Next Article in Journal
Advances in Porous Silicon Materials for Sensing, Energy Storage, and Microelectronics
Next Article in Special Issue
Micromagnetic Investigation on Microstructure Modulation and Magnetic Properties of Nd-Fe-B Permanent Magnets
Previous Article in Journal
Treatment of Maxillofacial Cancers by Zein Nanoparticles Loaded with Anticancer Peptide Pistacia Zardin1: Enhanced Cytotoxicity and Apoptosis Induction in Head and Neck Squamous Cell Carcinoma (HNSCC)
 
 
Font Type:
Arial Georgia Verdana
Font Size:
Aa Aa Aa
Line Spacing:
Column Width:
Background:
Article

Electronic and Magnetic Properties of Fluorinated Transition Metal Dichalcogenide 1T-MX2F2 (X = S, Se, Te) Monolayers

1
School of Materials Science and Engineering, Xinjiang University, Urumqi 830046, China
2
Xinjiang Key Laboratory of Solid-State Physics and Devices, School of Physics and Technology, Xinjiang University, Urumqi 830046, China
3
School of Physics, Institute of Quantum Physics, Central South University, Changsha 410083, China
*
Authors to whom correspondence should be addressed.
Nanomaterials 2026, 16(4), 256; https://doi.org/10.3390/nano16040256
Submission received: 23 January 2026 / Revised: 13 February 2026 / Accepted: 13 February 2026 / Published: 15 February 2026
(This article belongs to the Special Issue Theoretical Calculations and Simulations of Low-Dimensional Materials)

Abstract

Two-dimensional transition metal dichalcogenides (TMDCs) have attracted worldwide attention due to their rich physical and chemical properties. How to regulate their electronic structures to meet different application requirements is a crucial issue. In this work, based on first-principle calculations, we demonstrate that surface fluorination can be a powerful method for tailoring the electronic and magnetic properties of TMDC monolayers. The fluorinated T-MX2F2 (X = S, Se, Te) monolayers cover semiconductors, half-metals, semimetals, and half-semimetals. In particular, monolayer T-CrS2F2 is a half-semimetal, and the spin–orbit coupling effect changes it to a quantum anomalous Hall insulator. Monolayer T-HfS2F2 is a non-magnetic semimetal, and monolayer T-CoS2F2 is a half-metal. These findings not only suggest that fluorination can dramatically alter the electronic properties of two-dimensional TMDCs but also provide a new research platform for developing nanoelectronic devices.

Graphical Abstract

1. Introduction

In the past decade, two-dimensional (2D) transition metal dichalcogenides (TMDCs) have attracted widespread attention and emerged as a research hotspot in materials science and nanotechnology, due to their excellent physical and chemical properties. They exhibit high carrier mobility [1,2,3,4], excellent thermal conductivity [5], outstanding catalytic activity [6], great sensing performance [7,8], fine biocompatibility [9,10], etc. [11,12,13,14]. Especially in nanoelectronics, 2D TMDCs provide an important research platform for developing the post-Moore electronics utilizing the charge, spin, and valley degrees of the freedom of electron carriers [15]. For example, the fabricated MoS2-based field-effect transistors with a gate length of 1 nm have achieved a current on/off ratio as high as 105 times [16]. The HCP-Co/TMDCs magnetic tunnel junction can achieve a tunneling magnetoresistance (TMR) of up to 3600% [17]. The built-in electric field of the Janus monolayer CrSSe can induce valley polarization up to 71 meV [18].
Although 2D TMDCs cover a lot of materials, some special materials are still rare in this family, such as semimetals [19], magnetic semiconductors [20], half-metals [21], and topological insulators [22]. How to tailor their electronic properties to meet diverse application requirements is still a crucial issue. Commonly used strategies include chemical doping [23], defects, strain, gating, stacking, and alloying [24,25]. For example, the application of biaxial or uniaxial tensile strain (0–10%) can control the electronic and magnetic properties of a series of early-transition metal dichalcogenide monolayers [26]. Despite the strong regulatory effect, disordered defects, doping, and alloying will inevitably lead to a decrease in carrier mobility and performance stability. It is difficult to maintain large strains in two-dimensional materials due to weak van der Waals interactions. Exploring new regulatory methods is of great significance for expanding the applications of 2D TMDCs. Notably, based on first-principle calculations, Li et al. found that surface fluorination can change monolayer H-MoS2, a non-magnetic semiconductor, into half-semimetallic T-MoS2F2 with room-temperature ferromagnetism [27]. Meanwhile, fluorine is the element with the highest electronegativity, forming strong bonds with surface atoms and exhibiting excellent environmental stability. This suggests that fluorination may be a powerful method for regulating the electronic and magnetic properties of two-dimensional materials [27]. But so far, few studies have been conducted on the surface fluorination effect of 2D TMDCs.
In this work, we investigated the electronic and magnetic properties of surface-fluorinated TMDC monolayers T-MX2F2 (X = S, Se, Te). Based on first-principle calculations, 15 stable T-MX2F2 (X = S, Se, Te) monolayers were filtered out, covering semiconductors, metals, semimetals, and half-semimetals. Representatively, the electronic properties of monolayers CrS2F2, HfS2F2, CoS2F2, and FeS2F2 are discussed to demonstrate fluorination effects.

