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Journal: CoatingsVolume: 16Number: 737
Article: Preparation of High-Quality Low-Temperature PECVD Silicon Nitride Films: Effect of NH3 Precursor on Film Properties and RF Response Mechanism
- Authors:
- Zhen Tang 1,2,†,
- Peng Yu 2,† and
- Zhaohui Ren 1,*
- et al.
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