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Journal: Micromachines, 2025
Volume: 16
Number: 380

Article: Investigation of the Visible Photocatalytic–Fenton Reactive Composite Polishing Process for Single-Crystal SiC Wafers Based on Response Surface Methodology
Authors: by Zijuan Han, Bo Ran, Jisheng Pan and Rongji Zhuang
Link: https://www.mdpi.com/2072-666X/16/4/380

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