2. Calculation Details

In this work, all first-principle calculations based on density functional theory (DFT) are carried out using the Vienna Ab-initio Simulation Package (VASP 5.4.4) [28,29]. The electron–core interactions are described with the projector augmented-wave method (PAW) [30]. The plane wave cutoff energy was taken as 500 eV. The Perdew–Burke–Ernzerhof (PBE) functional was used to describe the exchange-correlation potential [31]. If not specifically mentioned, Hubbard U correction was not adopted for transition metal atoms, because standard DFT calculations give results consistent with those obtained using HSE06 hybrid functionals (see Figure S12 for details). A vacuum layer thickness of 20 Å was used to eliminate the fake interlayer interactions induced by the periodic boundary conditions. In the structural optimization calculations, the convergence criteria of total energy and force were set as 10−6 eV and 0.01 eV/Å, respectively. A 16 × 16 × 1 Γ-centered Monkhorst–Pack grid was used to sample first Brillouin zone. We employed a 4 × 4 × 1 supercell model and a 4 × 4 × 1 k-point mesh for phonon spectrum calculations. The ab initio molecular dynamics (AIMD) simulation was performed at 500 K on the 4 × 4 × 1 supercell with a time step of 1.5 fs for a total duration of 10 ps. To estimate the Curie temperatures, Monte Carlo simulations were performed based on the Heisenberg model using the MCsolver code. In addition, Wannier90, VASPberry and WannierTools codes were used to analyze the topological properties. The Chern number C is calculated by integrating the Berry curvature of all valence bands over the Brillouin zone:
C = n 1 2 π B Z Ω x y n ( k ) d k x d k y
And the anomalous Hall conductance σxy is calculated with the Kubo formula:
σ x y = e 2 ħ n BZ d 2 k ( 2 π ) 2 Ω x y n f n
In Equations (1) and (2), n, Ω, and fn are the band index, Berry curvature, and Fermi-Dirac distribution function, respectively.
To evaluate the feasibility of fluorinated TMDCs, the fluorination formation energy of T-MX2F2, Ef, is defined based on the following equation:
E f = E M X 2 F 2 E M X 2 2 μ F
where EMX2F2, EMX2 and μF represent the total energies of T-MX2F2, T-MX2, and the chemical potential of F in F2 gas, respectively. Thereby, a negative value indicates the surface fluorination process is a spontaneous reaction.

3. Results and Discussion

As shown in Figure 1a, the surface-fluorinated T-MX2F2 adopted a five-atom-layer stacked configuration of F–X–M–X–F, where X represents S, Se, and Te, and M represents transition metal atoms in groups IVB–VIII. The DFT results suggest that the top of the X atoms is the most stable adsorption site for F. A total of 63 T-MX2F2 monolayers was calculated. To evaluate their stability, we carried out AIMD simulations and phonon spectrum calculations. Fifteen stable T-MX2F2 monolayers were screened out, as colored in Figure 1b. We use asterisk (*), triangle (∆), and rhombus (♦) symbols to represent T-MS2F2, T-MSe2F2, and T-MTe2F2, respectively. For instance, Cr indicates that monolayer T-CrS2F2 and T-CrSe2F2 are stable, but monolayer T-CrTe2F2 is unstable. In addition, these fluorinated monolayers exhibit diverse electronic properties, covering semiconductors, half-metals, semimetals, and half-semimetals. We use different colors in Figure 1b to distinguish these properties. Representatively, we selected T-CrS2F2, T-HfS2F2, T-CoS2F2, and T-FeS2F2 as case studies to discuss the electronic and magnetic properties of T-MX2F2 monolayers in the following sections. The energy bands and stability of other materials are detailed in Supplementary Materials Figures S1–S6.

