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Micromachines
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Advanced Thin-Films: Design, Fabrication and Applications, Third Edition
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Advanced Thin-Films: Design, Fabrication and Applications, Third Edition

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D：Materials and Processing".

Deadline for manuscript submissions: 20 October 2026 | Viewed by 4484

Special Issue Editors

Dr. Sagar Mane

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Guest Editor
Department of Fiber System Engineering, Yeungnam University, 280 Dehak-Ro, Gyeongsan 38541, Republic of Korea
Interests: thin films; energy conversion and storage; HER and OER; sensing materials; multiferroic composites; thin films and nanotechnology
Special Issues, Collections and Topics in MDPI journals
Prof. Dr. Jae Cheol Shin

E-Mail Website
Guest Editor
Division of Electronics and Electrical Engineering, Dongguk University-Seoul, Seoul 04620, Republic of Korea
Interests: semiconductor; optoelectronics; thin films and nanotechnology
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

The field of thin films and nanotechnology has emerged as a cornerstone in modern materials science, with growing global interest driven by its vast potential for innovation across multiple disciplines. As a critical enabler of miniaturization and performance enhancement, thin-film technology plays a pivotal role in advancing microsystems, nano/microelectromechanical systems (N/MEMSs), and next-generation devices. This Special Issue on "Advanced Thin-Films: Design, Fabrication and Applications, Third Edition" seeks to present the latest research breakthroughs, fabrication techniques, and emerging applications related to advanced thin-film materials and nanotechnologies. Our goal is to provide a comprehensive platform for researchers to disseminate innovative findings and foster interdisciplinary collaboration within this dynamic research community. We welcome high-quality submissions focusing on, but not limited to, the following areas:

  • Development of functional thin films for N/MEMS, sensor systems, semiconductor devices, and optoelectronics.
  • Integration of thin films in energy-related applications such as fuel cells, lithium-ion and solid-state batteries, supercapacitors, water electrolysis and hydrogen generation systems, and energy harvesters.
  • Use of micro/nano fabrication techniques and thin-film deposition methods, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), molecular beam epitaxy (MBE), spin coating, chemical bath deposition (CBD), electrodeposition, electrophoretic deposition, surface micromachining and modification strategies, and additive manufacturing approaches adapted to nanostructured thin films.
  • Electronic thin films and integrated devices, including the design, simulation, and modeling of electronic thin-film structures, Fabrication of integrated systems using advanced lithographic and patterning technologies, and their applications in flexible electronics, wearable devices, and biocompatible systems.

Dr. Sagar Mane
Prof. Dr. Jae Cheol Shin
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2100 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • thin films
  • nanoscience and nanotechnology
  • electrochemical devices
  • sensors
  • micro/nanostructures
  • semiconductors
  • energy harvesting and storage
  • ferroelectric/piezoelectric nanogenerators

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Related Special Issues

Published Papers (5 papers)

