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Micromachines
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Advanced Nanoscale Manufacturing
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Advanced Nanoscale Manufacturing

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D：Materials and Processing".

Deadline for manuscript submissions: closed (30 November 2020) | Viewed by 10761

Special Issue Editor

Prof. Dr. Songkil Kim

E-Mail Website
Guest Editor
School of Mechanical Engineering, Pusan National University, Busan 46241, Republic of Korea
Interests: focused electron/ion beam processing; low-dimensional nanomaterials; multimodal imaging and characterization; nanofabrication, neuromorphic computing devices; functional nanodevices; superlubricity (solid lubrication); nanocomposites
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

An emerging paradigm in engineering is the design of materials to act as simple building blocks in order to achieve complex functionality at multiple scales. The discovery of new nanomaterials such as low-dimensional nanomaterials, new metal alloys and functional polymers, has been leading these developments, and more materials and engineering design options have been given to scientific and engineering societies, with demands to advance the current existing technologies as well as to develop new functional applications. However, challenges persist in integration of nanomaterials to device architectures, control of material properties, and realization of functional devices, for practical applications. To tackle these challenges, it is crucial to develop multidisciplinary, integrated approaches, to enable precise manipulation of these materials compatible with integrating them into existing engineering systems as well as for the development of new concepts of device architectures.

In this perspective, this Special Issue of Micromachines aims to showcase research papers, short communications and review articles that focus on advanced nanoscale manufacturing techniques which enables high-degree of controls in nanomaterial manipulation, additive/subtractive fabrication of functional nanostructures, and fabrication of novel functional nanodevices based on low-dimensional nanomaterials.

We look forward to receiving your submission of outstanding research outcomes.

Dr. Songkil Kim
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Low-dimensional nanomaterials
  • Nanomaterial manipulation
  • Functional nanostructures
  • Advanced nanoscale manufacturing
  • Low-dimensional nanomaterials-based functional devices

Published Papers (4 papers)

