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Article

Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method

1
Department of Electronics, Kyushu University, Fukuoka 819-0395, Japan
2
Center for Novel Science Initiatives, National Institutes of Natural Science, Tokyo 105-0001, Japan
3
Center of Plasma Nano-Interface Engineering, Kyushu University, Fukuoka 819-0395, Japan
4
Graduate School of Engineering, Osaka City University, Osaka 558-8585, Japan
5
National Institute of Technology, Ariake College, Fukuoka 836-8585, Japan
6
Institute of Frontier Science and Technology, Okayama University of Science, Okayama 700-0005, Japan
*
Author to whom correspondence should be addressed.
Processes 2021, 9(1), 2; https://doi.org/10.3390/pr9010002
Received: 13 November 2020 / Revised: 14 December 2020 / Accepted: 16 December 2020 / Published: 22 December 2020
(This article belongs to the Special Issue Advances in Plasma Diagnostics and Applications)
As the application of nanotechnology increases continuously, the need for controlled size nanoparticles also increases. Therefore, in this work, we discussed the growth mechanism of carbon nanoparticles generated in Ar+CH4 multi-hollow discharge plasmas. Using the plasmas, we succeeded in continuous generation of hydrogenated amorphous carbon nanoparticles with controlled size (25–220 nm) by the gas flow. Among the nanoparticle growth processes in plasmas, we confirmed the deposition of carbon-related radicals was the dominant process for the method. The size of nanoparticles was proportional to the gas residence time in holes of the discharge electrode. The radical deposition developed the nucleated nanoparticles during their transport in discharges, and the time of flight in discharges controlled the size of nanoparticles. View Full-Text
Keywords: plasma chemical vapor deposition; carbon nanoparticle; coagulation; optical emission spectroscopy plasma chemical vapor deposition; carbon nanoparticle; coagulation; optical emission spectroscopy
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MDPI and ACS Style

Hwang, S.H.; Koga, K.; Hao, Y.; Attri, P.; Okumura, T.; Kamataki, K.; Itagaki, N.; Shiratani, M.; Oh, J.-S.; Takabayashi, S.; Nakatani, T. Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method. Processes 2021, 9, 2. https://doi.org/10.3390/pr9010002

AMA Style

Hwang SH, Koga K, Hao Y, Attri P, Okumura T, Kamataki K, Itagaki N, Shiratani M, Oh J-S, Takabayashi S, Nakatani T. Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method. Processes. 2021; 9(1):2. https://doi.org/10.3390/pr9010002

Chicago/Turabian Style

Hwang, Sung Hwa, Kazunori Koga, Yuan Hao, Pankaj Attri, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani, Jun-Seok Oh, Susumu Takabayashi, and Tatsuyuki Nakatani. 2021. "Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method" Processes 9, no. 1: 2. https://doi.org/10.3390/pr9010002

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