Sign in to use this feature.

Years

Between: -

Subjects

remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline

Journals

remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline

Article Types

Countries / Regions

remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline

Search Results (704)

Search Parameters:
Keywords = thin films and microstructure

Order results
Result details
Results per page
Select all
Export citation of selected articles as:
32 pages, 1577 KB  
Review
Research Progress on Transparent Conductive Properties of SnO2 Thin Films
by Xuezhi Li, Fuyueyang Tan, Chi Zhang, Jinhui Zhou, Zhengjie Guo, Yikun Yang, Yixian Xie, Xi Cao, Yuying Feng, Chenyao Huang, Zaijin Li, Yi Qu and Lin Li
Coatings 2026, 16(1), 23; https://doi.org/10.3390/coatings16010023 - 24 Dec 2025
Viewed by 177
Abstract
As a core candidate material for indium-free transparent conductive oxides, tin dioxide (SnO2) thin films are gradually replacing indium tin oxide (ITO) and becoming a research focus in the field of optoelectronic devices, thanks to their excellent physicochemical stability, wide bandgap [...] Read more.
As a core candidate material for indium-free transparent conductive oxides, tin dioxide (SnO2) thin films are gradually replacing indium tin oxide (ITO) and becoming a research focus in the field of optoelectronic devices, thanks to their excellent physicochemical stability, wide bandgap characteristics, and abundant tin resource reserves. This review focuses on SnO2 thin films. Firstly, it elaborates on the tetragonal rutile crystal structure characteristics of SnO2 and the transparent conductive mechanism based on oxygen vacancies and doping elements to regulate free electron concentration, while clarifying the key parameters for evaluating their transparent conductive properties. Subsequently, it systematically summarizes the research progress in preparing SnO2 transparent conductive thin films via physical methods and chemical methods in recent years. It compares the microstructure and transparent conductive properties of thin films prepared by different methods, and analyzes the regulatory laws of preparation processes, doping types, and film thickness on their optoelectronic properties. Furthermore, this work supplements the current application status of SnO2 thin films in devices. Meanwhile, the core performance differences between indium-free tin-based thin film devices and ITO-based devices are compared. Finally, we have summarized the advantages and challenges of physical and chemical methods in the preparation of SnO2 thin films. It also forecasts the application potential of interdisciplinary integration of physical–chemical methods and the development of new doping systems in the preparation of high-performance SnO2 transparent conductive thin films. This review aims to provide theoretical guidance and technical references for the selection and process optimization of SnO2 transparent conductive thin films in fields such as photovoltaic devices and flexible optoelectronic equipment. Full article
(This article belongs to the Special Issue Recent Developments in Thin Films for Technological Applications)
Show Figures

Figure 1

17 pages, 4669 KB  
Article
One-Step Electrodeposition of Hybrid Semiconductive CdSe/Nitrogen-Doped Carbon Dots Thin Films
by Katerina Pappa, Maria Myrto Dardavila, Athanasios Tzanis, Adamantia Zourou, Christina Mitzithra, Stylianos Hamilakis, Zaphirios Loizos, Konstantinos Kordatos and Constantina Kollia
Materials 2025, 18(24), 5691; https://doi.org/10.3390/ma18245691 - 18 Dec 2025
Viewed by 139
Abstract
Novel hybrid semiconducting thin films comprising CdSe with the addition of nitrogen-doped carbon dots (NCDs) were developed onto titanium substrates using a one-step electrocodeposition technique. The deposition took place using an acidic aqueous electrolytic bath containing hydrothermally produced ΝCDs under direct and pulse [...] Read more.
Novel hybrid semiconducting thin films comprising CdSe with the addition of nitrogen-doped carbon dots (NCDs) were developed onto titanium substrates using a one-step electrocodeposition technique. The deposition took place using an acidic aqueous electrolytic bath containing hydrothermally produced ΝCDs under direct and pulse current regime. The specimens were studied using XRD, SEM-EDS, and UV-Vis spectroscopy techniques to determine their microstructural characteristics, surface morphology and composition and the energy gap, respectively. Their photochemical behavior was studied utilizing a photoelectrochemical cell (PEC). Variations in physical properties, along with significantly improved photoelectrochemical responses, were observed for the NCD-infused semiconductive thin films compared to their plain CdSe counterparts. These variations were highly affected by the incorporation rate of the NCDs in each thin film, as well as the imposed electrolysis conditions. Full article
(This article belongs to the Special Issue Design and Electrochemical Synthesis of Multifunctional Surfaces)
Show Figures

