Sign in to use this feature.

Years

Between: -

Subjects

remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline

Journals

remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline

Article Types

Countries / Regions

remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline

Search Results (6,272)

Search Parameters:
Keywords = deposited films

Order results
Result details
Results per page
Select all
Export citation of selected articles as:
18 pages, 3706 KiB  
Article
Controllable Preparation of TiO2/SiO2@Blast Furnace Slag Fiber Composites Based on Solid Waste Carriers and Study on Mechanism of Photocatalytic Degradation of Urban Sewage
by Xinwei Luo, Jinhu Wu, Guangqian Zhu, Xinyu Han, Junjian Zhao, Yaqiang Li, Yingying Li and Shaopeng Gu
Catalysts 2025, 15(8), 755; https://doi.org/10.3390/catal15080755 - 7 Aug 2025
Abstract
Photocatalytic composite materials (TiO2/SiO2/BFSF) were first fabricated using the sol–gel method of loading SiO2 and TiO2 on blast furnace slag fibers (BFSFs) in sequence and using them as a new carrier. Then, TG-DTA, XRD, BET, SEM-EDS, and [...] Read more.
Photocatalytic composite materials (TiO2/SiO2/BFSF) were first fabricated using the sol–gel method of loading SiO2 and TiO2 on blast furnace slag fibers (BFSFs) in sequence and using them as a new carrier. Then, TG-DTA, XRD, BET, SEM-EDS, and UV-Vis absorption spectra, as well as spectrophotometric measurements, were employed to analyze the physicochemical properties of TiO2. The influence of SiO2 coating, the number of impregnations in TiO2 sol, the calcination temperature, and the number of repeated usages on the activity of TiO2/SiO2/BFSF was researched by analyzing the degradation of methylene blue (MB) aqueous solution. The results show that SiO2 could increase the load of TiO2, impede the growth of TiO2 grains, and inhibit the recombination of electron–hole pairs, ultimately enhancing the photocatalytic activity of samples. The activity of TiO2/SiO2/BFSF first quickly increased and then slowly decreased with an increase in the loading times of TiO2 sol and calcination temperature. After three impregnations in TiO2 sol and calcining at 450 °C for 2.5 h, a uniform and compact anatase TiO2 thin film was deposited on the surface of TiO2/SiO2/BFSF, showing the strongest activity. When this sample was used to degrade MB aqueous solution for 180 min under ultraviolet light irradiation, the degradation proportion reached a maximum of 96%. After four reuses, the degradation ratio could still reach 67%. In addition, three potential photocatalytic mechanisms were proposed. Finally, the high-value-added application of blast furnace slag for preparing photocatalytic composite materials was achieved, successfully turning solid waste into “treasure”. Full article
(This article belongs to the Special Issue Enhanced Photocatalytic Activity over Ti, Zn, or Sn-Based Catalysts)
Show Figures

Figure 1

24 pages, 19050 KiB  
Article
Innovative Deposition of AZO as Recombination Layer on Silicon Nanowire Scaffold for Potential Application in Silicon/Perovskite Tandem Solar Cell
by Grażyna Kulesza-Matlak, Marek Szindler, Magdalena M. Szindler, Milena Kiliszkiewicz, Urszula Wawrzaszek, Anna Sypień, Łukasz Major and Kazimierz Drabczyk
Energies 2025, 18(15), 4193; https://doi.org/10.3390/en18154193 - 7 Aug 2025
Abstract
Transparent conductive aluminum-doped zinc oxide (AZO) films were investigated as potential recombination layers for perovskite/silicon tandem solar cells, comparing the results of atomic layer deposition (ALD) and magnetron sputtering (MS) on vertically aligned silicon nanowire (SiNW) scaffolds. Conformality and thickness control were examined [...] Read more.
Transparent conductive aluminum-doped zinc oxide (AZO) films were investigated as potential recombination layers for perovskite/silicon tandem solar cells, comparing the results of atomic layer deposition (ALD) and magnetron sputtering (MS) on vertically aligned silicon nanowire (SiNW) scaffolds. Conformality and thickness control were examined by cross-sectional SEM/TEM and profilometry, revealing fully conformal ALD coatings with tunable thicknesses (40–120 nm) versus tip-capped, semi-uniform MS films (100–120 nm). Optical transmission measurements on glass substrates showed that both 120 nm ALD and MS layers exhibit interference maxima near 450–500 nm and 72–89% transmission across 800–1200 nm; the thinnest ALD films reached up to 86% near-IR transparency. Four-point probe analysis demonstrated that ALD reduces surface resistance from 1150 Ω/□ at 40 nm to 245 Ω/□ at 120 nm, while MS layers achieved 317 Ω/□ at 120 nm. These results delineate the balance between conformality, transparency, and conductivity, providing design guidelines for AZO recombination interfaces in next-generation tandem photovoltaics. Full article
(This article belongs to the Special Issue Perovskite Solar Cells and Tandem Photovoltaics)
Show Figures

