Search for Articles:
Title / Keyword
Author / Affiliation / Email
Journal
Article Type
 
 
Advanced Search
 
Section
Special Issue
Volume
Issue
Number
Page
 
3.5
2.1
Journals
Photonics
Special Issues
Innovative Optical Technologies in Advanced Manufacturing
Due to scheduled maintenance work on our database systems, there may be short service disruptions on this website between 10:00 and 11:00 CEST on June 14th.
share announcement

Innovative Optical Technologies in Advanced Manufacturing

A special issue of Photonics (ISSN 2304-6732). This special issue belongs to the section "Optical Interaction Science".

Deadline for manuscript submissions: 31 January 2026 | Viewed by 1635

Special Issue Editors

Dr. Ci Song

E-Mail Website
Guest Editor
College of Intelligent Science and Technology, National University of Defense Technology, Changsha 410073, China
Interests: ultra-precision polishing; magnetorheological finishing; ion beam polishing; AR; precision engineering; ultra smooth; advanced optical fabrication; low damage
Special Issues, Collections and Topics in MDPI journals
Dr. Xing Peng

E-Mail
Guest Editor
College of Intelligent Science and Technology, National University of Defense Technology, Changsha 410073, China
Interests: precision manufacturing; micro-nano optics; defect inspection; optical design; illumination design; visible light communication; machine vision; image processing
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

The field of advanced manufacturing has seen significant advancements in recent years, driven by the increasing demand for high-performance optical systems in diverse applications. New materials, fabrication techniques, and computational tools are enabling researchers to explore novel approaches to optical design that have the potential to revolutionize the field. This Special Issue on "Innovative Optical Technologies in Advanced Manufacturing" showcases the latest research and developments in optical technology, highlighting innovative concepts, methodologies, and practical applications. Key areas covered in this Special Issue include but are not limited to advanced materials, measurement and metrology, precision manufacturing, optical design, computational imaging, image processing, and advanced manufacturing.

We believe that this collection of articles will serve as an invaluable resource for professionals seeking to advance the frontiers of advanced manufacturing through innovative optical technologies. We hope it will inspire further innovation and foster collaboration among scientists, researchers, and engineers, ultimately leading to new perspectives and breakthroughs in this field. It is within this context that we announce the Special Issue of Photonics on “Innovative Optical Technologies in Advanced Manufacturing”.

This Special Issue intends to provide a timely opportunity for experts to discuss and summarize the most recent advancements and challenges in innovative optical technologies for advanced manufacturing. We invite submissions that include but are not limited to the topics mentioned above. Both theoretical and experimental studies, along with comprehensive review and survey papers, are welcome.

Dr. Ci Song
Dr. Xing Peng
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • advanced materials
  • measurement and metrology
  • precision manufacturing
  • optical design
  • computational imaging
  • image processing
  • advanced manufacturing
  • detection technology
  • process monitoring
  • machine learning

Benefits of Publishing in a Special Issue

  • Ease of navigation: Grouping papers by topic helps scholars navigate broad scope journals more efficiently.
  • Greater discoverability: Special Issues support the reach and impact of scientific research. Articles in Special Issues are more discoverable and cited more frequently.
  • Expansion of research network: Special Issues facilitate connections among authors, fostering scientific collaborations.
  • External promotion: Articles in Special Issues are often promoted through the journal's social media, increasing their visibility.
  • Reprint: MDPI Books provides the opportunity to republish successful Special Issues in book format, both online and in print.

Further information on MDPI's Special Issue policies can be found here.

Published Papers (3 papers)

Download All Papers
Order results
Result details
Show export options expand_more Show export options expand_less
Select all
Export citation of selected articles as:

Research

14 pages, 1912 KiB  
Article
Optical Properties of Near-Infrared Phosphor and Its Application in the Fabrication of Broadband Wavelength Emitters
by Thi-Hanh-Thu Vu, Trong-Nam Tran and Quang-Khoi Nguyen
Photonics 2025, 12(6), 606; https://doi.org/10.3390/photonics12060606 - 12 Jun 2025
Abstract
Herein, we study a method for developing a broad-emission emitter that can emit radiation from the visible light to NIR regions. Firstly, an NIR phosphor’s optical properties (e.g., scattering vs. weight concentration, conversion efficiency, and emission spectra under blue and red light excitation) [...] Read more.
Herein, we study a method for developing a broad-emission emitter that can emit radiation from the visible light to NIR regions. Firstly, an NIR phosphor’s optical properties (e.g., scattering vs. weight concentration, conversion efficiency, and emission spectra under blue and red light excitation) are investigated. Then, pcW-LEDs encapsulated with NIR down-conversion phosphor samples are prepared to test these optical properties. The results show that pcW-LEDs encapsulated with the NIR phosphor at different weight concentrations of 10.0%, 12.5%, and 15.5%, respectively, emit a broadband emission from 400 nm to 900 nm. The EQE values of the pcW-LEDs encapsulated with NIR phosphor at weight concentrations of 10%, 12.5%, and 15.0% are 26%, 23%, and 19%, respectively. The correlated color temperatures of these samples are 5767 K, 5940 K, and 6068 K, respectively. The obtained radiant fluxes of the samples are 26 mW, 22 mW, and 18 mW, respectively, at an injection current of 50 mA. Full article
(This article belongs to the Special Issue Innovative Optical Technologies in Advanced Manufacturing)
►▼ Show Figures