Figure 1

9 pages, 2240 KB  
Article
Controlling the Scandium Gradient and Microstructure in AlN Thin Films via a Magnetron Sputtering-Ion Implantation Strategy
by Xiaolu Yuan, Xueyang Bai, Ke Huang, Junjun Wei, Liangxian Chen, Jinlong Liu, Chengming Li and Wenrui Wang
Coatings 2025, 15(12), 1481; https://doi.org/10.3390/coatings15121481 - 15 Dec 2025
Viewed by 159
Abstract
Scandium (Sc)-doped aluminum nitride (AlN) thin films are critical for high-frequency, high-power surface acoustic wave (SAW) devices. A composite Sc doping strategy for AlN thin films is proposed, which combines magnetron sputtering pre-doping with post-doping via ion implantation to achieve gradient doping and [...] Read more.
Scandium (Sc)-doped aluminum nitride (AlN) thin films are critical for high-frequency, high-power surface acoustic wave (SAW) devices. A composite Sc doping strategy for AlN thin films is proposed, which combines magnetron sputtering pre-doping with post-doping via ion implantation to achieve gradient doping and tailor microstructural characteristics. The crystal structure, surface composition, and microstructural defects of the films were characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), energy-dispersive X-ray spectroscopy (EDS) and transmission electron microscopy (TEM). Results indicate that the Sc content in pre-doped ScAlN films was optimized from below 10 at.% to above 30 at.%, while the films maintained a stable (002) preferred orientation. XPS analysis confirmed the formation of Sc-N bonds, and EDS mapping revealed a gradient distribution of Sc within the subsurface region, extending to a depth of approximately 200 nm. High-resolution TEM revealed localized lattice distortions and surface amorphization induced by ion implantation. This work demonstrates the feasibility of ion implantation as a supplementary doping technique, offering theoretical insights for developing AlN films with high Sc doping concentrations and structural stability. These findings hold significant potential for optimizing the performance of high-frequency, high-power SAW devices. Full article
Show Figures

Graphical abstract

15 pages, 7033 KB  
Article
Effects of Multi-Pass Butt-Upset Cold Welding on Mechanical Performance of Cu-Mg Alloys
by Yuan Yuan, Yong Pang, Zhu Xiao, Shifang Li and Zejun Wang
Materials 2025, 18(24), 5641; https://doi.org/10.3390/ma18245641 - 15 Dec 2025
Viewed by 168
Abstract
Joining high-strength, cold-drawn Cu-Mg alloy conductors is a critical challenge for ensuring the reliability of high-speed railway catenary systems. This study investigates the evolution of mechanical properties and microstructure in Cu-0.43 wt% Mg alloy wires joined by multi-pass butt-upset cold welding without special [...] Read more.
Joining high-strength, cold-drawn Cu-Mg alloy conductors is a critical challenge for ensuring the reliability of high-speed railway catenary systems. This study investigates the evolution of mechanical properties and microstructure in Cu-0.43 wt% Mg alloy wires joined by multi-pass butt-upset cold welding without special surface preparation. High-integrity joints were achieved, exhibiting a peak tensile strength of 624 MPa (~96% of the base material’s strength). After four upsetting processes, the tensile strength of the weld can reach 90% of the original strength, and the gains from subsequent upsetting processes are negligible. Microstructural analysis revealed the joining process is governed by localized severe shear deformation, which forges a distinct gradient microstructure. This includes a transition zone of fine, equiaxed-like grains formed by dynamic recrystallization/recovery, and a central zone featuring a nano-laminar structure, high dislocation density, and deformation twins. A multi-stage dynamic bonding mechanism is proposed. It progresses from initial contact via thin film theory to bond consolidation through a “mechanical self-cleaning” process, where extensive radial plastic flow effectively expels surface contaminants. This work clarifies the fundamental bonding principles for pre-strained, high-strength alloys under multi-pass cold welding, providing a scientific basis to optimize this heat-free joining technology for industrial applications. Full article
(This article belongs to the Section Metals and Alloys)
Show Figures

