Optical and Photonic Devices: From Design to Nanofabrication

A special issue of Photonics (ISSN 2304-6732).

Deadline for manuscript submissions: 28 February 2025 | Viewed by 1045

Special Issue Editors


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Guest Editor
Department of Electrical and Systems Engineering, Washington University in St. Louis 1 Brookings Drive, St. Louis 63130, MO, USA
Interests: integrated photonics; microresonators; nonlinear optics; non-Hermitian physics; optical sensing

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Guest Editor
School of Physics, Nankai University, 94 Weijin Road, Tianjin 300071, China
Interests: integrated photonics; nonlinear optics; electro-optic modulation; microresonators; nanofabrication

Special Issue Information

Dear Colleagues,

In recent decades, with the development of advanced design and nanofabrication technology, optical and photonic devices have catalyzed revolutionary progress in scientific and industrial research. These devices underpin crucial fundamentals of modern technology, ranging from telecommunication to computing, renewable energy to medical diagnostics. Researchers delve into the modeling, design, and practical realization of various devices, exploring intriguing areas such as photonic integrated circuits, metamaterials, photonic crystals, two-dimensional materials, hybrid/heterogeneous integration methods, as well as advanced nanofabrication techniques. These studies not only underscore the pivotal role of optical and photonic devices in shaping our technological landscape but also guide the path toward future innovations.

We are pleased to invite contributions to this Special Issue of Photonics, entitled “Optical and Photonic Devices: From Design to Nanofabrication.” This Special Issue aims to highlight recent progress for optical/photonic devices, focusing on innovative design methods, advanced manufacturing technologies, and evaluations of system performance. In this Special Issue, both original research articles and reviews are welcome. Research areas may include (but are not limited to) the following:

  • Photonic integrated circuits (PICs), including diverse material platforms (Si, Si3N4, LiNbO3, LiTaO3, AlN, InP, AlGaAs, ITO, polymer, Ge-Sb-Te, etc.) and intriguing applications (light source, modulator, detector, etc.);
  • Nanodevices in optics/photonics, such as metamaterials, photonic crystals, and nanoplasmonic structures;
  • Two-dimensional (2D) or thin-film materials in optics or photonics;
  • Hybrid or heterogenous photonic integration techniques;
  • Advanced manufacturing technologies or instruments, such as lithography, dry/wet processes, deposition, and metrology;
  • Inverse design or optimization algorithms for optics or photonics;
  • Optical components for augmented reality (AR), virtual reality (VR), and mixed reality (MR).

Dr. Wenbo Mao
Dr. Zhenzhong Hao
Guest Editors

Manuscript Submission Information

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Keywords

  • photonic integrated circuits
  • metamaterials
  • 2D photonics
  • hybrid/heterogenous integration
  • advanced manufacturing
  • nanofabrication
  • optical design

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Published Papers (1 paper)

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Research

12 pages, 3151 KiB  
Article
SuperNANO: Enabling Nanoscale Laser Anti-Counterfeiting Marking and Precision Cutting with Super-Resolution Imaging
by Yiduo Chen, Bing Yan, Liyang Yue, Charlotte L. Jones and Zengbo Wang
Photonics 2024, 11(9), 846; https://doi.org/10.3390/photonics11090846 - 5 Sep 2024
Viewed by 684
Abstract
In this paper, we present a unique multi-functional super-resolution instrument, the SuperNANO system, which integrates real-time super-resolution imaging with direct laser nanofabrication capabilities. Central to the functionality of the SuperNANO system is its capacity for simultaneous nanoimaging and nanopatterning, enabling the creation of [...] Read more.
In this paper, we present a unique multi-functional super-resolution instrument, the SuperNANO system, which integrates real-time super-resolution imaging with direct laser nanofabrication capabilities. Central to the functionality of the SuperNANO system is its capacity for simultaneous nanoimaging and nanopatterning, enabling the creation of anti-counterfeiting markings and precision cutting with exceptional accuracy. The SuperNANO system, featuring a unibody superlens objective, achieves a resolution ranging from 50 to 320 nm. We showcase the instrument’s versatility through its application in generating high-security anti-counterfeiting features on an aluminum film. These ‘invisible’ security features, which are nanoscale in dimension, can be crafted with arbitrary shapes at designated locations. Moreover, the system’s precision is further evidenced by its ability to cut silver nanowires to a minimum width of 50 nm. The integrated imaging and fabricating functions of the SuperNANO make it a pivotal tool for a variety of applications, including nanotrapping, sensing, cutting, welding, drilling, signal enhancement, detection, and nanoscale laser treatment. Full article
(This article belongs to the Special Issue Optical and Photonic Devices: From Design to Nanofabrication)
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