Recent Developments in Thin Films for Technological Applications
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".
Deadline for manuscript submissions: 28 February 2026 | Viewed by 483
Special Issue Editors
Interests: thin films; strained films; nanostructured materials coating; transition metal oxide; transition metal dichalcogenide; strongly correlated materials; metal insulator transition; VO2; thin films deposition; nanostructured films synthesis; surface characterization; work function modification; ordered and disordered nanostructure films
Interests: spectroscopy; metamaterials; plasmonic; phononic; topological materials; exotic excitations
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
We invite you to submit your manuscripts to the Special Issue "Recent Developments in Thin Films for Technological Applications". This Special Issue aims to explore new research works in the field of thin films, with a particular emphasis on transition metal oxides, transition metal dichalcogenides (TMDs), and coating technologies.
Transition metal oxides have garnered substantial attention due to their versatile electronic, optical, and magnetic properties. These materials are pivotal in the development of next-generation electronic devices, sensors, and catalysts. Their unique ability to exhibit various oxidation states and structural phases makes them suitable for applications in energy storage, smart windows, and memristors.
Transition metal dichalcogenides (TMDs) represent another exciting class of materials, characterized by their layered structures and tunable band gaps. TMD thin films exhibit remarkable properties such as high carrier mobility, strong spin–orbit coupling, and flexibility, making them ideal candidates for applications in flexible electronics, valleytronics, and next-generation transistors.
By gathering the latest research and insights, this Special Issue aims to provide a comprehensive overview of the recent developments in thin films and their transformative potential for technological applications.
Topics of interest include, but are not limited to, the following:
- Thin-film growths and characterization;
- Thin-film structure–property relations;
- Functional properties of thin films and coating materials;
- Transition metal oxides heterointerfaces;
- Van der Waals materials characterizations and applications;
- Plasmonic and phononic materials;
- Superconducting materials and coatings.
Dr. Alessandro D'Elia
Dr. Salvatore Macis
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- transition metal oxides
- transition metal dicalcogenides
- thin-film
- growths and characterization
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