Figure 1

29 pages, 980 KiB  
Review
Recent Advances in Magnetron Sputtering: From Fundamentals to Industrial Applications
by Przemyslaw Borowski and Jaroslaw Myśliwiec
Coatings 2025, 15(8), 922; https://doi.org/10.3390/coatings15080922 - 7 Aug 2025
Abstract
Magnetron Sputter Vacuum Deposition (MSVD) has undergone significant advancements since its inception. This review explores the evolution of MSVD, encompassing its fundamental principles, various techniques (including reactive sputtering, pulsed magnetron sputtering, and high-power impulse magnetron sputtering), and its wide-ranging industrial applications. While detailing [...] Read more.
Magnetron Sputter Vacuum Deposition (MSVD) has undergone significant advancements since its inception. This review explores the evolution of MSVD, encompassing its fundamental principles, various techniques (including reactive sputtering, pulsed magnetron sputtering, and high-power impulse magnetron sputtering), and its wide-ranging industrial applications. While detailing the advantages of high deposition rates, versatility in material selection, and precise control over film properties, the review also addresses inherent challenges such as low target utilization and plasma instability. A significant portion focuses on the crucial role of MSVD in the automotive industry, highlighting its use in creating durable, high-quality coatings for both aesthetic and functional purposes. The transition from traditional electroplating methods to more environmentally friendly MSVD techniques is also discussed, emphasizing the growing demand for sustainable manufacturing processes. This review concludes by summarizing the key advancements, remaining challenges, and potential future trends in magnetron sputtering technologies. Full article
(This article belongs to the Special Issue Magnetron Sputtering Coatings: From Materials to Applications)
Show Figures

Graphical abstract

16 pages, 2868 KiB  
Article
The Biocorrosion of a Rare Earth Magnesium Alloy in Artificial Seawater Containing Chlorella vulgaris
by Xinran Yao, Qi Fu, Guang-Ling Song and Kai Wang
Materials 2025, 18(15), 3698; https://doi.org/10.3390/ma18153698 - 6 Aug 2025
Abstract
In the medical field, magnesium (Mg) alloys have been widely used due to their excellent antibacterial properties and biodegradability. However, in the marine environment, the antibacterial effect may be greatly attenuated, and consequently, microorganisms in the ocean are likely to adhere to the [...] Read more.
In the medical field, magnesium (Mg) alloys have been widely used due to their excellent antibacterial properties and biodegradability. However, in the marine environment, the antibacterial effect may be greatly attenuated, and consequently, microorganisms in the ocean are likely to adhere to the surface of Mg alloys, resulting in biocorrosion damage, which is really troublesome in the maritime industry and can even be disastrous to the navy. Currently, there is a lack of research on the biocorrosion of Mg alloys that may find important applications in marine engineering. In this paper, the biocorrosion mechanism of the Mg alloy Mg-3Nd-2Gd-Zn-Zr caused by Chlorella vulgaris (C. vulgaris), a typical marine microalga, was studied. The results showed that the biomineralization process in the artificial seawater containing a low concentration of C. vulgaris cells was accelerated compared with that in the abiotic artificial seawater, leading to the deposition of CaCO3 on the surface to inhibit the localized corrosion of the Mg alloy, whereas a high concentration of C. vulgaris cells produced a high content of organic acids at some sites through photosynthesis to significantly accelerate the surface film rupture at some sites and severe localized corrosion there, but meanwhile, it resulted in the formation of a more protective biomineralized film in the other areas to greatly alleviate the corrosion. The contradictory biocorrosion behaviors on the Mg-3Nd-2Gd-Zn-Zr alloy induced by C. vulgaris were finally explained by a mechanism proposed in the paper. Full article
(This article belongs to the Section Corrosion)
10 pages, 6480 KiB  
Article
Effect of Sputtering Power and Post-Deposition Annealing on Thermoelectric Performance of Ag2Se Flexible Thin Films
by Zinan Zhong, Zilong Zhang, Fu Li, Yuexing Chen, Jingting Luo and Zhuanghao Zheng
Solids 2025, 6(3), 42; https://doi.org/10.3390/solids6030042 - 6 Aug 2025
Abstract
Ag2Se has attracted significant attention as a promising alternative to Bi2Te3 for near-room-temperature thermoelectric (TE) applications. In this study, flexible Ag2Se thin films were fabricated via magnetron sputtering under different sputtering power settings, followed by post-deposition [...] Read more.
Ag2Se has attracted significant attention as a promising alternative to Bi2Te3 for near-room-temperature thermoelectric (TE) applications. In this study, flexible Ag2Se thin films were fabricated via magnetron sputtering under different sputtering power settings, followed by post-deposition annealing to optimize their TE properties. Structural and compositional analyses confirmed the successful synthesis of Ag2Se films with high crystallinity. Additionally, tuning the sputtering power and annealing temperatures can effectively enhance the electrical conductivity, Seebeck coefficient, and overall power factor. A significant power factor of ~17.4 µW·cm−1·K−2 at 100 °C was achieved in the 30 W sputtering power and 300 °C annealing sample, pointing out the huge potential of Ag2Se thin films as self-powered flexible devices. Full article
Show Figures