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Research

11 pages, 1827 KB  
Article
Patterned Metal Flexible Films as a Strain Sensor with Good Durability and Anti-Corrosion Property
by Xu Zheng, Qing Wang, Wenming Cao, Wenchao Li, Rui Zhang, Ping Xiang and Yijia Liu
Micromachines 2026, 17(4), 464; https://doi.org/10.3390/mi17040464 - 11 Apr 2026
Viewed by 382
Abstract
To prevent corrosion in humid environments and electrical failure under loads, we developed a highly durable corrosion-resistant flexible strain sensor with a patterned sandwich structure. The effects of film dimensions and ambient temperature on the sensor’s electrical conductivity were investigated separately. The patterned [...] Read more.
To prevent corrosion in humid environments and electrical failure under loads, we developed a highly durable corrosion-resistant flexible strain sensor with a patterned sandwich structure. The effects of film dimensions and ambient temperature on the sensor’s electrical conductivity were investigated separately. The patterned flexible strain sensor demonstrated exceptional durability, maintaining stability after multiple tensile cycles and large deformations. The PDMS coating effectively protected the conductive layer from external environmental factors. Experimental results revealed that the sensor could efficiently block the corrosive effects of humid environments. Furthermore, when applied to real-time micro-strain detection in steel plate tensile tests, the relationship between ΔR/R0 and strain exhibited high linearity and sensitivity. The conductive film shows excellent durability and corrosion resistance, demonstrating significant application potential as a flexible strain sensor in humid conditions. Full article
(This article belongs to the Special Issue Advanced Thin-Films: Design, Fabrication and Applications, Third Edition)
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18 pages, 1714 KB  
Article
A Novel Transformer Architecture for Scalable Perovskite Thin-Film Detection
by Mengke Li, Hongling Li, Yuyu Shi and Yanfang Meng
Micromachines 2026, 17(3), 314; https://doi.org/10.3390/mi17030314 - 28 Feb 2026
Viewed by 544
Abstract
The further development of scalable fabrication for perovskite solar cells has been considerably constrained by strong process variability and the lack of a reliable real-time predictive mechanism during the thin-film formation process. Existing machine learning-based methods are incapable of capturing the inherent multi-stage [...] Read more.
The further development of scalable fabrication for perovskite solar cells has been considerably constrained by strong process variability and the lack of a reliable real-time predictive mechanism during the thin-film formation process. Existing machine learning-based methods are incapable of capturing the inherent multi-stage kinetic characteristics and uncertainties of the perovskite crystallization process, as they rely on deterministic point prediction models and flatten time-series signals into static features, which necessitates more advanced modeling strategies. To address these challenges, an in situ process monitoring and predictive modeling framework based on a lightweight probabilistic Transformer is proposed for the scalable preparation of perovskite thin films. The strategically designed inputs, consisting of time-resolved photoluminescence (PL) and diffuse reflectance imaging signals acquired during the vacuum quenching process, enable the model to directly learn the conditional probability distribution of the final device performance metrics. Rather than producing a single predicted value, this method enables the explicit quantification of prediction uncertainty, providing statistical support for uncertainty-aware process assessment. Leveraging its advantages over feed-forward neural networks and traditional tree-based machine learning methods, the proposed Transformer architecture effectively captures the staged and non-stationary kinetic features of thin-film formation. Consequently, it exhibits higher robustness and superior uncertainty calibration capability during the early-stage prediction phase. The results demonstrate that the probabilistic Transformer-based modeling paradigm provides a viable pathway toward uncertainty-aware, data-driven process evaluation in perovskite manufacturing. This framework extends its application beyond perovskite photovoltaic device fabrication, providing a generalizable modeling strategy for real-time predictive assessment in the preparation of other complex materials governed by irreversible stochastic dynamics. Full article
(This article belongs to the Special Issue Advanced Thin-Films: Design, Fabrication and Applications, Third Edition)
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9 pages, 2766 KB  
Article
Simple Process for Flexible Light-Extracting QD Film and White OLED
by Eun Jeong Bae, Tae Jeong Hwang, Geun Su Choi, Yong-Min Lee, Byeong-Kwon Ju, Young Wook Park and Dong-Hyun Baek
Micromachines 2025, 16(12), 1367; https://doi.org/10.3390/mi16121367 - 30 Nov 2025
Viewed by 795
Abstract
Quantum dots (QDs) have tremendous potential for next-generation displays due to their high color purity, photoluminescence efficiency, and power efficiency. In this work, we present a simple and cost-effective method for fabricating flexible single- and multiple-layer films, and they can be detached and [...] Read more.