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Research

16 pages, 6157 KiB  
Article
Development of Proportional–Integrative–Derivative (PID) Optimized for the MicroElectric Discharge Machine Fabrication of Nano-Bismuth Colloid
by Kuo-Hsiung Tseng, Chaur-Yang Chang, Yagus Cahyadi, Meng-Yun Chung and Chin-Liang Hsieh
Micromachines 2020, 11(12), 1065; https://doi.org/10.3390/mi11121065 - 30 Nov 2020
Cited by 5 | Viewed by 1731
Abstract
Metal nanoparticles are typically prepared by using a chemical method, and a suspension is added to control the particle size and concentration of the nanoparticles. In this study, a micro-electric discharge machine (micro-EDM) was used to melt bismuth into nanoparticles, thus yielding a [...] Read more.
Metal nanoparticles are typically prepared by using a chemical method, and a suspension is added to control the particle size and concentration of the nanoparticles. In this study, a micro-electric discharge machine (micro-EDM) was used to melt bismuth into nanoparticles, thus yielding a colloidal solution. No chemicals were added during the manufacturing process, and pure water was used as the medium. The colloid was assessed using an electrohydraulic system, and process parameters were adjusted for optimization; additionally, the discharge pulse wave was analyzed. The proposed preparation process is simple, fast, and cost-effective; moreover, the manufacturing process allows for mass production and reduces environmental pollution. Experimental results revealed that the nano-bismuth (nano-bi) colloidal solution was successfully prepared by the micro-EDM, and absorption peaks in the UV-vis spectrum were observed at 234 and 237 nm. Moreover, to optimize the proportional–integral–derivative (PID) control parameters to be used in the micro-EDM to prepare the nano-bi colloidal solution, this study derived a mathematical model of the micro-EDM. MATLAB was used to obtain the PID parameters. The discharge success rate (74.1876%) for the nano-bi colloidal solution prepared using our method was higher than that (46.9196%) obtained for a nano-bi colloidal solution prepared using an online adaptation method. Full article
(This article belongs to the Special Issue Advanced Nanoscale Manufacturing)
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16 pages, 8401 KiB  
Article
Effects of Anisotropy on Single Crystal Silicon in Polishing Non-Continuous Surface
by Guilian Wang, Zhijian Feng, Yahui Hu, Jie Liu and Qingchun Zheng
Micromachines 2020, 11(8), 742; https://doi.org/10.3390/mi11080742 - 30 Jul 2020
Cited by 4 | Viewed by 2438
Abstract
A molecular dynamics model of the diamond abrasive polishing the single crystal silicon is established. Crystal surfaces of the single crystal silicon in the Y-direction are (010), (011), and (111) surfaces, respectively. The effects of crystallographic orientations on polishing the non-continuous single crystal [...] Read more.
A molecular dynamics model of the diamond abrasive polishing the single crystal silicon is established. Crystal surfaces of the single crystal silicon in the Y-direction are (010), (011), and (111) surfaces, respectively. The effects of crystallographic orientations on polishing the non-continuous single crystal silicon surfaces are discussed from the aspects of surface morphology, displacement, polishing force, and phase transformation. The simulation results show that the Si(010) surface accumulates chips more easily than Si(011) and Si(111) surfaces. Si(010) and Si(011) workpieces are deformed in the entire pore walls on the entry areas of pores, while the Si(111) workpiece is a local large deformation on entry areas of the pores. Comparing the recovery value of the displacement in different workpieces, it can be seen that the elastic deformation of the A side in the Si(011) workpiece is larger than that of the A side in other workpieces. Pores cause the tangential force and normal force to fluctuate. The fluctuation range of the tangential force is small, and the fluctuation range of the normal force is large. Crystallographic orientations mainly affect the position where the tangential force reaches the maximum and minimum values and the magnitude of the decrease in the tangential force near the pores. The position of the normal force reaching the maximum and minimum values near the pores is basically the same, and different crystallographic orientations have no obvious effect on the drop of the normal force, except for a slight fluctuation in the value. The high-pressure phase transformation is the main way to change the crystal structure. The Si(111) surface is the cleavage surface of single crystal silicon, and the total number of main phase transformation atoms on the Si(111) surface is the largest among the three types of workpieces. In addition, the phase transformation in Si(010) and Si(011) workpieces extends to the bottom of pores, and the Si(111) workpiece does not extend to the bottom of pores. Full article
(This article belongs to the Special Issue Advanced Nanoscale Manufacturing)
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12 pages, 5075 KiB  
Article
Fabrication and Performance Evaluation of Highly Sensitive Flexible Strain Sensors with Aligned Silver Nanowires
by Jae Hyuk Choi, Myung Gyu Shin, Young Jung, Dong Hwan Kim and Jong Soo Ko
Micromachines 2020, 11(2), 156; https://doi.org/10.3390/mi11020156 - 30 Jan 2020
Cited by 22 | Viewed by 3598
Abstract
In this study, we fabricated strain sensors by aligning silver nanowires and transferring them with polydimethylsiloxane (PDMS) and compared the performances of the fabricated strain sensors along the alignment direction. Two types of flexible strain sensors embedded with the aligned silver nanowires were [...] Read more.
In this study, we fabricated strain sensors by aligning silver nanowires and transferring them with polydimethylsiloxane (PDMS) and compared the performances of the fabricated strain sensors along the alignment direction. Two types of flexible strain sensors embedded with the aligned silver nanowires were fabricated: one in the longitudinal direction, which is the same as the alignment direction, and the other in the lateral direction, which is perpendicular to the alignment direction. We then evaluated their properties. The proposed longitudinally aligned strain sensor showed the maximum sensitivity (gauge factor (GF) = 89.99) under 25% tensile conditions, which is 7.08 times higher than the sensitivity (GF = 12.71) shown by the laterally aligned strain sensor under 25% tensile conditions. This finding confirmed that the alignment direction of silver nanowires influences the sensitivity of flexible strain sensors. Furthermore, this study demonstrates that the laterally aligned strain sensor (ε > 60%) can be used in wearable devices because it satisfies the required strain range (ε > 50%). Since the strain sensors were fabricated using the temperature-controlled dip coating process, they can be produced at low cost in large quantities, and thus they have advantages for commercialization. These characteristics will be applicable to various flexible devices as well as to flexible strain sensors. Full article
(This article belongs to the Special Issue Advanced Nanoscale Manufacturing)
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10 pages, 3521 KiB  
Article
Fabrication of Cross-Sinusoidal Anti-Reflection Nanostructure on a Glass Substrate Using Imperfect Glass Imprinting with a Nano-Pin Array Vitreous Carbon Stamp
by Muhammad Refatul Haq, Jun Kim, Jeong-woo Yeom, Saem Ryu, Md. Ali Asgar, Young Kyu Kim and Seok-min Kim
Micromachines 2020, 11(2), 136; https://doi.org/10.3390/mi11020136 - 25 Jan 2020
Cited by 10 | Viewed by 2693
Abstract
Although polymer nanoimprinting on glass substrates has been widely employed for the fabrication of functional anti-reflective (AR) nanostructures, several drawbacks exist with respect to durability and delamination. The direct patterning of glass material is a potential solution for outdoor applications that require AR [...] Read more.
Although polymer nanoimprinting on glass substrates has been widely employed for the fabrication of functional anti-reflective (AR) nanostructures, several drawbacks exist with respect to durability and delamination. The direct patterning of glass material is a potential solution for outdoor applications that require AR functional nanostructured glass plates. In this study, a glass imprinting technique was employed for the fabrication of an AR nanostructure on a soda-lime glass substrate using a vitreous carbon (VC) stamp. The VC stamp, which had a high aspect ratio nanopost array with a pitch of 325 nm, diameter of 110 nm, and height of ~220 nm, was fabricated by the carbonization of a replicated Furan precursor from an Si master. During the glass imprinting process using the nanopost array VC stamp, the softened glass material gradually protruded into the spaces between the nanopins owing to viscoelastic behavior, and one can achieve a cross-sinusoidal surface relief under specific imprinting condition, which can be used as an AR nanostructure with a gradually increasing refractive index. The effects of the processing temperature on the surface profile of the glass imprinted parts and the measured transmission spectra were analyzed, and a glass imprinting temperature of 700 °C and pressure of 1 MPa were found to be the optimum condition. The height of the fabricated cross-sinusoidal nanostructure was 80 nm, and the light transmission was increased by ~2% over the entire visible-light range. Furthermore, the measured transmission spectrum observed to be in good agreement with the simulation results. Full article
(This article belongs to the Special Issue Advanced Nanoscale Manufacturing)
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