.org/10.3390/photonics13070648 - 3 Jul 2026
Viewed by 592
Abstract
Long wave infrared metalenses provide a promising route toward compact multispectral optical systems, including spaceborne imaging and sensing payloads. However, achromatic focusing at separated LWIR wavelength channels remains challenging because the required phase relation must be maintained together with sufficient dispersion control and [...] Read more.
Long wave infrared metalenses provide a promising route toward compact multispectral optical systems, including spaceborne imaging and sensing payloads. However, achromatic focusing at separated LWIR wavelength channels remains challenging because the required phase relation must be maintained together with sufficient dispersion control and optical throughput. Here, we propose a robust four-wavelength achromatic metalens operating at 8, 10, 12, and 14 μm based on a meta-atom library controlled by nanopillar radius and height. The library feasibility is evaluated before layout optimization to verify whether the required phase and dispersion responses are accessible within the selected unit cell space. By introducing nanopillar height as an additional degree of freedom, the library achieves a phase coverage ratio above 0.92 at all four wavelengths. The optimized metalens achieves a mean absolute focusing efficiency (AFE) of 69.5% with suppressed chromatic focal shift. Monte Carlo perturbation analysis and full device FDTD simulations further confirm the robustness and focusing stability of the design. This work provides a feasibility-driven strategy for robust multispectral LWIR achromatic metalenses. Full article
(This article belongs to the Special Issue Advances in Micro-Nano Optical Manufacturing)
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11 pages, 3142 KB  
Article
Processing Maps and Nano-IR Diagnostics of Type I Modifications in Mid-IR Germanate-Based Optical Glass
by Paul Mathieu, Nadezhda Shchedrina, Florence De La Barrière, Guillaume Druart and Matthieu Lancry
Photonics 2026, 13(2), 197; https://doi.org/10.3390/photonics13020197 - 16 Feb 2026
Viewed by 928
Abstract
Mid-IR flat/integrated optics require low-loss, programmable phase control. We investigate femtosecond laser direct writing (FLDW) in aluminogermanate glass (Corning 9754), first mapping the processing landscape to delineate no modification, Type I index increase, and spatial broadening regimes. We then operate in a non-accumulating [...] Read more.
Mid-IR flat/integrated optics require low-loss, programmable phase control. We investigate femtosecond laser direct writing (FLDW) in aluminogermanate glass (Corning 9754), first mapping the processing landscape to delineate no modification, Type I index increase, and spatial broadening regimes. We then operate in a non-accumulating regime that provides a broad, stable writing window. Quantitative-phase microscopy yields Δφ and a monotonic Δn with optically limited cross-sections compatible with low loss. Transmission spectroscopy shows high values (about 90% up to 4 µm) and no additional absorptions across the near-IR and mid-IR range. FTIR reveals a redshift of the Ge–O–(Ge/Al) stretching envelope from ≈1 µJ, correlating with the high Δn onset. s-SNOM at 925 cm−1 resolves the written line as reduced near-field amplitude and decreased phase, confirming a local complex permittivity change consistent with densification-driven Type I tracks. Together, these results define practical conditions for on-demand mid-IR flat/GRIN/Fresnel optics by FLDW in this commercial mid-IR transparent glass. Full article
(This article belongs to the Special Issue Advances in Micro-Nano Optical Manufacturing)
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31 pages, 12794 KB  
Article
Enhanced Defect Detection in Additive Manufacturing via Virtual Polarization Filtering and Deep Learning Optimization
by Xu Su, Xing Peng, Xingyu Zhou, Hongbing Cao, Chong Shan, Shiqing Li, Shuo Qiao and Feng Shi
Photonics 2025, 12(6), 599; https://doi.org/10.3390/photonics12060599 - 11 Jun 2025
Cited by 7 | Viewed by 4260
Abstract
Additive manufacturing (AM) is widely used in industries such as aerospace, medical, and automotive. Within this domain, defect detection technology has emerged as a critical area of research focus in the quality inspection phase of AM. The main challenge lies in that under [...] Read more.
Additive manufacturing (AM) is widely used in industries such as aerospace, medical, and automotive. Within this domain, defect detection technology has emerged as a critical area of research focus in the quality inspection phase of AM. The main challenge lies in that under extreme lighting conditions, strong reflected light obscures defect feature information, leading to a significant decrease in the defect detection rate. This paper introduces a novel methodology for intelligent defect detection in AM components with reflective surfaces, leveraging virtual polarization filtering (IEVPF) and an improved YOLO V5-W model. The IEVPF algorithm is designed to enhance image quality through the virtual manipulation of light polarization, thereby improving defect visibility. The YOLO V5-W model, integrated with CBAM attention, DenseNet connections, and an EIoU loss function, demonstrates superior performance in defect identification across various lighting conditions. Experiments show a 40.3% reduction in loss, a 10.8% improvement in precision, a 10.3% improvement in recall, and a 13.7% improvement in mAP compared to the original YOLO V5 model. Our findings highlight the potential of combining virtual polarization filtering with advanced deep learning models for enhanced AM surface defect detection. Full article
(This article belongs to the Special Issue Advances in Micro-Nano Optical Manufacturing)
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Review

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21 pages, 3987 KB  
Review
Review of Nanoscale Precision Shape and Property Control Manufacturing Technology for Monocrystalline Silicon
by Shuo Qiao, Zizhang Wang, Zhangfu Huang, Bo Zhang and Xiaoshu Xu
Photonics 2026, 13(7), 635; https://doi.org/10.3390/photonics13070635 - 30 Jun 2026
Viewed by 1238
Abstract
Monocrystalline silicon, with its high refractive index, high infrared transmittance, and excellent dimensional stability, serves as a key optical component in high-energy laser systems, infrared imaging, and guidance fields. Its processing quality directly affects the performance indicators of related systems. To address the [...] Read more.
Monocrystalline silicon, with its high refractive index, high infrared transmittance, and excellent dimensional stability, serves as a key optical component in high-energy laser systems, infrared imaging, and guidance fields. Its processing quality directly affects the performance indicators of related systems. To address the challenges of nanoscale precision shape and property control during processing, methods such as ultra-precision cutting, magnetorheological polishing, laser micromachining, ion beam processing, plasma etching, and chemical–mechanical polishing have been adopted to improve the surface shape accuracy and repair defects of monocrystalline silicon components. This paper reviews the research progress of key technologies, including nanoscale precision surface shape control manufacturing technology, nanoscale precision property control generation methods, and combined processes for its nanoscale shape and property control, providing technical support for achieving nanoscale precision shape and property control manufacturing of monocrystalline silicon components. Full article
(This article belongs to the Special Issue Advances in Micro-Nano Optical Manufacturing)
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