Graphical abstract

14 pages, 3411 KB  
Article
Engineering the MoOx/CIGS Interface for Enhanced Performance and Suppressed Recombination in Industrial Modules
by Mingguang Chen, Yao Gao, Bitao Chen, Disheng Yao, Guoyuan Zheng, Jilin Wang, Shuyi Mo, Yong Peng and Fei Long
Materials 2025, 18(24), 5569; https://doi.org/10.3390/ma18245569 - 11 Dec 2025
Viewed by 334
Abstract
This study investigates how molybdenum oxide (MoOx) rear interface passivation—specifically its thickness and deposition conditions—affects CIGS thin-film solar cells. The MoOx layer effectively suppresses selenium/sulfur diffusion into the molybdenum back contact during high-temperature processing, while improving the absorber’s microstructure by [...] Read more.
This study investigates how molybdenum oxide (MoOx) rear interface passivation—specifically its thickness and deposition conditions—affects CIGS thin-film solar cells. The MoOx layer effectively suppresses selenium/sulfur diffusion into the molybdenum back contact during high-temperature processing, while improving the absorber’s microstructure by reducing interfacial voids. These modifications enhance electrical properties, yielding lower series resistance, higher shunt resistance, and improved fill factor and current density. Although recombination increases slightly, the reduction in voltage-related fill factor loss ultimately boosts hole extraction and suppresses electron recombination at the back contact. Consequently, MoOx-passivated cells achieve superior performance, with industrial-scale modules (1650 mm × 658 mm) reaching 152.41 W output power and 14.0% efficiency. This work provides valuable insights for optimizing MoOx-based interface engineering to improve CIGS solar cell efficiency and manufacturability. Full article
(This article belongs to the Special Issue Advanced Photovoltaic Materials: Properties and Applications)
Show Figures

Graphical abstract

26 pages, 18739 KB  
Article
ZnO Thin Films as Promising Corrosion Protection on Mg-Based Alloys
by Aneta Kania, Magdalena M. Szindler, Marek Szindler, Zbigniew Brytan, Monika Kciuk, Wojciech Pakieła, Łukasz Reimann and Paweł M. Nuckowski
Materials 2025, 18(24), 5568; https://doi.org/10.3390/ma18245568 - 11 Dec 2025
Viewed by 193
Abstract
The present study examined the microstructure and corrosion characteristics of MgCa4Zn1Gd1 and MgCa2Zn1Gd3 alloys that were coated with ZnO thin films, which were deposited by atomic layer deposition (ALD). Coatings of different thicknesses (42.5, 95.4 and 133.7 nm for 500, 1000, and 1500 [...] Read more.
The present study examined the microstructure and corrosion characteristics of MgCa4Zn1Gd1 and MgCa2Zn1Gd3 alloys that were coated with ZnO thin films, which were deposited by atomic layer deposition (ALD). Coatings of different thicknesses (42.5, 95.4 and 133.7 nm for 500, 1000, and 1500 cycles, respectively) were characterized using X-ray diffraction (XRD), Raman spectroscopy, SEM/EDS, AFM (atomic force microscope), and FTIR (Fourier transform infrared spectroscopy). XRD and Raman analyses were conducted to verify the formation of crystalline zinc oxide (ZnO) with a homogeneous granular morphology. Surface roughness decreased with increasing coating thickness, reaching the lowest values for the 1500-cycle ZnO layer on MgCa2Zn1Gd3 (Ra = 7.65 nm, Rs = 9.8 nm). Potentiodynamic and immersion tests in Ringer solution at 37 °C revealed improved corrosion resistance for thicker coatings, with the lowest hydrogen evolution (20.89 mL·cm−2) observed for MgCa2Zn1Gd3 coated after 1500 cycles. Analysis of corrosion products by FTIR identified Mg(OH)2 and MgCO3 as dominant and then MgO and ZnO. Phase analysis also indicated the presence of ZnO coating after 100 h of immersion. The ZnO film deposited after 1500 ALD cycles on MgCa2Zn1Gd3 provides the most effective corrosion protection and is a promising solution for biodegradable magnesium implants. Full article
(This article belongs to the Special Issue Corrosion and Corrosion Protection of Metals/Alloys)
Show Figures

