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Journal: Applied SciencesVolume: 8Number: 846
Article: An Approach to Reduce Greenhouse Gases in the Semiconductor Industry Using F2 Dissociated in Plasma for CVD Chamber Cleaning
- Authors:
- Jamila Boudaden 1,2,*,
- Stephan Altmannshofer 1 and
- Ignaz Eisele 1
- et al.
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