- Communication
The Inverse Optimization of Lithographic Source and Mask via GA-APSO Hybrid Algorithm
- Junbo Liu,
- Ji Zhou,
- Haifeng Sun,
- Chuan Jin,
- Jian Wang and
- Song Hu
Source mask optimization (SMO) is an effective method for improving the image quality of high-node lithography. Reasonable algorithm optimization is the critical issue in SMO. A GA-APSO hybrid algorithm, combining genetic algorithm (GA) and adaptive...