Graphical abstract

15 pages, 1811 KB  
Article
Rheological Characterization of Marine and Bovine Collagen Peptides/Acetic Acid Slurries Incorporating Hydroxyapatite Nanoparticles
by Mario Milazzo, Claudio Ricci, Eugenio Redolfi Riva, Damiano Rossi, Irene Anguillesi, Maurizia Seggiani, Giuseppe Gallone and Serena Danti
Polymers 2025, 17(23), 3196; https://doi.org/10.3390/polym17233196 - 30 Nov 2025
Viewed by 348
Abstract
The development of collagen-based composite materials for bone tissue engineering requires a comprehensive understanding of their rheological and structural behavior to ensure processability and functional stability. This study investigates the viscoelastic and morphological properties of nanocomposite slurries composed of hydroxyapatite (HA) nanoparticles dispersed [...] Read more.
The development of collagen-based composite materials for bone tissue engineering requires a comprehensive understanding of their rheological and structural behavior to ensure processability and functional stability. This study investigates the viscoelastic and morphological properties of nanocomposite slurries composed of hydroxyapatite (HA) nanoparticles dispersed in acetic acid solutions of bovine or fish-derived collagen peptides. Frequency and strain sweep tests revealed solid-like behavior and shear-thinning characteristics consistent with printable bioinks. Both formulations yield stresses between 0.7 and 1.5 kPa, values comparable to those reported for 3D-printable HA composites. Over ten days of aging, fish-based formulations retained higher viscosity and modulus, indicating improved temporal stability relative to bovine-based ones. Drop-casting tests confirmed the formation of homogeneous, highly opalescent films, with surface profilometry showing lower waviness for the fish-derived blend, suggesting enhanced microstructural uniformity. These results demonstrate that acetic acid-mediated collagen–HA interactions generate stable, high-fidelity slurries suitable for additive manufacturing applications. The superior rheological properties of fish collagen formulations highlight the influence of peptide source on network evolution, offering valuable insight for optimizing collagen–ceramic composites in regenerative and biomedical applications. Full article
Show Figures

Graphical abstract

122 pages, 5811 KB  
Review
Thin Films for Next Generation Technologies: A Comprehensive Review of Fundamentals, Growth, Deposition Strategies, Applications, and Emerging Frontiers
by Ajith P. Arun, Niranjana Sreenivasan, Jagadish H. Patil, Raviraj Kusanur, Hemanth L. Ramachandraiah and Mahesh Ramakrishna
Processes 2025, 13(12), 3846; https://doi.org/10.3390/pr13123846 - 28 Nov 2025
Viewed by 2134
Abstract
Thin films have become indispensable in shaping the landscape of modern and future technologies, offering versatile platforms where properties can be engineered at the atomic to microscale to deliver performance unattainable with bulk materials. Historically evolving from protective coatings and optical layers, the [...] Read more.
Thin films have become indispensable in shaping the landscape of modern and future technologies, offering versatile platforms where properties can be engineered at the atomic to microscale to deliver performance unattainable with bulk materials. Historically evolving from protective coatings and optical layers, the field has advanced into a highly interdisciplinary domain that underpins innovations in microelectronics, energy harvesting, optoelectronics, sensing, and biomedical devices. In this review, a structured approach has been adopted to consolidate the fundamentals of thin film growth and the governing principles of nucleation, surface dynamics, and interface interactions, followed by an in-depth comparison of deposition strategies such as physical vapor deposition, chemical vapor deposition, atomic layer deposition (ALD), and novel solution-based techniques, highlighting their scalability, precision, and application relevance. By critically evaluating experimental studies and technological implementations, this review identifies key findings linking microstructural evolution to device performance, while also addressing the pressing challenges of stability, degradation pathways, and reliability under operational stresses. The synthesis of evidence points to the transformative role of advanced deposition controls, in situ monitoring, and emerging AI-driven optimization in overcoming current bottlenecks. Ultimately, this work concludes that thin film technologies are poised to drive the next generation of sustainable, intelligent, and multifunctional devices, with emerging frontiers such as hybrid heterostructures, quantum materials, and bio-integrated systems charting the future roadmap. Full article
(This article belongs to the Section Materials Processes)
Show Figures