Graphical abstract

17 pages, 4404 KiB  
Proceeding Paper
Surface Roughness and Fractal Analysis of TiO2 Thin Films by DC Sputtering
by Helena Cristina Vasconcelos, Telmo Eleutério and Maria Meirelles
Eng. Proc. 2025, 105(1), 2; https://doi.org/10.3390/engproc2025105002 - 4 Aug 2025
Viewed by 25
Abstract
This study examines the effect of oxygen concentration and sputtering power on the surface morphology of TiO2 thin films deposited by DC reactive magnetron sputtering. Surface roughness parameters were obtained using MountainsMap® software(10.2) from SEM images, while fractal dimensions and texture [...] Read more.
This study examines the effect of oxygen concentration and sputtering power on the surface morphology of TiO2 thin films deposited by DC reactive magnetron sputtering. Surface roughness parameters were obtained using MountainsMap® software(10.2) from SEM images, while fractal dimensions and texture descriptors were extracted via Python-based image processing. Fractal dimension was calculated using the box-counting method applied to binarized images with multiple threshold levels, and texture analysis employed Gray-Level Co-occurrence Matrix (GLCM) statistics to capture local anisotropies and spatial heterogeneity. Four samples were analyzed, previously prepared with oxygen concentrations of 50% and 75%, and sputtering powers of 500 W and 1000 W. The results have shown that films deposited at higher oxygen levels and sputtering powers exhibited increased roughness, higher fractal dimensions, and stronger GLCM contrast, indicating more complex and heterogeneous surface structures. Conversely, films produced at lower oxygen and power settings showed smoother, more isotropic surfaces with lower complexity. This integrated analysis framework links deposition parameters with morphological characteristics, enhancing the understanding of surface evolution and enabling better control of TiO2 thin film properties. Full article
Show Figures

