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Journal: Polymers, 2024
Volume: 16
Number: 825
Article:
Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists
Authors:
by
Junjun Liu, Dong Wang, Yitan Li, Haihua Wang, Huan Chen, Qianqian Wang and Wenbing Kang
Link:
https://www.mdpi.com/2073-4360/16/6/825
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