Graphical abstract

16 pages, 4514 KB  
Article
Investigation of Scaling and Materials’ Performance of EHLA-Fabricated Cladding in Simulated Geothermal Brine
by David Martelo, Erfan Abedi Esfahani, Namrata Kale, Tomaso Maccio and Shiladitya Paul
Coatings 2025, 15(12), 1366; https://doi.org/10.3390/coatings15121366 - 22 Nov 2025
Viewed by 562
Abstract
This study investigates the corrosion and scaling behaviour of Extreme High-speed Laser Application (EHLA)-fabricated corrosion-resistant alloy (CRA) claddings under simulated geothermal brine conditions. EHLA 316L stainless steel and alloy 625 coatings were produced and tested in simulated brine (chloride–carbonate–silica geothermal brine) at 70 [...] Read more.
This study investigates the corrosion and scaling behaviour of Extreme High-speed Laser Application (EHLA)-fabricated corrosion-resistant alloy (CRA) claddings under simulated geothermal brine conditions. EHLA 316L stainless steel and alloy 625 coatings were produced and tested in simulated brine (chloride–carbonate–silica geothermal brine) at 70 °C for 720 h to evaluate the influence of additive manufacturing (AM) microstructures on corrosion performance. The EHLA coatings exhibited dense, metallurgically bonded microstructures with minimal porosity. Microstructural analysis revealed Nb- and Mo-rich segregation in EHLA 625 and fine columnar dendritic morphology in all coatings. EHLA 625 developed a stable passive film with only a thin deposit of Mg-O-containing compounds, whereas EHLA 316L exhibited localised pitting and significant Si- and Mg-containing scale accumulation, especially in as-built conditions. Surface finishing reduced corrosion activity by minimising roughness and defect-driven localised attack. Critical pitting temperature (CPT) tests confirmed the superior localised corrosion resistance of EHLA 625 relative to EHLA 316L under laboratory conditions. While these results indicate promising corrosion and scaling resistance of EHLA coatings, further process optimisation and post-deposition thermal treatments might be required to achieve coating performance comparable to wrought alloys. The results indicate the potential of EHLA-fabricated coatings for producing corrosion and scaling resistance surfaces. Full article
(This article belongs to the Special Issue Engineered Coatings for a Sustainable Future)
Show Figures

Figure 1

15 pages, 1871 KB  
Article
Low-Temperature RF Magnetron Sputtering of TiW Thin Films: Effects of the Bulk Plasma Characteristics on Film Growth
by Chiyun Bang, Chang Yeong Ji and Ju-Hong Cha
Appl. Sci. 2025, 15(22), 12300; https://doi.org/10.3390/app152212300 - 19 Nov 2025
Viewed by 503
Abstract
TiW thin films with superior surface properties were deposited at room temperature using RF magnetron sputtering under low-temperature process conditions. The correlation between bulk plasma characteristics and thin-film properties was investigated as a function of applied RF power (200–600 W) and process pressure [...] Read more.
TiW thin films with superior surface properties were deposited at room temperature using RF magnetron sputtering under low-temperature process conditions. The correlation between bulk plasma characteristics and thin-film properties was investigated as a function of applied RF power (200–600 W) and process pressure (1–10 mTorr). Plasma potential and ion density were measured using a Langmuir probe, while deposition rate, surface roughness, sheet resistance, and crystallinity were evaluated. Increasing the applied RF power simultaneously increased plasma potential and ion density, enhancing ion bombardment energy at both the target and substrate, which improved sputtering efficiency and deposition rate. Under low-temperature deposition, thermal stress induced by differences in thermal expansion between the film and substrate was minimal. However, limited surface diffusion of adatoms caused incomplete coalescence of nucleation islands, adversely affecting film crystallinity. Refractory metals such as tungsten exhibit strong dependence of residual stress and microstructure on deposition conditions, highlighting the importance of plasma and process parameters on TiW film properties. When RF power was increased, the enhancement in deposition rate outweighed the effect of increased ion energy, leading to tensile stress from void formation dominating over compressive stress induced by high-energy ions. This also contributed to increased grain size and reduced sheet resistance. In contrast, variations in process pressure had minor effects on plasma characteristics, resulting in limited changes in the deposited film properties. Full article
(This article belongs to the Special Issue Plasma Applications in Material Processing)
Show Figures

