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Advances in Optical Instrument and Measurement Technology

A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Optics and Lasers".

Deadline for manuscript submissions: closed (20 April 2025) | Viewed by 8651

Special Issue Editors


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Guest Editor
Key Laboratory of Luminescence and Optical Information of Ministry of Education, Beijing Jiaotong University, Beijing 100044, China
Interests: optical metrology; image processing; optical sensors
School of Physical Science and Engineering, Beijing Jiaotong University, Beijing 100044, China
Interests: photoelectric detection and photoelectric sensing; laser measurement; machine vision measurement; gas imaging detection
Special Issues, Collections and Topics in MDPI journals
Key Laboratory of Luminescence and Optical Information of Ministry of Education, Beijing Jiaotong University, Beijing 100044, China
Interests: laser measurement; laser sensing; infrared gas detection; TDLAS; CEAS; structured light measurement
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

In recent years, with the development of laser sources, measurement approaches and new materials, many new technologies or applications of measurement and new optical instruments have appeared. Therefore, this Special Issue is intended for the presentation of new ideas and experimental results in the field of high-performance optical instruments and measurement technology. Potential topics include, but are not limited to: optical design, fabrication and testing; ultrafast optic development; computational optical imaging; analog image processing with optical metasurfaces and metamaterials; novel techniques in microscopy; fiber-optic sensors; laser measurement; digital holographic metrology and sensing; micro- and nanophotoelectric measurement.

Prof. Dr. Zhan Gao
Dr. Jiakun Li
Dr. Qixin He
Guest Editors

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Keywords

  • optical design, fabrication and testing
  • applied industrial optics
  • computational optical imaging
  • novel techniques in microscopy
  • biosensors
  • optical manipulation and its applications
  • advances in meta-optics and metasurfaces
  • hyperspectral and multispectral imaging
  • new ultrafast laser applications
  • digital holographic metrology
  • LIDAR
  • laser measurement
  • micro‐ and nano photoelectric measurement

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Published Papers (7 papers)

