Special Issue "Advances in Plasma Diagnostics and Applications"

A special issue of Processes (ISSN 2227-9717). This special issue belongs to the section "Advanced Digital and Other Processes".

Deadline for manuscript submissions: 31 December 2020.

Special Issue Editors

Dr. Zhitong Chen
Guest Editor
Mechanical and Aerospace Engineering Department, University of California, Los Angeles, CA 90095, USA
Interests: Plasma physics, Plasma-materials interaction, Plasma medicine, Medical devices, Plasma diagnostics
Special Issues and Collections in MDPI journals
Prof. Dr. Pankaj Attri
Co-Guest Editor
Kyushu University, Japan
Interests: Atmospheric pressure plasma, Plasma medicine, Plasma agriculture, Ionic liquid, and Protein folding
Special Issues and Collections in MDPI journals
Prof. Dr. Qiu Wang
Co-Guest Editor
Institute of Mechanics, Chinese Academy of Sciences, China
Interests: Plasma Physics, Plasma propulsion, Magnetohydrodynamic, Electron density measurement, Nonequilibrium flow

Special Issue Information

Dear Colleagues,

Plasma is the fourth state of matter, contrasted with the other states: solid, liquid, and gas. Plasma can exist in a variety of forms due to discharge modes created in different ways, resulting in a wide range of applications. Plasma applications are interdisciplinary research fields that combine physics, chemistry, biology, and medicine. Plasma in contact with materials generates intense UV radiation, reactive species, electrons and charged particles, all of which are effective agents against many matters, and their processes are extremely complex. On the other hand, the plasma parameter space is very broad and ranges from the density of radicals to the velocity distribution of charged particles and even rovibrationally excited states or the population of excited electronic. The aim of this Special Issue is to collect original research and review articles on the most recent plasma applications and to diagnose their processes, to elucidate the characteristics of plasma and mechanisms of plasma-induced processes. Potential topics include, but are not limited to:

  1. Experimental measurement methods and diagnostic tools for detection of radicals in gas and liquid phase
  2. Modification in materials
  3. Materials processing (deposition, etching, washing, etc.)
  4. Industrial applications including water purification
  5. Biomedical/Agricultural/Food processing applications

Prof. Dr. Pankaj Attri
Dr. Zhitong Chen
Prof. Dr. Qiu Wang
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Processes is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1500 CHF (Swiss Francs). Please note that for papers submitted after 31 December 2020 an APC of 2000 CHF applies. Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.


  • Plasma physics
  • Plasma diagnostics
  • Surface modification
  • Plasma-assisted synthesis
  • Plasma environment
  • Plasma medicine
  • Plasma agriculture

Published Papers (1 paper)

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Open AccessArticle
Characteristics of Gliding Arc Plasma and Its Application in Swirl Flame Static Instability Control
Processes 2020, 8(6), 684; https://doi.org/10.3390/pr8060684 - 11 Jun 2020
Based on an experimental system involving a pulsating airflow burner and gliding arc generator, the characteristics of gliding arc plasma at different flow rates and its control effect on the static instability of the swirl flame have been studied. The current, voltage, and [...] Read more.
Based on an experimental system involving a pulsating airflow burner and gliding arc generator, the characteristics of gliding arc plasma at different flow rates and its control effect on the static instability of the swirl flame have been studied. The current, voltage, and power wave forms, as well as the simultaneous evolution of plasma topology, were measured to reveal the discharge characteristics of the gliding arc. A bandpass filter was used to capture the chemiluminescence of CH in the flame, and pressure at the burner outlet was acquired to investigate the static instability. Experimental results showed that there were two different discharge types in gliding arc plasma. With the low flow rate, the glow type discharge was sustained and the current was nearly a sine wave with hundreds of milliamperes of amplitude. With the high flow rate, the spark type discharge appeared and spikes which approached almost 1 ampere in 1 μs were found in the current waveform. The lean blowout limits increased when the flame mode changed from stable to pulsating, and decreased significantly after applying the gliding arc plasma. In pulsating flow mode, the measured pressure indicated that static instability was generated at the frequency of 10 Hz, and the images of flame with plasma showed that the plasma may have acted as the ignition source which injected the heat into the flame. Full article
(This article belongs to the Special Issue Advances in Plasma Diagnostics and Applications)
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