Figure 1

14 pages, 1914 KB  
Article
Microstructure Regulation and Optoelectronic Performance Optimization of Flexible CPI-Based ITO Thin Films Under Low-Temperature Heat Treatment Process
by Hanyan Zhang, Ruohe Yao, Weijing Wu and Yi Shen
Coatings 2025, 15(11), 1352; https://doi.org/10.3390/coatings15111352 - 19 Nov 2025
Viewed by 350
Abstract
Addressing the urgent need for low-temperature processes in the manufacturing of flexible vehicle-mounted touch display devices, this study investigates the process–structure–performance relationships of indium tin oxide (ITO) thin films prepared by DC magnetron sputtering on transparent polyimide (CPI) substrates. A synergistic strategy of [...] Read more.
Addressing the urgent need for low-temperature processes in the manufacturing of flexible vehicle-mounted touch display devices, this study investigates the process–structure–performance relationships of indium tin oxide (ITO) thin films prepared by DC magnetron sputtering on transparent polyimide (CPI) substrates. A synergistic strategy of “low-temperature deposition (110 °C)–230 °C atmospheric annealing” was employed. The optimal sample exhibited excellent comprehensive performance: a resistivity as low as 203 μΩ·cm, an average visible light transmittance of 89.2%, a surface roughness of 0.76 nm, and the ability to endure 100,000 bending cycles at a radius of R = 5 mm with a sheet resistance change rate of less than 10%. Microstructural and chemical state analyses revealed that this process facilitates the complete oxidation of Sn2+ to Sn4+ (Sn4+/Sn2+ ratio of 8.2:1) and the controlled formation of oxygen vacancies (O_L/O_V ratio of 6.5:1), leading to a synergistic improvement in carrier concentration (8.7 × 1020 cm−3) and mobility (35.2 cm2/V·s). This work elucidates the crystallization kinetics and doping mechanisms under low-temperature conditions, providing a viable low-temperature technical pathway for the fabrication of high-performance transparent electrodes in flexible electronics. Full article
Show Figures

Figure 1

10 pages, 1697 KB  
Article
Persistent PbI2-Passivated Microdomains in As-Prepared MAPbI3 Perovskite Thin Film Revealed by Spatially Resolved Photoluminescence and Raman Maps
by Bong-Geun Kim, Jiwon Choi, Taeji Seo, Hyun Sung Kim, Minseok Kwak, Joonkyung Jang, Songyi Lee and Myeongkee Park
Crystals 2025, 15(11), 991; https://doi.org/10.3390/cryst15110991 - 17 Nov 2025
Viewed by 550
Abstract
Methylammonium lead iodide (MAPbI3) perovskite has been widely studied for its optoelectronic properties, but its polycrystalline thin films inevitably contain grain boundaries and defects that degrade performance and stability. PbI2 is often considered a destabilizing agent in perovskites, yet it [...] Read more.
Methylammonium lead iodide (MAPbI3) perovskite has been widely studied for its optoelectronic properties, but its polycrystalline thin films inevitably contain grain boundaries and defects that degrade performance and stability. PbI2 is often considered a destabilizing agent in perovskites, yet it has also been reported to act as a passivation agent, making its role a subject of debate. Here, we performed integrated optical, photoluminescence (PL), and ultra-low-frequency Raman mapping on a 100 μm2 region of MAPbI3 thin films to study the roles of PbI2. The analyses resolved α-phase MAPbI3-rich, PbI2-rich, and mixed-phase domains, revealing heterogeneous PbI2 distribution with PL quenching at defect sites. In addition, after light-induced degradation, PL changes were governed by both the local microstructure and PbI2 distribution. Notably, PbI2-rich regions retained PL, evidencing a protective passivation effect. These findings demonstrate that the beneficial role of PbI2 is key to designing more stable perovskite devices. Full article
(This article belongs to the Section Hybrid and Composite Crystalline Materials)
Show Figures

Figure 1

37 pages, 2700 KB  
Review
Research Progress on Electrochromic Properties of WO3 Thin Films
by Fuyueyang Tan, Jinhui Zhou, Zhengjie Guo, Chi Zhang, Shaoyi Yu, Yikun Yang, Yixian Xie, Xi Cao, Xinyi Wu, Xiaofei Gao, Zaijin Li, Yi Qu and Lin Li
Coatings 2025, 15(11), 1310; https://doi.org/10.3390/coatings15111310 - 10 Nov 2025
Cited by 1 | Viewed by 1268
Abstract
With continuous breakthroughs in electrochromic technology, tungsten trioxide (WO3) thin films, as a core material in this field, are rapidly expanding their applications in smart windows, anti-glare automotive rearview mirrors, and adaptive optical lenses. Owing to its excellent electrochromic properties—including high [...] Read more.
With continuous breakthroughs in electrochromic technology, tungsten trioxide (WO3) thin films, as a core material in this field, are rapidly expanding their applications in smart windows, anti-glare automotive rearview mirrors, and adaptive optical lenses. Owing to its excellent electrochromic properties—including high optical modulation, short switching times, and high coloration efficiency—WO3 has become a research focus in the field of electrochromic devices. This review takes WO3 thin films as the research subject. It begins by introducing the crystal structure of WO3 and the ion/electron co-intercalation-based electrochromic mechanism and explains two key performance parameters for evaluating electrochromic properties: optical modulation amplitude and coloration efficiency. Subsequently, it provides a detailed review of recent advances in the preparation of WO3 thin films via physical methods (including sputtering deposition, evaporative deposition, and pulsed laser deposition) and chemical methods (including hydrothermal, sol–gel, and electrodeposition methods). A systematic comparison is made of the microstructure and electrochromic performance (optical modulation amplitude and coloration efficiency) of films prepared by different methods, and the interaction between WO3 film morphology and device structure is analyzed. Finally, the advantages and challenges of physical and chemical methods in tuning film properties are summarized, and the outlook of their application prospects in high-performance electrochromic devices is given. This review aims to provide guidance for the selection and process optimization of WO3 thin films with enhanced performance for applications such as smart windows, anti-glare rearview mirrors, and adaptive optical systems. Full article
(This article belongs to the Special Issue Recent Developments in Thin Films for Technological Applications)
Show Figures