3.1. Half-Semimetallic T-CrS2F2

By comparing the total energies of different magnetic orders (see Figure S19 and Table S5 for details), we find that monolayer T-CrS2F2 has the ferromagnetic (FM) ground state. Figure 2a shows the phonon dispersion of monolayer T-CrS2F2 in the FM ground state. Except for a few negligibly small imaginary frequencies near the Γ point, there is no imaginary frequency over the Brillouin zone, suggesting monolayer T-CrS2F2 is dynamically stable. Figure 2b shows the total energy evolution of monolayer T-CrS2F2 in the AIMD simulation under 500 K, which remains stable throughout the entire simulation interval. The embedded image in Figure 2b displays the final structure of T-CrS2F2. There is no obvious structural distortion, suggesting monolayer T-CrS2F2 is thermodynamically stable. In addition, the fluorination formation energy Ef for T-CrS2F2 is −3.02 eV per formula unit (eV/f.u.), indicating strong chemical bonding between F and S atoms, and monolayer T-CrS2F2 may be experimentally achievable.
Interestingly, contrary to conventional expectations that fluorination will change the transition metal atom Cr from the Cr4+ state for CrS2 into the Cr6+ state for T-CrS2F2, our differential charge density analysis in Figure 2c suggests that the charge transfer after fluorination mainly occurs between S and F atoms, while the charges on Cr atoms change much less. As a result, the Cr atom remains in the Cr4+ state in monolayer T-CrS2F2, and the 3d24s0 valence state causes 2 μB net magnetic moments per Cr4+ ion. Consistently, our DFT calculations confirm that monolayer T-CrS2F2 has 2 μB net magnetic moments per unit cell, and the local magnetic moments are mainly contributed by Cr atoms, as shown by the spin density distribution in Figure 2f.
Figure 2d displays the band structure of monolayer T-CrS2F2 without considering the spin–orbit coupling (SOC) effect. The spin-up bands are gapped, while the spin-down bands pass through the Fermi level, suggesting T-CrS2F2 is half-metallic. For the spin-down bands, there is only a Weyl point located at high-symmetry point K, resulting in zero total density of states (TDOS) at the Fermi level in Figure 2e, indicating a semimetal nature. Overall, the DFT results suggest monolayer T-CrS2F2 is an intrinsic 2D half-semimetal. We also calculated the band structure using the HSE06 hybrid functional, which gives consistent results (see Figure S12 in Supplementary Materials).
Interestingly, after considering the SOC effect, a band gap of 21.6 meV opens at the Weyl point for monolayer T-CrS2F2, as shown in Figure 3a. This indicates monolayer T-CrS2F2 may be a topological insulator. To verify this, we calculated the Chern number of monolayer T-CrS2F2. By integrating the Berry curvatures of the valence bands over the whole Brillouin zone, as displayed in Figure 3d, we obtained a non-zero Chern number C = −2, confirming monolayer T-CrS2F2 is a quantum anomalous Hall insulator (QAHI). Using DFT and Maximally localized Wannier functions (MLWFs) (see Figure S7a for details), we further calculated the topological surface states. As shown in Figure 3c, two linearly dispersing states connect the valence and conduction bands of monolayer T-CrS2F2, corresponding to the two topologically protected chiral edge channels. In Figure 3b, the quantized Hall conductivity of σxy = −2e2/h and the width of σxy plateau ΔE = 16 meV is in line with the calculated Chern number C = −2 and the energy gap Eg = 22 meV, respectively. The small difference between ΔE and Eg is caused by the broadening of the Fermi–Dirac distribution function in the calculation.
The estimated Curie temperature given by the Monte Carlo simulation is 577 K for monolayer T-CrS2F2 in Figure S9. The half-metallicity and novel electronic topological properties make monolayer T-CrS2F2 a potential platform for developing low-power, high-speed nanologic devices and non-volatile memory.
The strain effects on the electronic and magnetic properties of monolayer T-CrS2F2 are also investigated. The strength of biaxial strain (ε) is defined as the change rate of the in-plane lattice constant:
ε = ( a a 0 ) / a 0 × 100 %
where a0 and a are the in-plane lattice constant without and with strain, respectively. Positive and negative ε values represent tensile and compressive strain, respectively. As displayed in Figure 4a,b, the band gap monotonically increases with the increase in strain, while the Chern number remains unchanged, suggesting the topological properties of monolayer T-CrS2F2 is robust against strain. Figure 4c suggests that increasing strain will lead to a decrease in Curie temperature. But in the studied strain range, the Curie temperature is always higher than room temperature.

3.2. Semimetallic T-HfS2F2

The band structure of monolayer T-HfS2F2 is displayed in Figure 5a. All bands are spin-degenerate, and the DFT calculations give zero total magnetic moments per unit cell, indicating monolayer T-HfS2F2 is non-magnetic. Similarly to T-CrF2S2, in T-HfX2S2, the charge transfer after fluorination mainly occurs between the S and F atoms, while the charge on Hf atoms changes much less, as shown in Figure S20b. Therefore, in monolayer T-HfS2F2, the Hf atoms remain in the Hf4+ state, achieving a valence state of 5d06s0. Also, similarly to monolayer T-CrS2F2, the Weyl point at the Fermi level makes monolayer T-HfS2F2 an intrinsic semimetal. In Figure 5b, a band gap of 49.1 meV opens after considering SOC effects. To verify whether it is a topological insulator, based on DFT and MLWFs calculations (see Figure S7b for details), we calculate the edge states of monolayer T-HfS2F2 in Figure 5d. Obviously, some edge states cross over the energy gap. However, the Wilson loop spectrum in Figure 5c gives a result of Z2 = 0 since the curves always cross a line parallel to the ky-axis an even number of times. This result indicates that the metallic edge states may change into gapped via edge passivation or other treatments due to the trivial topological properties.