Figure 1

16 pages, 6440 KiB  
Article
Effect of Calcium Sulfate and Silica Gel on Vanadium Leaching Characteristics from Vanadium Titanomagnetite via Calcification Roasting–Sulfuric Acid Leaching: Formation Mechanism and Process Enhancement
by Jianli Chen, Yu Zheng, Benliu He, Shuzhong Chen, Shuai Wang, Feng Chen, Shiyuan Cui, Jing Liu, Lingzhi Yang, Yufeng Guo and Guanzhou Qiu
Metals 2025, 15(8), 870; https://doi.org/10.3390/met15080870 - 3 Aug 2025
Viewed by 147
Abstract
Compared with vanadium extraction by sodium roasting followed by water leaching, the calcification roasting–sulfuric acid leaching method is considered a promising approach for the comprehensive utilization of vanadium titanomagnetite, as it avoids the introduction of alkali metals. However, during vanadium extraction by sulfuric [...] Read more.
Compared with vanadium extraction by sodium roasting followed by water leaching, the calcification roasting–sulfuric acid leaching method is considered a promising approach for the comprehensive utilization of vanadium titanomagnetite, as it avoids the introduction of alkali metals. However, during vanadium extraction by sulfuric acid heap leaching, the diffusion of leaching reagents and leaching products was hindered by the deposition of leaching solid products. To address this issue, this study systematically investigated the leaching kinetics and the mechanisms underlying the deposition of leaching solid products. The results indicated that vanadium leaching was governed by a combination of liquid film diffusion and internal diffusion through solid-phase products during days 0–2, and by internal diffusion alone from day 2 to day 9. The primary solid products formed during leaching were calcium sulfate and silica gel. Calcium sulfate precipitated and grew within the pore via two-dimensional nucleation, while silicates formed silica gel through dehydration. By optimizing the sulfuric acid leaching conditions—specifically, maintaining an H+ concentration of 2 mol/L, a leaching temperature of 40 °C, and a liquid-to-solid ratio of 5:1—the formation of calcium sulfate and silica gel was effectively suppressed. Under these conditions, the vanadium leaching efficiency reached 75.82%. Full article
(This article belongs to the Section Extractive Metallurgy)
14 pages, 6988 KiB  
Article
Effect of Substrate Temperature on the Structural, Morphological, and Infrared Optical Properties of KBr Thin Films
by Teng Xu, Qingyuan Cai, Weibo Duan, Kaixuan Wang, Bojie Jia, Haihan Luo and Dingquan Liu
Materials 2025, 18(15), 3644; https://doi.org/10.3390/ma18153644 - 3 Aug 2025
Viewed by 167
Abstract
Potassium bromide (KBr) thin films were deposited by resistive thermal evaporation at substrate temperatures ranging from 50 °C to 250 °C to systematically elucidate the temperature-dependent evolution of their physical properties. Structural, morphological, and optical characteristics were examined by X-ray diffraction (XRD), scanning [...] Read more.
Potassium bromide (KBr) thin films were deposited by resistive thermal evaporation at substrate temperatures ranging from 50 °C to 250 °C to systematically elucidate the temperature-dependent evolution of their physical properties. Structural, morphological, and optical characteristics were examined by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and Fourier transform infrared spectroscopy (FTIR). The results reveal a complex, non-monotonic response to temperature rather than a simple linear trend. As the substrate temperature increases, growth evolves from a mixed polycrystalline texture to a pronounced (200) preferred orientation. Morphological analysis shows that the film surface is smoothest at 150 °C, while the microstructure becomes densest at 200 °C. These structural variations directly modulate the optical constants: the refractive index attains its highest values in the 150–200 °C window, approaching that of bulk KBr. Cryogenic temperature (6 K) FTIR measurements further demonstrate that suppression of multi-phonon absorption markedly enhances the infrared transmittance of the films. Taken together, the data indicate that 150–200 °C constitutes an optimal process window for fabricating KBr films that combine superior crystallinity, low defect density, and high packing density. This study elucidates the temperature-driven structure–property coupling and offers valuable guidance for optimizing high-performance infrared and cryogenic optical components. Full article
(This article belongs to the Special Issue Obtaining and Characterization of New Materials (5th Edition))
Show Figures

Figure 1

16 pages, 2036 KiB  
Article
Scalable Chemical Vapor Deposition of Silicon Carbide Thin Films for Photonic Integrated Circuit Applications
by Souryaya Dutta, Alex Kaloyeros, Animesh Nanaware and Spyros Gallis
Appl. Sci. 2025, 15(15), 8603; https://doi.org/10.3390/app15158603 - 2 Aug 2025
Viewed by 286
Abstract
Highly integrable silicon carbide (SiC) has emerged as a promising platform for photonic integrated circuits (PICs), offering a comprehensive set of material and optical properties that are ideal for the integration of nonlinear devices and solid-state quantum defects. However, despite significant progress in [...] Read more.
Highly integrable silicon carbide (SiC) has emerged as a promising platform for photonic integrated circuits (PICs), offering a comprehensive set of material and optical properties that are ideal for the integration of nonlinear devices and solid-state quantum defects. However, despite significant progress in nanofabrication technology, the development of SiC on an insulator (SiCOI)-based photonics faces challenges due to fabrication-induced material optical losses and complex processing steps. An alternative approach to mitigate these fabrication challenges is the direct deposition of amorphous SiC on an insulator (a-SiCOI). However, there is a lack of systematic studies aimed at producing high optical quality a-SiC thin films, and correspondingly, on evaluating and determining their optical properties in the telecom range. To this end, we have studied a single-source precursor, 1,3,5-trisilacyclohexane (TSCH, C3H12Si3), and chemical vapor deposition (CVD) processes for the deposition of SiC thin films in a low-temperature range (650–800 °C) on a multitude of different substrates. We have successfully demonstrated the fabrication of smooth, uniform, and stoichiometric a-SiCOI thin films of 20 nm to 600 nm with a highly controlled growth rate of ~0.5 Å/s and minimal surface roughness of ~5 Å. Spectroscopic ellipsometry and resonant micro-photoluminescence excitation spectroscopy and mapping reveal a high index of refraction (~2.7) and a minimal absorption coefficient (<200 cm−1) in the telecom C-band, demonstrating the high optical quality of the films. These findings establish a strong foundation for scalable production of high-quality a-SiCOI thin films, enabling their application in advanced chip-scale telecom PIC technologies. Full article
(This article belongs to the Section Materials Science and Engineering)
Show Figures