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Research

11 pages, 3629 KiB  
Article
Improved Autocollimator for Roll Angle Measurement with an Enlarged Measuring Range
by Yan Guo, Yu Zhang, Jiali Ji, Qing Yan, Huige Di, Li Wang and Dengxin Hua
Appl. Sci. 2025, 15(5), 2256; https://doi.org/10.3390/app15052256 - 20 Feb 2025
Viewed by 389
Abstract
An autocollimator is a goniometer established according to the principle of autocollimation, but it is ineffective for measuring the roll angle. This paper proposes an improved autocollimator available for large-range roll angle measurement, which maintains the optical structure of the classic one while [...] Read more.
An autocollimator is a goniometer established according to the principle of autocollimation, but it is ineffective for measuring the roll angle. This paper proposes an improved autocollimator available for large-range roll angle measurement, which maintains the optical structure of the classic one while incorporating a wedge prism (WP) working in transmissive mode as a roll angle sensing element to dissociate the collimated beam into two beams. According to the moving paths of the two light spots focused on the photodetector, the roll angle of the WP can be solved. The measuring method is expounded, and the calibration results reveal that the improved autocollimator has an accuracy of ±13.55 arcsec over a range of 360°, confirming its feasibility for roll angle measurement where a large measuring range is required. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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13 pages, 2250 KiB  
Article
Absorption Measurement in Ultrapure Crystalline Quartz with the Eliminated Influence of Ambient Air Absorption in the Time-Resolved Photothermal Common-Path Interferometry Scheme
by Ksenia Vlasova, Alexandre Makarov and Nikolai Andreev
Appl. Sci. 2024, 14(20), 9474; https://doi.org/10.3390/app14209474 - 17 Oct 2024
Viewed by 1138
Abstract
We demonstrate measurements of the absorption coefficient α ≈ 2.5 × 10−7 cm−1 in synthetic crystalline quartz at a wavelength of 1071 nm with a signal-to-noise ratio of 10/1 using the Time-resolved photothermal common-path interferometry (TPCI) scheme. It utilized cells filled [...] Read more.
We demonstrate measurements of the absorption coefficient α ≈ 2.5 × 10−7 cm−1 in synthetic crystalline quartz at a wavelength of 1071 nm with a signal-to-noise ratio of 10/1 using the Time-resolved photothermal common-path interferometry (TPCI) scheme. It utilized cells filled with flowing argon and eliminated the influence of ambient air absorption. The scheme elements limiting the sensitivity of measurements at the level of ≈7.8 × 10−8 cm−1 were revealed. When these elements are replaced by better ones in terms of their thermal influence, the sensitivity of absorption coefficient measurements in crystalline quartz is ~10−8 cm−1. The calculation of the correction due to these optical elements of the values of the measured absorption coefficients is also described, which makes it possible to achieve the same sensitivity without replacing the elements. The improved scheme confirms the presence of the spatial inhomogeneity of absorption with a minimum coefficient of 2.5 × 10−7 cm−1 in synthetic crystalline quartz. The discrepancy of the absorption coefficient values in different regions of the crystal in the presented series of experiments was 2.5 × 10−7 cm−1 to 4 × 10−6 cm−1. Taking into account the ratio of thermo-optical parameters and the heat diffusion effect, the calculation shows that for quartz glasses the corresponding sensitivity of the absorption coefficient measurements equals ≈1.5 × 10−9 cm−1. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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15 pages, 975 KiB  
Article
Analysis of Beam Walk in Inter-Satellite Laser Link: Implications for Differential Wavefront Sensing in Gravitational Wave Detection
by Xing-Guang Qian, Zhao Cui, Hao-Qi Shi, Xue Wang, Wei-Lai Yao, Rui-Hong Gao and Yi-Kun Wang
Appl. Sci. 2024, 14(13), 5526; https://doi.org/10.3390/app14135526 - 25 Jun 2024
Viewed by 1288
Abstract
Achieving space-based gravitational wave detection requires the establishment of an interferometer constellation. It is necessary to establish and maintain stable laser interferometric links using the differential wavefront sensing (DWS) technnique. When the distant measurement beam experiences pointing jitter, it causes beam walk on [...] Read more.
Achieving space-based gravitational wave detection requires the establishment of an interferometer constellation. It is necessary to establish and maintain stable laser interferometric links using the differential wavefront sensing (DWS) technnique. When the distant measurement beam experiences pointing jitter, it causes beam walk on the surface of the local detector. The reduced overlap between the local reference spot and the distant spot increases the nonlinear errors in the DWS technique, which need to be suppressed. Numerical analysis was conducted on the spatial beam interference signals of the DWS technique when the distant measurement beam experienced pointing jitter. An experimental measurement system was designed, and the beam walk was suppressed using a conjugate imaging system. The results show that within a range of 300 μrad, the optical path with the imaging system can reduce measurement errors by at least 83%. This way also helps to reduce pointing jitter noise in inter-satellite links, thereby improving laser pointing control accuracy.This method would provide a valuable reference for future DWS measurement systems. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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16 pages, 8909 KiB  
Article
Establishment and Accuracy Analysis of Measurement Control Network Based on Length–Angle Mixed Intersection Adjustment Model
by Zhi Xiong, Chunsen Li, Hao Zhang, Chenxiaopeng Zhong, Zhongsheng Zhai and Ziyue Zhao
Appl. Sci. 2024, 14(11), 4948; https://doi.org/10.3390/app14114948 - 6 Jun 2024
Viewed by 1335
Abstract
To achieve high-precision measurements of target points on long straight tracks, a multi-level measurement method based on length–angle mixed intersection techniques was explored. Firstly, a control network with graded measurement levels was proposed, based on the spatial error characteristics of different measuring devices [...] Read more.
