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Journal: Micromachines, 2023
Volume: 14
Number: 200
200
Article: CMP Pad Conditioning Using the High-Pressure Micro-Jet Method
Authors: by Xin Li, Yinggang Wang, Hongyu Chen, Wenhong Zhao, Qianfa Deng, Tengfei Yin, Suet To, Zhe Sun, Xi Shen, Wei Hang and Julong Yuan
Link: https://www.mdpi.com/2072-666X/14/1/200

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