3.3. Half-Metallic T-CoS2F2

Standard DFT calculations in Figure 6a show that monolayer T-CoS2F2 is a magnetic metal. However, the HSE06 hybrid functional calculations in Figure 6b suggest monolayer T-CoS2F2 should be a half-metal. Considering that the standard DFT calculations usually underestimate the electron correlation effects in localized 3d orbits, we adopted the Hubbard U correction for monolayer T-CoS2F2 to address this disagreement. A typical U value for Co-3d orbital is usually about 1–4 eV in previous works. As shown in Figure 6c, when Hubbard U correction with Ueff = 3 eV is used, only the spin-up band passes through the Fermi level, while the spin-down bands are gapped, which is in reasonable agreement with the HSE06 hybrid functional results. To study the influence of the U value on the electronic structure, we calculated the band structure of monolayer T-CoS2F2 with U = 0 eV, 1 eV, 2 eV, 3 eV, and 4 eV, respectively. In Figure 6d, as the U value increases, the band gap of the spin-down bands increases while the spin-up bands remain metallic, suggesting the half-metallicity of monolayer T-CoS2F2 is stable against a wide range of U values. Based on Monte Carlo simulations, the Curie temperature of monolayer T-CoS2F2 is approximately 532 K for Ueff = 3 eV, as shown in Figure 6e,f. It increases with an increase in U. Notably, the specific heat diverges toward 0K because monolayer T-CoS2F2 has easy-plane magnetic anisotropy, which allows the spin orientation to freely rotate along any in-plane orientation under arbitrary small perturbations. The divergence of heat capacity at 0 K indicates that monolayer T-CoS2F2 is actually in the superparamagnetic state below TC.

3.4. Semiconductive T-FeS2F2

For monolayer T-FeS2F2, all bands in Figure 7a are spin-degenerate, and the DFT calculations give zero total magnetic moments per unit cell, indicating monolayer T-FeS2F2 is a non-magnetic semiconductor. Without considering SOC, the Fermi level does not pass through the valence and conduction bands. Meanwhile, the density of states shows that the electronic density of states near the Fermi level is 0, further proving that monolayer T-FeS2F2 is a non-magnetic semiconductor. The T-RuS2F2 and T-OsS2F2 of the same group exhibit similar characteristics. Their band structures are shown in Figure 7b,c, respectively, and their state densities are shown in Figure 7e,f.

4. Summary

In summary, based on first-principle calculations, we study the stability and electronic properties of monolayer-fluorinated transition metal disulfide compounds 1T-MX2F2 (X = S, Se, Te), covering half-semimetal, semimetal, half-metal, and non-magnetic semiconductors. The results show that monolayer T-CrS2F2 is a half-semimetal material with nontrivial topological properties, exhibiting quantized Hall conduction and chiral edge states. Monolayer T-HfS2F2 is a non-magnetic semimetal. Monolayer T-CoS2F2 exhibits intrinsic half-metallicity, and T-FeS2F2 is a non-magnetic semiconductor. These findings demonstrate the great potential of two-dimensional magnetic materials in future spintronic device applications.

