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Journal: Appl. Sci., 2018
Volume: 8
Number: 846
Article:
An Approach to Reduce Greenhouse Gases in the Semiconductor Industry Using F2 Dissociated in Plasma for CVD Chamber Cleaning
Authors:
by
Jamila Boudaden, Stephan Altmannshofer, Robert Wieland, Michael Pittroff and Ignaz Eisele
Link:
https://www.mdpi.com/2076-3417/8/6/846
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