Figure 1

10 pages, 3701 KiB  
Article
Mechanism of Impurity Content in Degradation and Damage Characteristics of Calcium Fluoride Crystals by X-Ray and Deep-Ultraviolet Laser Irradiation
by Ping Han, Dapeng Jiang, Huamin Kou, Rongrong Liu, Qinghui Wu, Zhonghan Zhang, Zhen Zhang, Chong Shan, Chongyun Shao, Yafei Lian, Yuanan Zhao, Xing Peng and Liangbi Su
Photonics 2025, 12(6), 579; https://doi.org/10.3390/photonics12060579 - 6 Jun 2025
Viewed by 151
Abstract
Calcium fluoride (CaF2) crystals are widely utilized in deep-ultraviolet (DUV) lithography due to their excellent optical properties. The laser-induced degradation and damage of CaF2 crystals is a critical concern that restricts its extended application. Impurities of CaF2 crystal are [...] Read more.
Calcium fluoride (CaF2) crystals are widely utilized in deep-ultraviolet (DUV) lithography due to their excellent optical properties. The laser-induced degradation and damage of CaF2 crystals is a critical concern that restricts its extended application. Impurities of CaF2 crystal are considered a key factor affecting its laser resistance. Establishing the quantitative relationship and mechanism of impurity content impacting the degradation and damage characteristics of CaF2 crystal is essential. This study investigated the characteristics of different impurity contents affecting the degradation and laser-induced damage thresholds (LIDTs) of CaF2 crystals under X-ray and 193 nm pulsed laser irradiations, and quantitatively analyzed the degradation process and mechanism. Our findings demonstrate that impurities at ppm levels significantly diminish the transmittance of CaF2 crystals across various wavelengths following X-ray irradiation. In contrast, these impurities have a negligible effect on the LIDT test results, suggesting distinct damage mechanisms between X-ray and laser irradiation. This study provides valuable insights for optimizing the CaF2 crystal fabrication process and enhancing irradiation resistance. Full article
(This article belongs to the Special Issue Innovative Optical Technologies in Advanced Manufacturing)
►▼ Show Figures

Figure 1

20 pages, 4326 KiB  
Article
Real-Time Polarimetric Imaging and Enhanced Deep Learning Model for Automated Defect Detection of Specular Additive Manufacturing Surfaces
by Dingkang Li, Xing Peng, Hongbing Cao, Yuanpeng Xie, Shiqing Li, Xiang Sun and Xinjie Zhao
Photonics 2025, 12(3), 243; https://doi.org/10.3390/photonics12030243 - 9 Mar 2025
Viewed by 789
Abstract
Additive manufacturing (AM) technology has found extensive applications in aerospace, medical, and automotive fields. Defect detection technology remains a research focus in AM process monitoring. While machine learning and neural network algorithms have recently achieved significant advancements in innovative applications for AM defect [...] Read more.
Additive manufacturing (AM) technology has found extensive applications in aerospace, medical, and automotive fields. Defect detection technology remains a research focus in AM process monitoring. While machine learning and neural network algorithms have recently achieved significant advancements in innovative applications for AM defect detection, practical implementations still face challenges, including insufficient detection accuracy and poor system robustness. To address these limitations, this study proposes the YOLOv5-CAD defect detection model. Firstly, the convolutional block attention module (CBAM) is introduced into the core feature extraction module C3 of the backbone network to enhance attention to critical information and improve multi-scale defect target adaptability. Secondly, the original CIoU loss function is replaced with the Alpha-IoU loss function to accelerate network convergence and strengthen system robustness. Additionally, a fully decoupled detection head substitutes the original coupled head in the YOLOv5s model, separating the object classification and bounding box regression tasks to improve detection accuracy. Finally, a polarization technology-based visual monitoring system is developed to acquire defect images of laser AM workpieces, establishing the model’s training sample database. Compared with YOLOv5, the proposed model demonstrates a 2.5% improvement in precision (P), 2.2% enhancement in recall (R), 3.1% increase in mean average precision (mAP50), and 3.2% elevation in mAP50-95. These quantitative improvements confirm the model’s capability to provide robust and real-time technical solutions for industrial AM quality monitoring, effectively addressing current limitations in defect detection accuracy and system reliability. Full article
(This article belongs to the Special Issue Innovative Optical Technologies in Advanced Manufacturing)
►▼ Show Figures

Figure 1

Show export options expand_more Show export options expand_less
Select all
Export citation of selected articles as:
 
Displaying articles 1-3
Back to TopTop