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Magnetron Sputtering Coatings: From Materials to Applications
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Magnetron Sputtering Coatings: From Materials to Applications

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: 10 September 2025 | Viewed by 9576

Special Issue Editor

Dr. Fanping Meng

E-Mail Website
Guest Editor
Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
Interests: physical vapor deposition (PVD); coatings and thin films; alloy; microstrucutre modificaiton and characterizations; high-temperature oxidation

Special Issue Information

Dear Colleagues,

Magnetron sputtering is one of the most popular technologies for the deposition of coatings and thin films since it was first developed nearly two centuries ago. For decades, sputtering was used primarily in electronics for the fabrication of semiconductor devices. However, over time, sputtering has also found applications within a broad range of fields such as mechanical and protective, optoelectronics, optical coatings, sensors, energy, biomedical, etc.

Meanwhile, many new-concept materials such as high entropy alloys, metallic glass, MAX phases, etc., are being constantly discovered for sputtering deposition. Furthermore, they could prospectively exhibit different microstructures and improved properties compared to conventional materials.

The aim of this Special Issue is to highlight some of the most recent and significant contributions to the magnetron sputtering field, through a combination of original research papers and review articles from leading groups around the world. In particular, the topics of interest include but are not limited to the following:

  • Conventional sputtering technologies (RF/DC/p-DC/others);
  • Advanced technologies (unbalanced/HiPIMS/ion source/others);
  • Conventional materials (metals/nitrides/carbides/borides/oxides/others);
  • New-concept materials (high entropy alloys/metallic glass/MAX phases/others);
  • Microstructure modifications and characterizations (nanostructure/multilayer/others);
  • Mechanical properties (friction/wear/lubrication/erosion/others);
  • Protection in harsh environments (oxidation/corrosion/antibacterial/others);
  • Functional properties (optical/TCOs/ferroelectric/solar cells/others).

Dr. Fanping Meng
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • magnetron sputtering
  • thin films and coatings
  • structure and microstructure
  • mechanical properties
  • protection properties
  • functional properties

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Published Papers (4 papers)

