Special Issue "Metal and Metal-Oxide Film Deposition"

A special issue of Metals (ISSN 2075-4701).

Deadline for manuscript submissions: 20 March 2019

Special Issue Editors

Guest Editor
Prof. Dr. Marcus P. Rutner

Institute for Metal and Composite Structures, Hamburg University of Technology, Denickestr. 17, 21073 Hamburg, Germany
Website | E-Mail
Interests: metal joining; metal nanocomposites; microstructure modeling; nanostructured materials; deposition; welding
Guest Editor
Dr. Michael Störmer

Helmholtz-Zentrum Geesthacht, Centre for Materials and Coastal Research, Max-Planck-Strasse 1, 21502 Geesthacht, Germany
Website | E-Mail
Interests: thin-film preparation and characterization; large x-ray mirrors; free-electron lasers (FEL); thin-film metamaterials for high-temperature thermophotovoltaics (TPV); magnetron sputtering; physical vapour deposition (PVD); multilayers

Special Issue Information

Dear Colleagues,

This Special Issue invites most recent and novel approaches in the area of nanostructured materials, where our focus is, in particular, on metal and metal-oxide films. Nanostructured materials achieve on a nanoscale that cannot be achieved through macroscale structuring and design, while directly affecting the macroscale. Novel approaches of nanostructured materials related to fabrication, characterization methods, properties, underlying physics, numerical investigations or new applications are of interest to this Special Issue creating a platform for discussion and new thoughts in this important area. Metal and metal-oxide film deposition is of interest and applied across industries. Examples of active scientific work are thin-film metamaterials with unique properties, coatings with superior protecting properties, new sensing materials, or advanced multilayers, to name a few. Hence, we are inviting authors to reporting and discussing their newest findings in material science, engineering, biological and medical sciences, and physics.

Prof. Dr. Marcus P. Rutner
Dr. Michael Störmer
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Metals is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1500 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Metal and metal-oxide film deposition
  • nanostructured materials
  • multilayers
  • nanolaminates
  • thin-film metamaterials
  • superior material properties
  • nanosensors
  • processing
  • characterization

Published Papers (1 paper)

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Research

Open AccessArticle Thermal Stability of Ru–Al Multilayered Thin Films on Inconel 617
Metals 2018, 8(7), 514; https://doi.org/10.3390/met8070514
Received: 7 June 2018 / Revised: 28 June 2018 / Accepted: 2 July 2018 / Published: 4 July 2018
Cited by 1 | PDF Full-text (4941 KB) | HTML Full-text | XML Full-text
Abstract
Ru-riched and equiatomic Ru–Al multilayered thin films were fabricated on Si and Inconel 617 substrates. These thin films exhibited a multilayered structure that is caused by stacking cyclical gradient concentration through cosputtering. X-ray diffraction analysis indicated that the as-deposited Ru–Al multilayers comprised Ru [...] Read more.
Ru-riched and equiatomic Ru–Al multilayered thin films were fabricated on Si and Inconel 617 substrates. These thin films exhibited a multilayered structure that is caused by stacking cyclical gradient concentration through cosputtering. X-ray diffraction analysis indicated that the as-deposited Ru–Al multilayers comprised Ru and RuAl phases. Oxidation that is caused by annealing atmospheres and elements diffused from substrates was investigated. The results indicated that the inward diffusion of O at 600 °C in a 1% O2–99% Ar atmosphere was restricted by the formation of an amorphous Al-oxide sublayer, and inward diffusion of O at 800 °C in air was limited by the formation of a crystalline Al2O3 scale. Additionally, the outward diffusion of elements from Inconel 617 penetrated the unoxidized parts of the 800 °C–annealed Ru–Al multilayers. Full article
(This article belongs to the Special Issue Metal and Metal-Oxide Film Deposition)
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