Quantum dots (QDs) have tremendous potential for next-generation displays due to their high color purity, photoluminescence efficiency, and power efficiency. In this work, we present a simple and cost-effective method for fabricating flexible single- and multiple-layer films, and they can be detached and attached to the outside of OLEDs as a light-scattering and color-conversion layer. Light extraction efficiency is enhanced by forming low-density structures by using the reactive ion etching (RIE) process. As a result, the QD/PDMS composite film allowed for color conversion and achieved an excellent light extraction efficiency of up to 9.2%. Furthermore, the QD/PDMS composite film and greenish-blue OLED produced white light (CIEx,y = 0.28, 0.41), demonstrating the potential for application in broad areas, from flexible displays to lighting. The method provides a simple and cost-effective alternative to conventional processes. Full article
(This article belongs to the Special Issue Advanced Thin-Films: Design, Fabrication and Applications, Third Edition)
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10 pages, 1671 KB  
Article
Fabrication of Nanostructures on Surface of Micro-Lens Arrays Using Reactive Ion Etching
by Tae Jeong Hwang, Eun Jeong Bae, Geun-Su Choi and Young Wook Park
Micromachines 2025, 16(12), 1306; https://doi.org/10.3390/mi16121306 - 21 Nov 2025
Viewed by 703
Abstract
In this study, we fabricated a nanostructure on the surface of the micro-lens array (MLA), which is one of the light extraction technologies of organic light-emitting diodes (OLEDs), by performing the Reactive Ion -Etching (RIE) process. The MLA consists of a lensed area [...] Read more.
In this study, we fabricated a nanostructure on the surface of the micro-lens array (MLA), which is one of the light extraction technologies of organic light-emitting diodes (OLEDs), by performing the Reactive Ion -Etching (RIE) process. The MLA consists of a lensed area and a lens-less bottom (flat film area). We performed a systematic analysis to find ways to improve the light extraction efficiency of the MLA surface and flat film area. By controlling the RIE process time and type of gas plasma, nanostructures were formed on the surface of the MLA. O2 and CF4 gas plasmas resulted in nanostructures with tall heights and high aspect ratios, whereas CHF3 and Ar gas plasmas resulted in nanostructures with small heights and low aspect ratios. Furthermore, it was found that the nanostructures were not covered over the entire area, and the extent to which the nanostructures were distributed varied depending on the process time. As the RIE process time increases, the nanostructure expands from the top surface of the MLA to the flat film area. This limited the light extraction efficiency improvement. At a short process time of 50 s, nanostructures were formed only on the upper surface of the MLA hemisphere, which increased the light extraction efficiency. However, at long process times over 50 s, the surface of the hemisphere of MLA was covered with vertically aligned nanostructures, which decreased the efficiency. While the flat film area was covered with nanostructures at the longest process time of ~3200 s, it was effective, but the total efficiency was further decreased by the trade-off between them. As a result, the high-aspect-ratio nanostructured MLA patterned only on the top surface of the hemispherical MLA with a 50 s O2 plasma treatment showed the highest efficiency, which was slightly higher than that of the bare MLA. We expect that if the nanostructures can be formed in a direction perpendicular to the MLA surface and the flat film area simultaneously, the light extraction efficiency would be further improved. Full article
(This article belongs to the Special Issue Advanced Thin-Films: Design, Fabrication and Applications, Third Edition)
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14 pages, 2468 KB  
Article
Optimizing Annealing Temperature for Enhanced Electrical Performance and Stability of Solution-Processed In2O3 Thin-Film Transistors
by Taehui Kim, Seullee Lee, Ye-Won Lee, Dongwook Kim, Youngjun Yun, Jin-Hyuk Bae, Hyeonju Lee and Jaehoon Park
Micromachines 2025, 16(10), 1091; https://doi.org/10.3390/mi16101091 - 26 Sep 2025
Cited by 1 | Viewed by 1545
Abstract
This study investigates the influence of post-deposition thermal annealing temperature on the crystal structure, chemical composition, and electrical performance of solution-processed indium oxide (In2O3) thin films. Based on thermogravimetric analysis (TGA) of the precursor solution, annealing temperatures of 350, [...] Read more.
This study investigates the influence of post-deposition thermal annealing temperature on the crystal structure, chemical composition, and electrical performance of solution-processed indium oxide (In2O3) thin films. Based on thermogravimetric analysis (TGA) of the precursor solution, annealing temperatures of 350, 450, and 550 °C were adopted. The resulting In2O3 films were characterized using ultraviolet–visible (UV–Vis) spectroscopy, atomic force microscopy (AFM), Raman spectroscopy, and Hall-effect measurements to evaluate their optical, morphological, crystalline polymorphism, and electrical properties. The results revealed that the film annealed at 450 °C exhibited a field-effect mobility of 4.28 cm2/V·s and an on/off current ratio of 2.15 × 107. The measured hysteresis voltages were 3.11, 1.80, and 0.92 V for annealing temperatures of 350, 450, and 550 °C, respectively. Altogether, these findings indicate that an annealing temperature of 450 °C provides an optimal balance between the electrical performance and device stability for In2O3-based thin-film transistors (TFTs), making this condition favourable for high-performance oxide electronics. Full article
(This article belongs to the Special Issue Advanced Thin-Films: Design, Fabrication and Applications, Third Edition)
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