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Editorial

Acknowledgement to Reviewers of Cosmetics in 2015

by
Cosmetics Editorial Office
MDPI AG, Klybeckstrasse 64, CH-4057 Basel, Switzerland
Cosmetics 2016, 3(1), 2; https://doi.org/10.3390/cosmetics3010002
Submission received: 21 January 2016 / Accepted: 21 January 2016 / Published: 21 January 2016
The editors of Cosmetics would like to express their sincere gratitude to the following reviewers for assessing manuscripts in 2015.
We greatly appreciate the contribution of expert reviewers, which is crucial to the journal’s editorial decision-making process. Several steps have been taken in 2015 to thank and acknowledge reviewers. Good, timely reviews are rewarded with a discount off their next MDPI publication. By creating an account on the submission system, reviewers can access details of their past reviews, see the comments of other reviewers, and download a letter of acknowledgement for their records. In addition, MDPI has launched a collaboration with Publons, a website that seeks to publicly acknowledge reviewers on a per journal basis. This is all done, of course, within the constraints of reviewer confidentiality. Feedback from reviewers shows that most see their task as a voluntary and mostly unseen work in service to the scientific community. We are grateful to our reviewers for the contribution they make.
Abdel-Mottaleb, Mona MALabhasetwar, Vinod
Al-Abed, SouhailLabille, Jérôme
Alimonti, AlessandroLane, Majella
Andersen, Klaus E.Lohan, Silke
Apone, FabioMack Correa, M. C.
Ballarin, BarbaraMaibach, Howard I.
Banziger, StefanMailloux, Ryan J.
Bernerd, FrançoiseMartin, Stefan F.
Biesterbos, Jacqueline W.H.Martino, Piera Di
Bilodeau, DianeMasaki, Hitoshi
Björklund, SebastianMcGhie, Tony K.
Boga, CarlaMcWilliams, Andrea C.
Bouwstra, Joke A.Misery, Laurent
Breunig, H.G.Montenegro, Lucia
Castán, PilarMorganti, P.
Chen, Chung-YiMurdan, Sudax
Chisvert, AlbertoOresajo, Christian
Chruszcz-Lipska, KatarzynaOron, Miriam
Chung, Shin-KyoPantazaki, Anastasia A.
Colucci, GabriellaPark, Kyung Chan
Corsini, EmanuelaPatzelt, Alexa
Dagnino, LinaPensé-Lhéritier, Anne-Marie
Darvin, MaximPilar Vinardell, María
Estanqueiro, MarileneQuan, Taihao
Falque, E.Rancan, Fiorenza
Feldman, Steven R.Ratz-Łyko, Anna
Fisher, Gary J.Rodrigues, Francisca
Geier, JohannesRohn, Sascha
Glass, BeverleyRosado, Catarina
Goossens, AnSautebin, Lidia
Grether-Beck, SusanneSavary, Géraldine
Hall, AlixSchäfer, Matthias
Han, Seung HeeSchmidt, Jonas Damgård
Harker, MarkShimizu, Takahiko
Hawkes, JamieSinico, Chiara
Hsieh, Chang-WeiSuh, Hyung Joo
James, A. GordonTaieb, Charles
Jefferson, JulieTauch, Andreas
Jeschke, GunnarValgimigli, Luca
Kapischke, MatthiasVilla, Carla
Katiyar, Santosh K.Wen, Kuo-Ching
Kauppinen, AnuWittenberg, James B.
Kim, DongukZillich, Olesya V.

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MDPI and ACS Style

Cosmetics Editorial Office. Acknowledgement to Reviewers of Cosmetics in 2015. Cosmetics 2016, 3, 2. https://doi.org/10.3390/cosmetics3010002

AMA Style

Cosmetics Editorial Office. Acknowledgement to Reviewers of Cosmetics in 2015. Cosmetics. 2016; 3(1):2. https://doi.org/10.3390/cosmetics3010002

Chicago/Turabian Style

Cosmetics Editorial Office. 2016. "Acknowledgement to Reviewers of Cosmetics in 2015" Cosmetics 3, no. 1: 2. https://doi.org/10.3390/cosmetics3010002

APA Style

Cosmetics Editorial Office. (2016). Acknowledgement to Reviewers of Cosmetics in 2015. Cosmetics, 3(1), 2. https://doi.org/10.3390/cosmetics3010002

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