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Open AccessArticle

Origin of Mangetotransport Properties in APCVD Deposited Tin Oxide Thin Films

1
Ruđer Bošković Institute, Bijenička cesta 54, 10000 Zagreb, Croatia
2
Institute of Physics, Bijenička cesta 46, 10000 Zagreb, Croatia
3
High Field Magnet Laboratory (HFML-EMFL), Institute for Molecules and Materials, Radboud University, Toernooiveld7, 6525 ED Nijmegen, The Netherlands
4
Elettra–Sincrotrone Trieste S.C.p.A., SS 14, km 163.5, 34149 Basovizza, Italy
5
Central European Research Infrastructure Consortium, Strada Statale 14, km 163.5, 34149 Basovizza, Italy
*
Author to whom correspondence should be addressed.
Materials 2020, 13(22), 5182; https://doi.org/10.3390/ma13225182
Received: 7 October 2020 / Revised: 9 November 2020 / Accepted: 13 November 2020 / Published: 17 November 2020
(This article belongs to the Special Issue Metal Oxide Thin Film: Synthesis, Characterization and Application)
Transparent conducting oxides (TCO) with high electrical conductivity and at the same time high transparency in the visible spectrum are an important class of materials widely used in many devices requiring a transparent contact such as light-emitting diodes, solar cells and display screens. Since the improvement of electrical conductivity usually leads to degradation of optical transparency, a fine-tuning sample preparation process and a better understanding of the correlation between structural and transport properties is necessary for optimizing the properties of TCO for use in such devices. Here we report a structural and magnetotransport study of tin oxide (SnO2), a well-known and commonly used TCO, prepared by a simple and relatively cheap Atmospheric Pressure Chemical Vapour Deposition (APCVD) method in the form of thin films deposited on soda-lime glass substrates. The thin films were deposited at two different temperatures (which were previously found to be close to optimum for our setup), 590 °C and 610 °C, and with (doped) or without (undoped) the addition of fluorine dopants. Scanning Electron Microscopy (SEM) and Grazing Incidence X-ray Diffraction (GIXRD) revealed the presence of inhomogeneity in the samples, on a bigger scale in form of grains (80–200 nm), and on a smaller scale in form of crystallites (10–25 nm). Charge carrier density and mobility extracted from DC resistivity and Hall effect measurements were in the ranges 1–3 × 1020 cm−3 and 10–20 cm2/Vs, which are typical values for SnO2 films, and show a negligible temperature dependence from room temperature down to −269 °C. Such behaviour is ascribed to grain boundary scattering, with the interior of the grains degenerately doped (i.e., the Fermi level is situated well above the conduction band minimum) and with negligible electrostatic barriers at the grain boundaries (due to high dopant concentration). The observed difference for factor 2 in mobility among the thin-film SnO2 samples most likely arises due to the difference in the preferred orientation of crystallites (texture coefficient). View Full-Text
Keywords: tin oxide; thin films; atmospheric pressure chemical vapour deposition transport properties; magnetoresistance; impedance spectroscopy; charge carrier mobility tin oxide; thin films; atmospheric pressure chemical vapour deposition transport properties; magnetoresistance; impedance spectroscopy; charge carrier mobility
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MDPI and ACS Style

Juraić, K.; Gracin, D.; Čulo, M.; Rapljenović, Ž.; Plaisier, J.R.; Hodzic, A.; Siketić, Z.; Pavić, L.; Bohač, M. Origin of Mangetotransport Properties in APCVD Deposited Tin Oxide Thin Films. Materials 2020, 13, 5182. https://doi.org/10.3390/ma13225182

AMA Style

Juraić K, Gracin D, Čulo M, Rapljenović Ž, Plaisier JR, Hodzic A, Siketić Z, Pavić L, Bohač M. Origin of Mangetotransport Properties in APCVD Deposited Tin Oxide Thin Films. Materials. 2020; 13(22):5182. https://doi.org/10.3390/ma13225182

Chicago/Turabian Style

Juraić, Krunoslav; Gracin, Davor; Čulo, Matija; Rapljenović, Željko; Plaisier, Jasper R.; Hodzic, Aden; Siketić, Zdravko; Pavić, Luka; Bohač, Mario. 2020. "Origin of Mangetotransport Properties in APCVD Deposited Tin Oxide Thin Films" Materials 13, no. 22: 5182. https://doi.org/10.3390/ma13225182

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