Supplementary Materials

The following supporting information can be downloaded at https://www.mdpi.com/article/10.3390/nano16040256/s1: Figure S1. The band structure of monolayer (a) T-ZrS2F2, (b) T-ZrSe2F2, (c) T-HfSe2F2.; The phonon spectrum of monolayer (d) T-ZrS2F2 (e) T-ZrSe2F2 (f) T-HfSe2F2. Figure S2. The band structure of monolayer (a) T-FeSe2F2, (b) T-RuSe2F2, (c)T-OsSe2F2.; The phonon spectrum of monolayer (d) T-FeSe2F2 (e) T-RuSe2F2 (f)T-OsSe2F2. Figure S3. The band structure of monolayer (a) T-RuS2F2, (b) T-OsS2F2, (c) T-OsTe2F2.; The phonon spectrum of monolayer (d) T-RuS2F2, (e) T-OsS2F2, (f) T-OsTe2F2. Figure S4. (a)The band structure of monolayer T-CrSe2F2. (b)The phonon spectrum of monolayer T-CrSe2F2. Figure S5. Under U=3 eV, (a) the band structure of monolayer T-CoSe2F2. and (b) the phonon spectrum of monolayer T-CoSe2F2. Figure S6. (a) The phonon spectrum of monolayer T-HfS2F2; (b) The phonon spectrum of monolayer T-CoS2F2. (c)The phonon spectrum of monolayer T-FeS2F2. Figure S7. (a) The band structures of monolayer T-CrS2F2 obtained by DFT and MLWFs calculations. The Fermi level is set as 0 eV. (b) The band structures of monolayer T-HfS2F2 obtained by DFT and MLWFs calculations. The Fermi level is set as 0 eV. Figure S8. The two magnetic orders (a) FM, (b) AFM. Figure S9. The Curie temperature of T-CrS2F2 is determined through Monte Carlo simulations. Figure S10. The band structure of monolayer T-CoS2F2. (a) U = 1 eV, (b) U = 2 eV, (c) U = 3 eV, (d) U = 4 eV. Figure S11. Magnetic moments (M) and specific heat (CV) obtained by MC simulations for T-CoS2F2 (a) U = 1 eV, (b) U = 2 eV, (c) U = 3 eV, (d) U = 4 eV. Figure S12. Band structure without considering the SOC effect. Using HSE06 hybrid functional (a) T-CrS2F2, (b) T-CoS2F2, (c) T-HfS2F2, and (d) T-FeS2F2. Using PBE functional (e) T-CrS2F2, (f) T-CoS2F2, (g) T-HfS2F2, and (h) T-FeS2F2. Figure S13. The band structures of monolayer T-MoS2F2 under different functionals (a) HSE06 hybrid functional, (b) PBE functional, and (c) PBE+U functional, respectively. Figure S14. The band structure of monolayer T-CrS2F2 under strain without considering SOC. (a) tensile strain; (b) compressive strain. Figure S15. The band structure of monolayer T-CrS2F2 under strain considering SOC. (a) tensile strain; (b) compressive strain. Figure S16. Through Monte Carlo simulation, the Curie temperature of monolayer T-CrS2F2 under strain (a) tensile strain; (b) compressive strain. Figure S17. The band structure of monolayer T-CoS2F2 under strain. (a) tensile strain; (b) compressive strain. Figure S18. Through Monte Carlo simulation, the Curie temperature of monolayer T-CoS2F2 under strain (a) tensile strain; (b) compressive strain. Figure S19. Four different magnetic order configurations: (a) FM (b) AFM1 (c) AFM2 (d) AFM3. Figure S20. Differential charge density of (a) monolayer T-CrS2F2, T-HfS2F2, T-CoS2F2, and T-FeS2F2, respectively. Yellow and cyan represent electron accumulation and loss, respectively. Table S1. The fluorination formation energy Ef (eV/formula unit) for T-MX2F2. Table S2. The total energies of two different magnetic order energies in unit of eV/f.u. Table S3. The total energy of the ferromagnetic (EFM) and antiferromagnetic (EAFM) states of T-CrS2F2, as well as the nearest-neighbor exchange coupling parameter (J1) and the magnetic anisotropy parameter (Ai). Table S4. The total energy of the ferromagnetic (EFM) and antiferromagnetic (EAFM) states of T-CoS2F2, as well as the nearest-neighbor exchange coupling parameter (J1) and the magnetic anisotropy parameter (Ai). Table S5. The total energies of four different magnetic order energies in unit of eV/f.u.

Author Contributions

L.Z.: conceptualization, formal analysis, investigation, methodology, data curation, validation, writing—review and editing, and writing—original draft. A.L.: funding acquisition, methodology, conceptualization, supervision, investigation, and writing—review and editing. C.L.: investigation and writing—review and editing. Y.G.: investigation and writing—review and editing. H.D.: conceptualization and writing—review and editing. F.O.: conceptualization, funding acquisition, project administration, and writing—review and editing. All authors have read and agreed to the published version of the manuscript.

Funding

This work was financially supported by the Key Project of the Natural Science Program of Xinjiang Uygur Autonomous Region (Grant No. 2023D01D03), the National Natural Science Foundation of China (Grant No. 52073308, No. 12164046, and No. 12304097), the Tianchi Distinguished Professor Research Fund of Xinjiang Uygur Autonomous Region, the Tianchi-Talent Project for Young Doctors of Xinjiang Uygur Autonomous Region (No. 51052300570), Hunan Provincial Natural Science Foundation of China (Grant No. 2023JJ40703), and the State Key Laboratory of Powder Metallurgy at Central South University. This work was carried out in part using computing resources at the High-Performance Computing Center of Central South University.

Data Availability Statement

The original contributions presented in this study are included in the article/Supplementary Material. Further inquiries can be directed to the corresponding authors.

Conflicts of Interest

The authors declare no conflicts of interest.

