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Lithography: Materials, Processes and Applications
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Lithography: Materials, Processes and Applications

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Advanced Nanomaterials and Nanotechnology".

Deadline for manuscript submissions: closed (20 October 2022) | Viewed by 6644

Special Issue Editor

Prof. JaeJong Lee

E-Mail Website
Guest Editor
Korea Institute of Machinery & Materials, Daejeon, Korea
Interests: sub-30nm level multilayer nanoimprint lithography systems; roll-based nanoimprint lithography systems; fabrication for 3D nano–micro hybrid structures and its applications; fabrication of nanobiosensors using nanopatterning lithography; fabrication of implantable medical devices

Special Issue Information

Dear Colleagues,

Nanopatterning with lithography has attracted significant research interest due to their potential for use in biosensors, implantable medical devices, anti-reflection and anti-fingerprint films, solar cells, nano and microfluidic channels, and some functional devices. The advantages of this simple process include low cost, high replication fidelity, and relatively high throughput and productivity. Papers in this Special Issue on “Lithography: Materials, Processes and Applications” will introduce and review recent advances in the field of the nanopatterning with lithography, from the fabrication processes and techniques to manufactured functional devices and their novel applications.

Prof. JaeJong Lee
Guest Editor

Manuscript Submission Information

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Keywords

  • Nanopatterning lithography process and systems
  • Fabrication of nano-biological sensors and devices for virus and bacteria
  • Functional implantable medical devices
  • Flexible functional films
  • Functional materials for medical, biological, and electrochemical devices
  • Novel applications using lithography

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Published Papers (4 papers)