To achieve high-precision measurements of target points on long straight tracks, a multi-level measurement method based on length–angle mixed intersection techniques was explored. Firstly, a control network with graded measurement levels was proposed, based on the spatial error characteristics of different measuring devices and the principle of nonlinear least squares, and a method for adjustment calculation based on length–angle mixed intersection was studied. Secondly, numerical simulation was conducted to assess the impact of instrument placement on measurement accuracy, and the results indicated that central positioning within the measurement range can effectively minimize the overall point location errors. Finally, the methodology was validated in a practical setting at a rocket sled test site. Experimental results demonstrated that, within a measurement range of approximately 669 m, when target points were located on one side of the track and distance measurements were used as benchmark values, the measurement control network achieved a distance standard deviation of 0.20 mm. The range of distance deviations was between −0.85 mm and 0.98 mm. This approach offers substantial reference value for high-precision coordinate measurements over extended distances. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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15 pages, 7816 KiB  
Article
The Microchip Laser and Its Drive Control System for Planetary Mass Spectrometry Measurements
by Wenbo Liu, Peng Sang, Yang Cao, Yaning Liu, Huan Wang and Baoquan Li
Appl. Sci. 2024, 14(8), 3251; https://doi.org/10.3390/app14083251 - 12 Apr 2024
Viewed by 1067
Abstract
To fulfill the requisites of planetary mass spectrometry applications, this paper introduces the creation of a miniaturized, low-power passive Q-switched microchip laser system. The entire system, inclusive of the laser and all electronic components, weighs 106 g, with power consumption below 3 W. [...] Read more.
To fulfill the requisites of planetary mass spectrometry applications, this paper introduces the creation of a miniaturized, low-power passive Q-switched microchip laser system. The entire system, inclusive of the laser and all electronic components, weighs 106 g, with power consumption below 3 W. The laser output exhibits a pulse duration of 410 ps, accompanied by a single pulse energy of 16.8 μJ. Augmented by the optical focusing system, the system attains a focal spot size of approximately 15 μm and laser irradiance of up to 22 GW/cm2. The driving control system facilitates versatile regulation of parameters such as output current amplitude, pulse duration, and frequency, thereby modulating the laser output frequency and duty cycle. The microchip laser fully meets the power requirements for exciting plasma from planetary rocks and soil. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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8 pages, 2156 KiB  
Communication
Efficient Method for Identifying Key Errors Based on 21-Geometric-Error Measurement of Three Linear Axes of Machine Tools
by Fajia Zheng, Bin Zhang, Yuqiong Zhao, Jiakun Li, Fei Long and Qibo Feng
Appl. Sci. 2024, 14(7), 2982; https://doi.org/10.3390/app14072982 - 2 Apr 2024
Cited by 2 | Viewed by 1444
Abstract
Key errors of machine tools have a significant impact on their accuracy, however accurately and quickly measuring the geometric errors of machine tools is essential for key error identification. Fortunately, a quick and direct laser measurement method and system for 21 geometric errors [...] Read more.
Key errors of machine tools have a significant impact on their accuracy, however accurately and quickly measuring the geometric errors of machine tools is essential for key error identification. Fortunately, a quick and direct laser measurement method and system for 21 geometric errors of three linear axes of machine tools were proposed previously, which enables the measurement of all 21 geometric errors via a one-step installation and a three-step automated measurement process. Based on this, to efficiently identify the key error factors, this paper first utilizes the 21 geometric errors obtained from the proposed measurement system to evaluate the contribution of each error to the volumetric errors of machine tools, leading to the building of a 21-geometric-error sensitivity analysis model. Then, experiments are carried out on the vertical machining tool TH5656, and all 21 geometric errors are obtained in 5 min. After this, the volumetric error distribution in the machining workspace is mapped according to the relationship between the geometric errors and the machining errors, and the key error factors affecting the manufacturing and machining accuracy of the TH5656 are ultimately determined. Thus, this new method provides a way to quickly identify key errors of the three linear axes of machine tools, and offers guidance for the machine tool configuration design, machining technology determination, and geometric error compensation. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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14 pages, 5672 KiB  
Article
An Iterative High-Precision Algorithm for Multi-Beam Array Stitching Method Based on Scanning Hartmann
by Xiangyu Yan, Dahai Li, Kewei E, Fang Feng, Tao Wang, Xun Xue, Zekun Zhang and Kai Lu
Appl. Sci. 2024, 14(2), 794; https://doi.org/10.3390/app14020794 - 17 Jan 2024
Viewed by 959
Abstract
The multi-beam array stitching test system (MASTS) based on the Hartmann principle is employed to measure the aberrations in large-aperture optical systems. As each small-aperture and ideal parallel beam traverses the optical system, it is converged into a spot at the focal plane [...] Read more.
The multi-beam array stitching test system (MASTS) based on the Hartmann principle is employed to measure the aberrations in large-aperture optical systems. As each small-aperture and ideal parallel beam traverses the optical system, it is converged into a spot at the focal plane of the optical system. The centroid position of the spot contains the information about the wavefront slope of the sub-aperture at that specific location in the optical system. Scanning the optical system with this small-aperture beam across the entire aperture of the optical system, we can yield the aberration information to be tested. To mitigate pointing errors induced by scanning motion and accurately obtain the aberration signals of the optical system, nine beams are integrated into a 3 × 3 multi-beam array system, and their directions are aligned to be identical. However, achieving complete alignment in the same direction for all nine beams is a challenging task, resulting in errors due to their pointing differences within the array. This paper introduces an iterative algorithm designed to obtain high-precision multi-beam pointing errors and to reconstruct the wavefront of the optical system under test. This enables a more accurate measurement of wavefront aberrations in the optical system to be tested. Firstly, simulation models were implemented to validate the algorithm’s feasibility. Additionally, a scanning optical measurement system with a multi-beam array was developed in our lab, and the iterative algorithm was applied to process our experimental data. The results were then compared with interferometer data, demonstrating that our algorithm is feasible for MASTS to measure aberrations in large-aperture optical systems with high accuracy. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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