References

  1. Niu, W.B.; Ding, G.L.; Jia, Z.Q.; Ma, X.Q.; Zhao, J.Y.; Zhou, K.; Han, S.T.; Kuo, C.C.; Zhou, Y. Recent advances in memristors based on two-dimensional ferroelectric materials. Front. Phys. 2024, 19, 13500. [Google Scholar] [CrossRef]
  2. Qi, S.; Tian, M.X.; Yang, Q.; Zhang, X.W.; Zhao, Y.D. Progress in in-sensor computing and applications based on photodetectors of two-dimensional materials. Acta Phys. Sin. 2025, 74, 228501. [Google Scholar] [CrossRef]
  3. Qiu, L.; Si, G.Y.; Bao, X.Z.; Liu, J.; Guan, M.Y.; Wu, Y.W.; Qi, X.; Xing, G.C.; Dai, Z.G.; Bao, Q.L.; et al. Interfacial engineering of halide perovskites and two-dimensional materials. Chem. Soc. Rev. 2023, 52, 212–247. [Google Scholar] [CrossRef] [PubMed]
  4. Tang, L.; Zou, J.Y. p-Type Two-Dimensional Semiconductors: From Materials Preparation to Electronic Applications. Nano-Micro Lett. 2023, 15, 230. [Google Scholar] [CrossRef] [PubMed]
  5. Herabad, S.R.; Mohebpour, M.A.; Soleimani, H.R. Transition metal tin-chalcogenides (TMTC): A new class of 2D covalent metals with high conductivity and stability for advanced applications. Phys. Scr. 2025, 100, 075911. [Google Scholar] [CrossRef]
  6. Borah, P.; Baruah, D.J.; Duarah, R.; Das, M.R. 2D nanozymes: Bioinspired innovations for healthcare and environmental applications. Chem. Commun. 2025, 61, 10685–10715. [Google Scholar] [CrossRef] [PubMed]
  7. Borthakur, P.; Darabdhara, G.; Borah, P.; Szunerits, S.; Boukherroub, R.; Das, M.R. Recent advances in 2D nanomaterial-based peroxidase-mimicking nanocomposites for sensing of water pollutants. J. Environ. Chem. Eng. 2025, 13, 119036. [Google Scholar] [CrossRef]
  8. Chen, J.; Cui, C.; Lawrie, B.; Xue, Y.; Guha, S.; Eichenfield, M.; Zhao, H.; Yan, X. Low-dimensional solid-state single-photon emitters. Nanophotonics 2025, 14, 1687–1713. [Google Scholar] [CrossRef]
  9. Pan, X.; Yu, R.; Wu, J.; Liang, J.; Huang, W.; Huang, R.; Li, W.; Xie, Y.; Zhao, Y.; Huang, Y.; et al. Two-Dimensional Materials as Antioxidants and Sunscreen Agents in Cosmetics. Braz. J. Phys. 2025, 55, 183. [Google Scholar] [CrossRef]
  10. Rabiee, N. Two-dimensional materials in bioelectronics. Trac-Trends Anal. Chem. 2025, 189, 118279. [Google Scholar] [CrossRef]
  11. Hossen, M.F.; Shendokar, S.; Aravamudhan, S. Defects and Defect Engineering of Two-Dimensional Transition Metal Dichalcogenide (2D TMDC) Materials. Nanomaterials 2024, 14, 410. [Google Scholar] [CrossRef]
  12. Ko, J.; Ock, C.; Gim, H.; Hong, K.; Lee, Y.; Kwon, K.C. Two-dimensional materials for artificial sensory devices: Advancing neuromorphic sensing technology. Npj 2d Mater. Appl. 2025, 9, 35. [Google Scholar] [CrossRef]
  13. Liu, X.; Yang, X.; Tang, Q.; Lv, Y.; Zhang, G.; Feng, W. Application and prospect of 2D materials in photodetectors. J. Phys. D-Appl. Phys. 2024, 57, 373002. [Google Scholar] [CrossRef]
  14. Wang, Y.; Sarkar, S.; Yan, H.; Chhowalla, M. Critical challenges in the development of electronics based on two-dimensional transition metal dichalcogenides. Nat. Electron. 2024, 7, 638–645. [Google Scholar] [CrossRef]
  15. Kang, M.; Zhang, C.; Mu, C.; Zhai, K.; Xue, T.; Wang, B.; Wen, F.; Cheng, Y.; Xiang, J.; Dai, J.-F.; et al. Robust enhancement of valley polarization and quantum yield in composition grading lateral heterostructure of MoS 2-WS 2 monolayer. Prog. Nat. Sci. -Mater. Int. 2024, 34, 187–193. [Google Scholar] [CrossRef]
  16. Wu, F.; Tian, H.; Shen, Y.; Hou, Z.; Ren, J.; Gou, G.Y.; Sun, Y.B.; Yang, Y.; Ren, T.L. Vertical MoS2 transistors with sub-1-nm gate lengths. Nature 2022, 603, 259–264. [Google Scholar] [CrossRef]
  17. Shukla, G.; Ali, R.; Shafique, A. Co-TMDC MTJs: A New Frontier in Spintronics. Acs Appl. Electron. Mater. 2025, 7, 115–128. [Google Scholar] [CrossRef]
  18. Jiao, R.; Wei, Q.; Zhang, L.; Xie, Y.; He, J.; Zhou, Y.; Shen, L.; Yuan, J. Enhancement and modulation of valley polarization in Janus CrSSe with internal and external electric fields. Phys. Chem. Chem. Phys. 2024, 26, 13087–13093. [Google Scholar] [CrossRef]
  19. Li, X.; Liu, K.; Wu, D.; Lin, P.; Shi, Z.; Li, X.; Zeng, L.; Chai, Y.; Lau, S.P.; Tsang, Y.H. Van Der Waals Hybrid Integration of 2D Semimetals for Broadband Photodetection. Adv. Mater. 2025, 37, 2415717. [Google Scholar] [CrossRef]
  20. Men’shov, V.N.; Rusinov, I.P.; Chulkov, E.V. Intrinsic Anomalous Hall Effect on the Surface of a Magnetic Semiconductor with the Strong Rashba Effect. Jetp Lett. 2025, 121, 372–380. [Google Scholar] [CrossRef]
  21. Fan, A.-D.; Wang, Y.-K.; Li, S. Fully spin-polarized nodal-chain half-metal in transition metal nitrides. J. Appl. Phys. 2025, 138, 013901. [Google Scholar] [CrossRef]
  22. Dong, X.; Liu, M.; Qiao, D.; Li, Z.; Xu, X. Electric-field-induced topological phase transition in CrS2/CrSe2 heterostructures. Front. Phys. 2026, 21, 055202. [Google Scholar] [CrossRef]
  23. Li, S.; Hong, J.; Gao, B.; Lin, Y.-C.; Lim, H.E.; Lu, X.; Wu, J.; Liu, S.; Tateyama, Y.; Sakuma, Y.; et al. Tunable Doping of Rhenium and Vanadium into Transition Metal Dichalcogenides for Two-Dimensional Electronics. Adv. Sci. 2021, 8, 2004438. [Google Scholar] [CrossRef]
  24. Feng, Y.; Zhou, Z.; Li, J.; Gao, L. Precise construction of two-dimensional materials and heterostructures. Chin. Sci. Bull. 2025, 70, 508–521. [Google Scholar] [CrossRef]
  25. Zhou, Y.; Guo, Y. Engineering Defects, Strain, and Janus Structures in Transition Metal Dichalcogenides for Enhanced Hydrogen Evolution Reaction Electrocatalysis. ACS Appl. Mater. Interfaces 2025, 17, 68869–68881. [Google Scholar] [CrossRef] [PubMed]
  26. Guo, H.; Lu, N.; Wang, L.; Wu, X.; Zeng, X.C. Tuning Electronic and Magnetic Properties of Early Transition-Metal Dichalcogenides via Tensile Strain. J. Phys. Chem. C 2014, 118, 7242–7249. [Google Scholar] [CrossRef]
