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Journal: Coatings, 2020
Volume: 10
Number: 563

Article: Etching Characteristics of SixNy Film on Textured Single Crystalline Silicon Surface Using Ar/CF4 and He/CF4 Surface-Discharge Plasma
Authors: by Toshiyuki Hamada, Shunsuke Masuda, Kazuki Nishida and Soma Yamamoto
Link: https://www.mdpi.com/2079-6412/10/6/563

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