Figure 1

25 pages, 15569 KiB  
Article
Studies on the Chemical Etching and Corrosion Resistance of Ultrathin Laminated Alumina/Titania Coatings
by Ivan Netšipailo, Lauri Aarik, Jekaterina Kozlova, Aivar Tarre, Maido Merisalu, Kaisa Aab, Hugo Mändar, Peeter Ritslaid and Väino Sammelselg
Corros. Mater. Degrad. 2025, 6(3), 36; https://doi.org/10.3390/cmd6030036 - 2 Aug 2025
Viewed by 245
Abstract
We investigated the protective properties of ultrathin laminated coatings, comprising three pairs of Al2O3 and TiO2 sublayers with coating thicknesses < 150 nm, deposited on AISI 310 stainless steel (SS) and Si (100) substrates at 80–500 °C by atomic [...] Read more.
We investigated the protective properties of ultrathin laminated coatings, comprising three pairs of Al2O3 and TiO2 sublayers with coating thicknesses < 150 nm, deposited on AISI 310 stainless steel (SS) and Si (100) substrates at 80–500 °C by atomic layer deposition. The coatings were chemically etched and subjected to corrosion, ultrasound, and thermal shock tests. The coating etching resistance efficiency (Re) was determined by measuring via XRF the change in the coating sublayer mass thickness after etching in hot 80% H2SO4. The maximum Re values of ≥98% for both alumina and titania sublayers were obtained for the laminates deposited at 250–400 °C on both substrates. In these coatings, the titania sublayers were crystalline. The lowest Re values of 15% and 50% for the alumina and titania sublayers, respectively, were measured for laminate grown at 80 °C on silicon. The coatings deposited at 160–200 °C demonstrated a delay in the increase of Re values, attributed to the changes in the titania sublayers before full crystallization. Coatings grown at higher temperatures were also more resistant to ultrasound and liquid nitrogen treatments. In contrast, coatings deposited at 125 °C on SS had better corrosion protection, as demonstrated via electrochemical impedance spectroscopy and a standard immersion test in FeCl3 solution. Full article
Show Figures

Graphical abstract

15 pages, 796 KiB  
Article
Electroassisted Incorporation of Ferrocene Within Sol–Gel Silica Films to Enhance Electron Transfer—Part II: Boosting Protein Sensing with Polyelectrolyte-Modified Silica
by Rayane-Ichrak Loughlani, Alonso Gamero-Quijano and Francisco Montilla
Molecules 2025, 30(15), 3246; https://doi.org/10.3390/molecules30153246 - 2 Aug 2025
Viewed by 197
Abstract
Silica-modified electrodes possess physicochemical properties that make them valuable in electrochemical sensing and energy-related applications. Although intrinsically insulating, silica thin films can selectively interact with redox species, producing sieving effects that enhance electrochemical responses. We synthesized Class I hybrid silica matrices incorporating either [...] Read more.
Silica-modified electrodes possess physicochemical properties that make them valuable in electrochemical sensing and energy-related applications. Although intrinsically insulating, silica thin films can selectively interact with redox species, producing sieving effects that enhance electrochemical responses. We synthesized Class I hybrid silica matrices incorporating either negatively charged poly(4-styrene sulfonic acid) or positively charged poly(diallyl dimethylammonium chloride). These hybrid films were deposited onto ITO electrodes and evaluated via cyclic voltammetry in aqueous ferrocenium solutions. The polyelectrolyte charge played a key role in the electroassisted incorporation of ferrocene: silica-PSS films promoted accumulation, while silica-PDADMAC films hindered it due to electrostatic repulsion. In situ UV-vis spectroscopy confirmed that only a fraction of the embedded ferrocene was electroactive. Nevertheless, this fraction enabled effective mediated detection of cytochrome c in solution. These findings highlight the crucial role of ionic interactions and hybrid composition in electron transfer to redox proteins, providing valuable insights for the development of advanced bioelectronic sensors. Full article
(This article belongs to the Section Electrochemistry)
Show Figures