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Research

Jump to: Review

14 pages, 22051 KiB  
Article
Microstructure and Oxidation Behaviors of (TiVCr)2AlC MAX-Phase Coatings Prepared by Magnetron Sputtering
by Yufeng Zhu, Yueqing Zheng, Ke Chen, Qing Huang and Fanping Meng
Coatings 2024, 14(12), 1504; https://doi.org/10.3390/coatings14121504 - 29 Nov 2024
Viewed by 985
Abstract
A solid solution is an effective approach to regulate the microstructure and hence the various properties such as hardness and oxidation behavior of materials. In this study, an M-site solid-solution medium-entropy-alloy MAX-phase coating (TiVCr)2AlC was prepared through combining the magnetron sputter [...] Read more.
A solid solution is an effective approach to regulate the microstructure and hence the various properties such as hardness and oxidation behavior of materials. In this study, an M-site solid-solution medium-entropy-alloy MAX-phase coating (TiVCr)2AlC was prepared through combining the magnetron sputter deposition at low- and high-temperature vacuum annealing. The mechanical properties and high-temperature oxidation resistance in the 700–1000 °C temperature range in air of these coatings were then evaluated. The results showed that the 211-MAX-phase can be formed in the 700 °C vacuum for 3 h, and the crystallinity depended on the annealing temperature. Compared to the amorphous coating, the MAX-phase sample demonstrated superior oxidation resistance in terms of the onset temperature of the oxidation and the oxidation products. During high-temperature oxidation, a mixed oxide layer containing V2O5, TiO2, and Cr2O3 was formed at 700 °C on the surface of an amorphous coating, whereas only a thin continuous Al2O3 scale was observed at ≤800 °C for the crystalline (TiVCr)2AlC coating. Additionally, the maximum hardness of the coating reached 18 GPa after annealing. These results demonstrate the application potential of the medium-entropy-alloy MAX-phase coating in extreme environments such as aerospace, nuclear energy, and other fields. Full article
(This article belongs to the Special Issue Magnetron Sputtering Coatings: From Materials to Applications)
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28 pages, 14091 KiB  
Article
Evaluation of Magnetron Sputtered TiAlSiN-Based Thin Films as Protective Coatings for Tool Steel Surfaces
by Magdalena Valentina Lungu, Dorinel Tălpeanu, Romeo Cristian Ciobanu, Anca Cojocaru, Delia Pătroi, Virgil Marinescu and Alina Ruxandra Caramitu
Coatings 2024, 14(9), 1184; https://doi.org/10.3390/coatings14091184 - 12 Sep 2024
Cited by 3 | Viewed by 1584
Abstract
Steel surface protection with hard coatings is essential in metalworking, yet developing high-performance coatings is challenging. TiAlSiN coatings grown on various substrates using commercial targets have been extensively studied, but consistent data on their properties are lacking. This study focused on TiAlSiN single [...] Read more.
Steel surface protection with hard coatings is essential in metalworking, yet developing high-performance coatings is challenging. TiAlSiN coatings grown on various substrates using commercial targets have been extensively studied, but consistent data on their properties are lacking. This study focused on TiAlSiN single layers (SL) and TiAlSiN/TiN bilayers (BL), with an 800 nm thick TiAlSiN top layer and a 100 nm thick TiN mid layer. These coatings were grown on C120 tool steel discs via reactive DC magnetron sputtering using TiAlSi 75–20–5 at.% and Ti targets fabricated in-house through spark plasma sintering. The stability of coatings was assessed after thermal treatment (TT) in air at 800 °C for 1 h. SEM analysis revealed a columnar microstructure with pyramidal grains in the SL and BL coatings, and coarser pyramidal and prismatic grains in both TT coatings. EDS analysis showed a decrease in Ti, Al, Si, and N content after annealing, while O content increased due to oxide formation. High indentation hardness (9.19 ± 0.09 GPa) and low effective elastic modulus (148 ± 6 GPa) were displayed by the BL TT coating, indicating good resistance to plastic deformation and better load distribution. The highest fracture toughness was noted in the BL TT coating (0.0354 GPa), which was 16.4 times greater than the steel substrate. Better scratch resistance and low coefficient of friction (COF ≤ 0.35) were exhibited by both TT coatings. Tribological tests showed a mean COF of 0.616–0.773, comparable to the steel substrate (0.670). The lowest corrosion current density (0.1298 µA/cm²), highest polarization resistance (46.34 kΩ cm²), and a reduced corrosion rate (1.51 µm/year) in a 3.5 wt.% NaCl solution was also exhibited by the BL TT coating. These findings indicate TiAlSiN/TiN films as effective protective coatings for tool steel surfaces. Full article
(This article belongs to the Special Issue Magnetron Sputtering Coatings: From Materials to Applications)
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10 pages, 9460 KiB  
Article
Influence of Oxygen Flow Rate on the Phase Structures and Properties for Copper Oxide Thin Films Deposited by RF Magnetron Sputtering
by Junghwan Park, Young-Guk Son, Chang-Sik Son and Donghyun Hwang
Coatings 2024, 14(8), 930; https://doi.org/10.3390/coatings14080930 - 25 Jul 2024
Cited by 1 | Viewed by 1839
Abstract
This study examines the impact of varying oxygen flow rates on the properties of Cu2O thin films deposited via radio frequency (RF) magnetron sputtering. X-ray diffraction (XRD) analysis showed a phase transition from cubic Cu2O to a mixed Cu [...] Read more.
This study examines the impact of varying oxygen flow rates on the properties of Cu2O thin films deposited via radio frequency (RF) magnetron sputtering. X-ray diffraction (XRD) analysis showed a phase transition from cubic Cu2O to a mixed Cu2O and CuO phase, eventually forming a Cu4O3 tetragonal structure as oxygen content increased. The surface morphology and cross-sectional structure of Cu2O thin films observed through field emission scanning electron microscopy (FE-SEM) were found to vary significantly depending on the oxygen flow rate. X-ray photoelectron spectroscopy (XPS) indicated notable variations in the chemical states of copper and oxygen. The Cu 2p spectra revealed peaks around 933 eV and 953 eV for all samples, with the S01 sample (deposited with only argon gas) exhibiting the lowest intensity. The S02 sample showed the highest peak intensity, which then gradually decreased from S03 to S06. The O 1s spectra followed a trend with peak intensity being highest in S02 and decreasing with further oxygen flow rates, indicating the formation of complex oxides such as Cu4O3. UV-Vis-NIR spectroscopy results demonstrated a decrease in transmittance and optical band gap energy with increasing oxygen content, suggesting a decline in crystallinity and an increase in defects and impurities. These findings underscore the critical role of precise oxygen flow rate control in tailoring the structural, morphological, compositional, and optical properties of Cu2O thin films for specific electronic and optical applications. Full article
(This article belongs to the Special Issue Magnetron Sputtering Coatings: From Materials to Applications)
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Review