  27. Wu, J.; Guo, R.Y.; Wu, D.X.; Li, X.L.; Wu, X.J. Turning Nonmagnetic Two-Dimensional Molybdenum Disulfides into Room-Temperature Ferromagnets by the Synergistic Effect of Lattice Stretching and Charge Injection. J. Phys. Chem. Lett. 2024, 15, 2293–2300. [Google Scholar] [CrossRef]
  28. Kresse, G.; Furthmuller, J. Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set. Comput. Mater. Sci. 1996, 6, 15–50. [Google Scholar] [CrossRef]
  29. Perdew, J.P.; Ernzerhof, M.; Burke, K. Rationale for mixing exact exchange with density functional approximations. J. Chem. Phys. 1996, 105, 9982–9985. [Google Scholar] [CrossRef]
  30. Kresse, G.; Joubert, D. From ultrasoft pseudopotentials to the projector augmented-wave method. Phys. Rev. B 1999, 59, 1758–1775. [Google Scholar] [CrossRef]
  31. Perdew, J.P.; Burke, K.; Ernzerhof, M. Generalized gradient approximation made simple. Phys. Rev. Lett. 1996, 77, 3865–3868. [Google Scholar] [CrossRef] [PubMed]
Figure 1. (a) Crystal structure of surface-fluorinated T-MX2F2 monolayers. (b) Schematic of stable T-MX2F2 monolayers. White indicates that the structure is unstable, while other colors indicate the structure is dynamically and thermodynamically stable. Symbols asterisk (*), triangle (∆), and rhombus (♦) represent X = S, Se, Te, respectively. Colors red, green, purple, and yellow represent semimetal, half-semimetal, semiconductor, and metal, respectively.
Figure 1. (a) Crystal structure of surface-fluorinated T-MX2F2 monolayers. (b) Schematic of stable T-MX2F2 monolayers. White indicates that the structure is unstable, while other colors indicate the structure is dynamically and thermodynamically stable. Symbols asterisk (*), triangle (∆), and rhombus (♦) represent X = S, Se, Te, respectively. Colors red, green, purple, and yellow represent semimetal, half-semimetal, semiconductor, and metal, respectively.
Nanomaterials 16 00256 g001
Figure 2. (a) The phonon spectrum of monolayer T-CrS2F2. (b) The ab initio molecular dynamics simulation results at 500 K. (c) The differential charge density; yellow and cyan represent electron accumulation and loss, respectively. (d) The band structure of monolayer T-CrS2F2 without considering SOC effects. (e) The TDOS and PDOS for each element. (f) The spin density distribution.
Figure 2. (a) The phonon spectrum of monolayer T-CrS2F2. (b) The ab initio molecular dynamics simulation results at 500 K. (c) The differential charge density; yellow and cyan represent electron accumulation and loss, respectively. (d) The band structure of monolayer T-CrS2F2 without considering SOC effects. (e) The TDOS and PDOS for each element. (f) The spin density distribution.
Nanomaterials 16 00256 g002
Figure 3. (a) Band structures of monolayer T-CrS2F2 near the Fermi level, considered without (w/o) and with (w) the SOC effects. (b) The abnormal Hall conductivity of monolayer T-CrS2F2. (c) The topological edge states. (d) Berry curvature of the valence bands.
Figure 3. (a) Band structures of monolayer T-CrS2F2 near the Fermi level, considered without (w/o) and with (w) the SOC effects. (b) The abnormal Hall conductivity of monolayer T-CrS2F2. (c) The topological edge states. (d) Berry curvature of the valence bands.
Nanomaterials 16 00256 g003
Figure 4. (a) The energy gap of monolayer T-CrS2F2 considering the SOC effect, (b) the Chern number, and (c) the Curie temperature as a function of strain ε.
Figure 4. (a) The energy gap of monolayer T-CrS2F2 considering the SOC effect, (b) the Chern number, and (c) the Curie temperature as a function of strain ε.
Nanomaterials 16 00256 g004
Figure 5. (a) Band structure of monolayer T-HfS2F2 without considering SOC effects. (b) Band structures of monolayer T-HfS2F2 near the Fermi level, without (w/o) and with (w) the consideration of SOC effects. (c) The Wilson loop spectrum of monolayer T-HfS2F2. (d) The edge states of monolayer T-HfS2F2.
Figure 5. (a) Band structure of monolayer T-HfS2F2 without considering SOC effects. (b) Band structures of monolayer T-HfS2F2 near the Fermi level, without (w/o) and with (w) the consideration of SOC effects. (c) The Wilson loop spectrum of monolayer T-HfS2F2. (d) The edge states of monolayer T-HfS2F2.
Nanomaterials 16 00256 g005
Figure 6. (ac) The band structure of monolayer T-CoS2F2 calculated using the (a) standard DFT method, (b) HSE06 hybrid functional method, and (c) DFT+U method (U = 3 eV). (d) The band gap as a function of U. (e) Monte Carlo simulation results for T-CoS2F2 using the DFT+U method (U = 3 eV). (f) The Curie temperature as a function of the U value.
Figure 6. (ac) The band structure of monolayer T-CoS2F2 calculated using the (a) standard DFT method, (b) HSE06 hybrid functional method, and (c) DFT+U method (U = 3 eV). (d) The band gap as a function of U. (e) Monte Carlo simulation results for T-CoS2F2 using the DFT+U method (U = 3 eV). (f) The Curie temperature as a function of the U value.
Nanomaterials 16 00256 g006
Figure 7. (ac) The band structure of (a) monolayer T-FeS2F2, (b) monolayer T-RuS2F2, and (c) monolayer T-OsS2F2. (df) The TDOS and PDOS of each element for (d) monolayer T-FeS2F2, (e) monolayer T-RuS2F2, and (f) monolayer T-OsS2F2.
Figure 7. (ac) The band structure of (a) monolayer T-FeS2F2, (b) monolayer T-RuS2F2, and (c) monolayer T-OsS2F2. (df) The TDOS and PDOS of each element for (d) monolayer T-FeS2F2, (e) monolayer T-RuS2F2, and (f) monolayer T-OsS2F2.
Nanomaterials 16 00256 g007
Disclaimer/Publisher’s Note: The statements, opinions and data contained in all publications are solely those of the individual author(s) and contributor(s) and not of MDPI and/or the editor(s). MDPI and/or the editor(s) disclaim responsibility for any injury to people or property resulting from any ideas, methods, instructions or products referred to in the content.