Figure 1

37 pages, 5131 KiB  
Review
Coating Metal–Organic Frameworks (MOFs) and Associated Composites on Electrodes, Thin Film Polymeric Materials, and Glass Surfaces
by Md Zahidul Hasan, Tyeaba Tasnim Dipti, Liu Liu, Caixia Wan, Li Feng and Zhongyu Yang
Nanomaterials 2025, 15(15), 1187; https://doi.org/10.3390/nano15151187 - 2 Aug 2025
Viewed by 359
Abstract
Metal–Organic Frameworks (MOFs) have emerged as advanced porous crystalline materials due to their highly ordered structures, ultra-high surface areas, fine-tunable pore sizes, and massive chemical diversity. These features, arising from the coordination between an almost unlimited number of metal ions/clusters and organic linkers, [...] Read more.
Metal–Organic Frameworks (MOFs) have emerged as advanced porous crystalline materials due to their highly ordered structures, ultra-high surface areas, fine-tunable pore sizes, and massive chemical diversity. These features, arising from the coordination between an almost unlimited number of metal ions/clusters and organic linkers, have resulted in significant interest in MOFs for applications in gas storage, catalysis, sensing, energy, and biomedicine. Beyond their stand-alone properties and applications, recent research has increasingly explored the integration of MOFs with other substrates, particularly electrodes, polymeric thin films, and glass surfaces, to create synergistic effects that enhance material performance and broaden application potential. Coating MOFs onto these substrates can yield significant benefits, including, but not limited to, improved sensitivity and selectivity in electrochemical sensors, enhanced mechanical and separation properties in membranes, and multifunctional coatings for optical and environmental applications. This review provides a comprehensive and up-to-date summary of recent advances (primarily from the past 3–5 years) in MOF coating techniques, including layer-by-layer assembly, in situ growth, and electrochemical deposition. This is followed by a discussion of the representative applications arising from MOF-substrate coating and an outline of key challenges and future directions in this rapidly evolving field. This article aims to serve as a focused reference point for researchers interested in both fundamental strategies and applied developments in MOF surface coatings. Full article
Show Figures

Figure 1

13 pages, 1717 KiB  
Article
High-Performance Hydrogen Gas Sensor Based on Pd-Doped MoS2/Si Heterojunction
by Enyu Ma, Zihao Xu, Ankai Sun, Shuo Yang and Jianyu Jiang
Sensors 2025, 25(15), 4753; https://doi.org/10.3390/s25154753 - 1 Aug 2025
Viewed by 222
Abstract
High-performance hydrogen gas sensors have gained considerable interest for their crucial function in reducing H2 explosion risk. Although MoS2 has good potential for chemical sensing, its application in hydrogen detection at room temperature is limited by slow response and incomplete recovery. [...] Read more.
High-performance hydrogen gas sensors have gained considerable interest for their crucial function in reducing H2 explosion risk. Although MoS2 has good potential for chemical sensing, its application in hydrogen detection at room temperature is limited by slow response and incomplete recovery. In this work, Pd-doped MoS2 thin films are deposited on a Si substrate, forming Pd-doped MoS2/Si heterojunctions via magnetron co-sputtering. The incorporation of Pd nanoparticles significantly enhances the catalytic activity for hydrogen adsorption and facilitates more efficient electron transfer. Owing to its distinct structural characteristics and sharp interface properties, the fabricated Pd-doped MoS2/Si heterojunction device exhibits excellent H2 sensing performance under room temperature conditions. The gas sensor device achieves an impressive sensing response of ~6.4 × 103% under 10,000 ppm H2 concentration, representing a 110% improvement compared to pristine MoS2. Furthermore, the fabricated heterojunction device demonstrates rapid response and recovery times (24.6/12.2 s), excellent repeatability, strong humidity resistance, and a ppb-level detection limit. These results demonstrate the promising application prospects of Pd-doped MoS2/Si heterojunctions in the development of advanced gas sensing devices. Full article
(This article belongs to the Special Issue 2D Materials for Advanced Sensing Technology)
Show Figures