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Research

16 pages, 5120 KiB  
Article
Nanolithographic Fabrication Technologies for Network-Based Biocomputation Devices
by Christoph R. Meinecke, Georg Heldt, Thomas Blaudeck, Frida W. Lindberg, Falco C. M. J. M. van Delft, Mohammad Ashikur Rahman, Aseem Salhotra, Alf Månsson, Heiner Linke, Till Korten, Stefan Diez, Danny Reuter and Stefan E. Schulz
Materials 2023, 16(3), 1046; https://doi.org/10.3390/ma16031046 - 24 Jan 2023
Cited by 4 | Viewed by 2440
Abstract
Network-based biocomputation (NBC) relies on accurate guiding of biological agents through nanofabricated channels produced by lithographic patterning techniques. Here, we report on the large-scale, wafer-level fabrication of optimized microfluidic channel networks (NBC networks) using electron-beam lithography as the central method. To confirm the [...] Read more.
Network-based biocomputation (NBC) relies on accurate guiding of biological agents through nanofabricated channels produced by lithographic patterning techniques. Here, we report on the large-scale, wafer-level fabrication of optimized microfluidic channel networks (NBC networks) using electron-beam lithography as the central method. To confirm the functionality of these NBC networks, we solve an instance of a classical non-deterministic-polynomial-time complete (“NP-complete”) problem, the subset-sum problem. The propagation of cytoskeletal filaments, e.g., molecular motor-propelled microtubules or actin filaments, relies on a combination of physical and chemical guiding along the channels of an NBC network. Therefore, the nanofabricated channels have to fulfill specific requirements with respect to the biochemical treatment as well as the geometrical confienement, with walls surrounding the floors where functional molecular motors attach. We show how the material stack used for the NBC network can be optimized so that the motor-proteins attach themselves in functional form only to the floor of the channels. Further optimizations in the nanolithographic fabrication processes greatly improve the smoothness of the channel walls and floors, while optimizations in motor-protein expression and purification improve the activity of the motor proteins, and therefore, the motility of the filaments. Together, these optimizations provide us with the opportunity to increase the reliability of our NBC devices. In the future, we expect that these nanolithographic fabrication technologies will enable production of large-scale NBC networks intended to solve substantially larger combinatorial problems that are currently outside the capabilities of conventional software-based solvers. Full article
(This article belongs to the Special Issue Lithography: Materials, Processes and Applications)
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17 pages, 6527 KiB  
Article
On the Fabrication and Characterization of Polymer-Based Waveguide Probes for Use in Future Optical Cochlear Implants
by Christian Helke, Markus Reinhardt, Markus Arnold, Falk Schwenzer, Micha Haase, Matthias Wachs, Christian Goßler, Jonathan Götz, Daniel Keppeler, Bettina Wolf, Jannis Schaeper, Tim Salditt, Tobias Moser, Ulrich Theodor Schwarz and Danny Reuter
Materials 2023, 16(1), 106; https://doi.org/10.3390/ma16010106 - 22 Dec 2022
Cited by 10 | Viewed by 2867
Abstract
Improved hearing restoration by cochlear implants (CI) is expected by optical cochlear implants (oCI) exciting optogenetically modified spiral ganglion neurons (SGNs) via an optical pulse generated outside the cochlea. The pulse is guided to the SGNs inside the cochlea via flexible polymer-based waveguide [...] Read more.
Improved hearing restoration by cochlear implants (CI) is expected by optical cochlear implants (oCI) exciting optogenetically modified spiral ganglion neurons (SGNs) via an optical pulse generated outside the cochlea. The pulse is guided to the SGNs inside the cochlea via flexible polymer-based waveguide probes. The fabrication of these waveguide probes is realized by using 6” wafer-level micromachining processes, including lithography processes such as spin-coating cladding layers and a waveguide layer in between and etch processes for structuring the waveguide layer. Further adhesion layers and metal layers for laser diode (LD) bonding and light-outcoupling structures are also integrated in this waveguide process flow. Optical microscope and SEM images revealed that the majority of the waveguides are sufficiently smooth to guide light with low intensity loss. By coupling light into the waveguides and detecting the outcoupled light from the waveguide, we distinguished intensity losses caused by bending the waveguide and outcoupling. The probes were used in first modules called single-beam guides (SBGs) based on a waveguide probe, a ball lens and an LD. Finally, these SBGs were tested in animal models for proof-of-concept implantation experiments. Full article
(This article belongs to the Special Issue Lithography: Materials, Processes and Applications)
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8 pages, 2733 KiB  
Article
Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat Nanoimprint Process
by Yeonjoo Ha, Hyungjun Lim, Hak-jong Choi and JaeJong Lee
Materials 2022, 15(17), 6036; https://doi.org/10.3390/ma15176036 - 1 Sep 2022
Cited by 4 | Viewed by 1789
Abstract
Nanoimprint lithography (NIL) is suitable for achieving high uniformity and mass production. However, in conventional NIL, a stamp suitable for the substrate size is required to increase the substrate size. To address this issue, we fabricated nanostructures on a large-area substrate using step-and-repeat [...] Read more.
Nanoimprint lithography (NIL) is suitable for achieving high uniformity and mass production. However, in conventional NIL, a stamp suitable for the substrate size is required to increase the substrate size. To address this issue, we fabricated nanostructures on a large-area substrate using step-and-repeat NIL after making a small stamp. A stamp was produced using glass, and a nano-pillar pattern with a diameter of 600 nm, an interval of 400 nm, and a height of 270 nm was used during the experiment. The area of the pattern on the stamp was 10 mm × 10 mm, and the step-and-repeat process was performed 25 times to transfer the nanostructures to a 4-inch substrate. In addition, stitch gaps were created between the patterns, which could decrease the performance upon future application. To minimize this stitch gap, a high-precision glass scale was attached to the stamp feeder to precisely control the position and to minimize the step difference. Moreover, an experiment was conducted to minimize the stitch gap by adjusting the movement interval of the stamp, and the stitch spacing was minimized by moving the stamp position by 9.97 mm. This approach will facilitate the manufacturing of large-area substrates and other structures in the future. Full article
(This article belongs to the Special Issue Lithography: Materials, Processes and Applications)
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10 pages, 3311 KiB  
Article
System for Fabrication of Large-Area Roll Molds by Step-and-Repeat Liquid Transfer Imprint Lithography
by Hyungjun Lim, Sanghee Jung, Junhyoung Ahn, Kee-Bong Choi, Geehong Kim, Soongeun Kwon and Jaejong Lee
Materials 2020, 13(8), 1938; https://doi.org/10.3390/ma13081938 - 20 Apr 2020
Cited by 2 | Viewed by 3618
Abstract
The effective production of nanopatterned films generally requires a nanopatterned roll mold with a large area. We report on a novel system to fabricate large-area roll molds by recombination of smaller patterned areas in a step-and-repeat imprint lithography process. The process is accomplished [...] Read more.
The effective production of nanopatterned films generally requires a nanopatterned roll mold with a large area. We report on a novel system to fabricate large-area roll molds by recombination of smaller patterned areas in a step-and-repeat imprint lithography process. The process is accomplished in a method similar to liquid transfer imprint lithography (LTIL). The stamp roll with a smaller area takes up the liquid resist by splitting from a donor substrate or a donor roll. The resist is then transferred from a stamp roll to an acceptor roll and stitched together in a longitudinal and, if necessary, in a circumferential direction. During transfer, the nanostructured resist is UV-exposed and crosslinked directly on the acceptor roll. The acceptor roll with the stitched and recombined stamp patterns is ready to be used as a large-area roll mold for roll-based imprinting. A system for this purpose was designed, and its operation was demonstrated taking the example of an acceptor roll of 1 m length and 250 mm diameter, which was covered by 56 patterned areas. Such a system represents an elegant and efficient tool to recombine small patterned areas directly on a large roll mold and opens the way for large-area roll-based processing. Full article
(This article belongs to the Special Issue Lithography: Materials, Processes and Applications)
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