Jump to: Research

25 pages, 5931 KiB  
Review
A Review of CIGS Thin Film Semiconductor Deposition via Sputtering and Thermal Evaporation for Solar Cell Applications
by Karima Machkih, Rachid Oubaki and Mohammed Makha
Coatings 2024, 14(9), 1088; https://doi.org/10.3390/coatings14091088 - 24 Aug 2024
Cited by 6 | Viewed by 4343
Abstract
Over the last two decades, thin film solar cell technology has made notable progress, presenting a competitive alternative to silicon-based solar counterparts. CIGS (CuIn1−xGaxSe2) solar cells, leveraging the tunable optoelectronic properties of the CIGS absorber layer, currently [...] Read more.
Over the last two decades, thin film solar cell technology has made notable progress, presenting a competitive alternative to silicon-based solar counterparts. CIGS (CuIn1−xGaxSe2) solar cells, leveraging the tunable optoelectronic properties of the CIGS absorber layer, currently stand out with the highest power conversion efficiency among second-generation solar cells. Various deposition techniques, such as co-evaporation using Cu, In, Ga, and Se elemental sources, the sequential selenization/Sulfurization of sputtered metallic precursors (Cu, In, and Ga), or non-vacuum methods involving the application of specialized inks onto a substrate followed by annealing, can be employed to form CIGS films as light absorbers. While co-evaporation demonstrates exceptional qualities in CIGS thin film production, challenges persist in controlling composition and scaling up the technology. On the other hand, magnetron sputtering techniques show promise in addressing these issues, with ongoing research emphasizing the adoption of simplified and safe manufacturing processes while maintaining high-quality CIGS film production. This review delves into the evolution of CIGS thin films for solar applications, specifically examining their development through physical vapor deposition methods including thermal evaporation and magnetron sputtering. The first section elucidates the structure and characteristics of CIGS-based solar cells, followed by an exploration of the challenges associated with employing solution-based deposition techniques for CIGS fabrication. The second part of this review focuses on the intricacies of controlling the properties of CIGS-absorbing materials deposited via various processes and the subsequent impact on energy conversion performance. This analysis extends to a detailed examination of the deposition processes involved in co-evaporation and magnetron sputtering, encompassing one-stage, two-stage, three-stage, one-step, and two-step methodologies. At the end, this review discusses the prospective next-generation strategies aimed at improving the performance of CIGS-based solar cells. This paper provides an overview of the present research state of CIGS solar cells, with an emphasis on deposition techniques, allowing for a better understanding of the relationship between CIGS thin film properties and solar cell efficiency. Thus, a roadmap for selecting the most appropriate deposition technique is created. By analyzing existing research, this review can assist researchers in this field in identifying gaps, which can then be used as inspiration for future research. Full article
(This article belongs to the Special Issue Magnetron Sputtering Coatings: From Materials to Applications)
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