Figure 1

8 pages, 1338 KB  
Article
DC Sputtered Ultra-Thin Au Films and the Effect of Their Morphologies on Au-Catalyzed CIGS Films
by Filiz Keleş
Coatings 2025, 15(11), 1274; https://doi.org/10.3390/coatings15111274 - 3 Nov 2025
Viewed by 543
Abstract
Gold (Au) is one of the noble metals most used as a catalyst in the growth of one-dimensional nanostructures. Usually, an ultra-thin Au film is coated followed by thermal annealing to obtain Au nanoclusters. Although annealing temperature, duration and film thickness parameters have [...] Read more.
Gold (Au) is one of the noble metals most used as a catalyst in the growth of one-dimensional nanostructures. Usually, an ultra-thin Au film is coated followed by thermal annealing to obtain Au nanoclusters. Although annealing temperature, duration and film thickness parameters have been heavily studied, there are no studies on the sputter working gas pressure, which also greatly affects the film microstructure. In this study, low (5 mTorr) and high (15 mTorr) working gas pressures were examined in addition to Au film thicknesses of 2 nm, 5 nm and 8 nm. Additionally, copper indium gallium selenide (CIGS) films were deposited on Au films with different thicknesses and argon (Ar) gas pressures. It was confirmed from SEM and AFM images that the Au films undergo drastic morphology change from smooth to extremely porous film surfaces with increasing thickness regardless of gas pressure. However, the porosity of films is increased at higher growth pressure for each thickness. Specifically, the most porous film was obtained at a 5 nm thickness with 15 mTorr, and it was filled with nanomounds. Not surprisingly, the only apparent columnar-type formation was observed for CIGS deposition, which was carried out on the most porous film. It can be interpreted that Au nanomounds behave like catalysts on which the CIGS nanocolumns grow. Full article
Show Figures

Figure 1

13 pages, 3775 KB  
Article
The Effect of Crystallinity in HfO2 Thin Films Prepared by Evaporation for 1064 nm Absorption
by Peng Zeng, Yali Wu, Xinbo Bai, Zhongmin Cao and Ming Wei
Coatings 2025, 15(11), 1254; https://doi.org/10.3390/coatings15111254 - 30 Oct 2025
Viewed by 495
Abstract
The optical absorption mechanism and the preparation technology for achieving low absorption of HfO2 thin films at 1064 nm were systematically investigated. Through molecular dynamics simulations and electron density of states calculations, it was determined that oxygen vacancies within the thin films [...] Read more.
The optical absorption mechanism and the preparation technology for achieving low absorption of HfO2 thin films at 1064 nm were systematically investigated. Through molecular dynamics simulations and electron density of states calculations, it was determined that oxygen vacancies within the thin films significantly contributed to the absorption of 1064 nm light. HfO2 thin film samples were synthesized using various deposition parameters, followed by comprehensive measurement and analysis of their crystal phase, fluorescence, and microstructure. Theoretical calculations and experimental results indicated that the crystallization of amorphous films increased the presence of oxygen vacancy defects, consequently enhancing film absorption. Notably, following heat treatment at 400 °C, one sample retained a predominantly amorphous structure while exhibiting minimal absorption, suggesting improved optical stability for inertial confinement fusion and industrial laser processing applications. Full article
Show Figures

Figure 1

Back to TopTop