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Kukli K, Aarik L, Vinuesa G, Dueñas S, Castán H, García H, Kasikov A, Ritslaid P, Piirsoo H-M, Aarik J. Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition. Materials. 2022; 15(3):877. https://doi.org/10.3390/ma15030877

Kukli, Kaupo, Lauri Aarik, Guillermo Vinuesa, Salvador Dueñas, Helena Castán, Héctor García, Aarne Kasikov, Peeter Ritslaid, Helle-Mai Piirsoo, and Jaan Aarik. 2022. "Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition" Materials 15, no. 3: 877. https://doi.org/10.3390/ma15030877

Kukli, K., Aarik, L., Vinuesa, G., Dueñas, S., Castán, H., García, H., Kasikov, A., Ritslaid, P., Piirsoo, H.-M., & Aarik, J. (2022). Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition. Materials, 15(3), 877. https://doi.org/10.3390/ma15030877