Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method
Hwang, S.H.; Koga, K.; Hao, Y.; Attri, P.; Okumura, T.; Kamataki, K.; Itagaki, N.; Shiratani, M.; Oh, J.-S.; Takabayashi, S.; Nakatani, T. Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method. Processes 2021, 9, 2. https://doi.org/10.3390/pr9010002
Hwang SH, Koga K, Hao Y, Attri P, Okumura T, Kamataki K, Itagaki N, Shiratani M, Oh J-S, Takabayashi S, Nakatani T. Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method. Processes. 2021; 9(1):2. https://doi.org/10.3390/pr9010002
Chicago/Turabian StyleHwang, Sung Hwa, Kazunori Koga, Yuan Hao, Pankaj Attri, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani, Jun-Seok Oh, Susumu Takabayashi, and Tatsuyuki Nakatani. 2021. "Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method" Processes 9, no. 1: 2. https://doi.org/10.3390/pr9010002