Figure 1

15 pages, 2324 KiB  
Article
Influence of Aluminum Alloy Substrate Temperature on Microstructure and Corrosion Resistance of Cr/Ti Bilayer Coatings
by Yuqi Wang, Tao He, Xiangyang Du, Alexey Vereschaka, Catherine Sotova, Yang Ding, Kang Chen, Jian Li and Peiyu He
Coatings 2025, 15(8), 891; https://doi.org/10.3390/coatings15080891 - 1 Aug 2025
Viewed by 213
Abstract
Cr/Ti bilayer coatings were deposited on 7050 aluminum alloy via magnetron sputtering at substrate temperatures of room temperature (RT), 150 °C, and 300 °C to investigate temperature effects on microstructure, hardness, and corrosion resistance. All coatings exhibited Cr(110) and Ti(002) phases. Temperature significantly [...] Read more.
Cr/Ti bilayer coatings were deposited on 7050 aluminum alloy via magnetron sputtering at substrate temperatures of room temperature (RT), 150 °C, and 300 °C to investigate temperature effects on microstructure, hardness, and corrosion resistance. All coatings exhibited Cr(110) and Ti(002) phases. Temperature significantly modulated corrosion resistance by altering pore density, grain boundary density, and passivation film composition. Increasing temperature from RT to 150 °C raised corrosion rates primarily due to increased pore density. Further increasing to 300 °C reduced corrosion rates mainly through decreased grain boundary density, while passivation film composition changes altered electrochemical reaction kinetics. Substrate-coating interface defect density primarily influenced hardness with minimal effect on corrosion. Consequently, the RT-deposited coating, despite lower hardness, demonstrated optimal corrosion resistance: polarization resistance (7.17 × 104 Ω·cm2), charge transfer resistance (12,400 Ω·cm2), and corrosion current density (2.47 × 10−7 A/cm2), the latter being two orders of magnitude lower than the substrate. Full article
(This article belongs to the Special Issue Innovative Coatings for Corrosion Protection of Alloy Surfaces)
Show Figures

Figure 1

17 pages, 4098 KiB  
Article
The Influence of the Annealing Process on the Mechanical Properties of Chromium Nitride Thin Films
by Elena Chițanu, Iulian Iordache, Mirela Maria Codescu, Virgil Emanuel Marinescu, Gabriela Beatrice Sbârcea, Delia Pătroi, Leila Zevri and Alexandra Cristiana Nadolu
Materials 2025, 18(15), 3605; https://doi.org/10.3390/ma18153605 - 31 Jul 2025
Viewed by 204
Abstract
In recent years, significant attention has been directed toward the development of coating materials capable of tailoring surface properties for various functional applications. Transition metal nitrides, in particular, have garnered interest due to their superior physical and chemical properties, including high hardness, excellent [...] Read more.
In recent years, significant attention has been directed toward the development of coating materials capable of tailoring surface properties for various functional applications. Transition metal nitrides, in particular, have garnered interest due to their superior physical and chemical properties, including high hardness, excellent wear resistance, and strong corrosion resistance. In this study, a fabrication process for CrN-based thin films was developed by combining reactive direct current magnetron sputtering (dcMS) with post-deposition annealing in air. CrN coatings were deposited by reactive dcMS using different argon-nitrogen (Ar:N2) gas ratios (4:1, 3:1, 2:1, and 1:1), followed by annealing at 550 °C for 1.5 h in ambient air. XRD and EDS analysis revealed that this treatment results in the formation of a composite phase comprising CrN and Cr2O3. The resulting coating exhibited favorable mechanical and tribological properties, including a maximum hardness of 12 GPa, a low wear coefficient of 0.254 and a specific wear rate of 7.05 × 10−6 mm3/N·m, making it a strong candidate for advanced protective coating applications. Full article
Show Figures

Figure 1

Back to TopTop