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Journal: Polymers, 2025
Volume: 17
Number: 2435

Article: An Acid-Cleavable Lamellar Block Copolymer for Sub-30-nm Line Spacing Patterning via Graphoepitaxial Directed Self-Assembly and Direct Wet Etching
Authors: by Jianghao Zhan, Caiwei Shang, Muqiao Niu, Jiacheng Luo, Shengguang Gao, Zhiyong Wu, Shengru Niu, Yiming Xu, Xingmiao Zhang, Zili Li and Shisheng Xiong
Link: https://www.mdpi.com/2073-4360/17/18/2435

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