Metal Oxide Thin Films: Synthesis, Characterization and Applications

Dear colleagues,

The last two decades have seen an intensive improvement in thin film deposition methods, enabling the precise coating of surfaces at the nanoscale. Today, it is possible to coat surfaces with complex compositions and synthesize multilayers, enabling the development of synergistic effects through the mutual interaction of such layers. The deposition of complex structures allows for the development of new technologies, with recent advances in deposition techniques further miniaturizing electronic devices.

The development of these new technologies towards scaling down the size of the produced devices requires accurate control of the deposition process. The latter then allows tailoring thin films and nanodevices to ones desires. The recent advances are not only limited to nanoelectronics but are applicable to every field, viz., anti-corrosion coating, biocidal coating, or photovoltaic devices, in order to cope with the present demands of the society. The last two decades have also witnessed the accelerated development of atomic layer deposition processes that enable the conformal coating at nanoscale now up-scalable to larger surface areas.

This Special Issue will compile recent developments in the field of metal oxide thin film deposition.  The articles presented in this Special Issue will cover various topics, ranging from but not limited to the optimization of deposition methods, thin films preparations, the functionalization of surfaces with targeted applications, nanosensors, catalysis, electronic devices, biocidal coating, and the synthesis of nanostructures via the accurate control of thin film deposition methods, among others. Topics are open to metal oxide thin film deposition and characterization for the development of applications.

Prof. Dr. Erwan Rauwel
Dr. Protima Rauwel
Guest Editors

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