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Journal: Nanomaterials, 2021
Volume: 11
Number: 762

Article: CuO/PMMA Polymer Nanocomposites as Novel Resist Materials for E-Beam Lithography
Authors: by Georgia Geka, George Papageorgiou, Margarita Chatzichristidi, Andreas Germanos Karydas, Vassilis Psycharis and Eleni Makarona
Link: https://www.mdpi.com/2079-4991/11/3/762

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