Share and Cite

MDPI and ACS Style

Zheng, L.; Liu, C.; Gao, Y.; Li, A.; Duan, H.; Ouyang, F. Electronic and Magnetic Properties of Fluorinated Transition Metal Dichalcogenide 1T-MX2F2 (X = S, Se, Te) Monolayers. Nanomaterials 2026, 16, 256. https://doi.org/10.3390/nano16040256

AMA Style

Zheng L, Liu C, Gao Y, Li A, Duan H, Ouyang F. Electronic and Magnetic Properties of Fluorinated Transition Metal Dichalcogenide 1T-MX2F2 (X = S, Se, Te) Monolayers. Nanomaterials. 2026; 16(4):256. https://doi.org/10.3390/nano16040256

Chicago/Turabian Style

Zheng, Lixia, Chenzhi Liu, Yunfei Gao, Aolin Li, Haiming Duan, and Fangping Ouyang. 2026. "Electronic and Magnetic Properties of Fluorinated Transition Metal Dichalcogenide 1T-MX2F2 (X = S, Se, Te) Monolayers" Nanomaterials 16, no. 4: 256. https://doi.org/10.3390/nano16040256

APA Style

Zheng, L., Liu, C., Gao, Y., Li, A., Duan, H., & Ouyang, F. (2026). Electronic and Magnetic Properties of Fluorinated Transition Metal Dichalcogenide 1T-MX2F2 (X = S, Se, Te) Monolayers. Nanomaterials, 16(4), 256. https://doi.org/10.3390/nano16040256

Note that from the first issue of 2016, this journal uses article numbers instead of page numbers. See further details here.

Article Metrics

Back to TopTop