- Review
Experimental Strategies for Studying Tribo-Electrochemical Aspects of Chemical–Mechanical Planarization
- Kassapa Gamagedara and
- Dipankar Roy
Chemical–mechanical planarization (CMP) is used to smoothen the topographies of a rough surface by combining several functions of tribology (friction, lubrication), chemistry, and electrochemistry (corrosion, wear, tribo-corrosion). The surface...

