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Plasma Processing, Synthesis, and Nanomaterials

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Materials Physics".

Deadline for manuscript submissions: closed (10 July 2023) | Viewed by 7491

Special Issue Editors


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Guest Editor
C&J Nyheim Plasma Institute, Drexel University, Philadelphia, PA 19104, USA
Interests: nanosecond-pulsed plasmas; atmospheric pressure non-thermal plasmas; plasmas in liquids

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Guest Editor
Department of Mechanical & Aerospace Engineering, George Washington University, Washington, DC 20052, USA
Interests: thin films and coatings; elementary plasma-surface processes; 2D materials; atmospheric plasmas; carbon nanostructures; plasma sources and diagnostics; plasma medicine
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Special Issue Information

Dear Colleagues,

The plasma treatment of materials is an important growing field which encompasses a broad spectrum of processes, from etching and deposition technologies to the synthesis of novel nanostructures that are otherwise impossible to obtain using conventional methods, and has a continuing impact in medicine, environmental and industrial applications, and electronics. Plasma-based material processing is enabled by the unique energy coupling in chemical reactions and physical processes with energetic electrons and excited neutral and charged species, light and high energy radiation, and electric fields and allows new and exciting opportunities for synthesis and functionalization of novel high-performance functional materials. 

This Special Issue is intended to focus on state-of-the art research trends in the field of plasma processing, synthesis, and characterization of materials, including the fundamental physical and chemical mechanisms as well as their applications. Additionally, we particularly welcome contributions focused on nanosynthesis via plasma techniques, such as plasma-enhanced chemical vapor deposition and atmospheric arc discharge. Research on nanomaterials production, such as graphene and nanotubes, and on the correlation between their properties and synthesis parameters, is a hot topic in view of the promising applications in mechanical parts, optics, electronics, and biomedicine. In summary, this Special Issue is expected to showcase the most recent advances from the plasmas, materials, and nanotechnology communities, with the aim to promote dialogue and collaboration within this vibrant, interdisciplinary field.

Prof. Dr. Danil Dobrynin
Dr. Carles Corbella Roca
Guest Editors

Manuscript Submission Information

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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Plasma processing
  • Nanotechnology
  • Nanomaterials
  • Plasma polymers
  • Plasma nanomaterial synthesis

Published Papers (4 papers)

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Research

11 pages, 4374 KiB  
Article
Synthesis of Silicon Nitride Nanoparticles by Upcycling Silicon Wafer Waste Using Thermal Plasma Jets
by Tae-Hee Kim, Seungjun Lee and Dong-Wha Park
Materials 2022, 15(24), 8796; https://doi.org/10.3390/ma15248796 - 09 Dec 2022
Cited by 1 | Viewed by 1234
Abstract
Silicon (Si) waste generation is a critical issue in the development of semiconductor industries, and significant amounts of Si waste are disposed via landfilling. Herein, we propose an effective and high value-added recycling method for generating nitride nanoparticles from Si waste, such as [...] Read more.
Silicon (Si) waste generation is a critical issue in the development of semiconductor industries, and significant amounts of Si waste are disposed via landfilling. Herein, we propose an effective and high value-added recycling method for generating nitride nanoparticles from Si waste, such as poor-grade Si wafers, broken wafers, and Si scrap with impurities. Si waste was crushed and used as precursors, and an Ar-N2 thermal plasma jet was applied at 13 kW (300 A) under atmospheric pressure conditions. A cone-type reactor was employed to optimize heat transfer, and Si waste was injected into the high-temperature region between the cathode and anode to react with free/split nitrogen species. Spherical Si3N4 nanoparticles were successfully synthesized using isolated nitrogen plasma in the absence of ammonia gas. The crystalline structure comprised mixed α- and β-Si3N4 phases with the particle size <30 nm. Furthermore, the influence of ammonia gas on nitridation was investigated. Our findings indicated that Si3N4 nanoparticles were successfully synthesized in the absence of ammonia gas, and their crystallinity could be altered based on the reactor geometry. Therefore, the as-proposed thermal plasma technique can be used to successfully synthesize high value-added nanopowder from industrial waste. Full article
(This article belongs to the Special Issue Plasma Processing, Synthesis, and Nanomaterials)
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20 pages, 4893 KiB  
Article
Statistically Optimized Production of Saccharides Stabilized Silver Nanoparticles Using Liquid–Plasma Reduction Approach for Antibacterial Treatment of Water
by Noor Ul Huda Altaf, Muhammad Yasin Naz, Shazia Shukrullah, Haq Nawaz Bhatti, Muhammad Irfan, Mabkhoot A. Alsaiari, Saifur Rahman, Usama Muhammad Niazi, Adam Glowacz, Klaudia Proniewska and Lukasz Wzorek
Materials 2021, 14(19), 5841; https://doi.org/10.3390/ma14195841 - 06 Oct 2021
Cited by 5 | Viewed by 2093
Abstract
Various conventional approaches have been reported for the synthesis of nanomaterials without optimizing the role of synthesis parameters. The unoptimized studies not only raise the process cost but also complicate the physicochemical characteristics of the nanostructures. The liquid–plasma reduction with optimized synthesis parameters [...] Read more.
Various conventional approaches have been reported for the synthesis of nanomaterials without optimizing the role of synthesis parameters. The unoptimized studies not only raise the process cost but also complicate the physicochemical characteristics of the nanostructures. The liquid–plasma reduction with optimized synthesis parameters is an environmentally friendly and low-cost technique for the synthesis of a range of nanomaterials. This work is focused on the statistically optimized production of silver nanoparticles (AgNPs) by using a liquid–plasma reduction process sustained with an argon plasma jet. A simplex centroid design (SCD) was made in Minitab statistical package to optimize the combined effect of stabilizers on the structural growth and UV absorbance of AgNPs. Different combinations of glucose, fructose, sucrose and lactose stabilizers were tested at five different levels (−2, −1, 0, 1, 2) in SCD. The effect of individual and mixed stabilizers on AgNPs growth parameters was assumed significant when p-value in SCD is less than 0.05. A surface plasmon resonance band was fixed at 302 nm after SCD optimization of UV results. A bond stretching at 1633 cm−1 in FTIR spectra was assigned to C=O, which slightly shifts towards a larger wavelength in the presence of saccharides in the solution. The presence of FCC structured AgNPs with an average size of 15 nm was confirmed from XRD and EDX spectra under optimized conditions. The antibacterial activity of these nanoparticles was checked against Staphylococcus aureus and Escherichia coli strains by adopting the shake flask method. The antibacterial study revealed the slightly better performance of AgNPs against Staph. aureus strain than Escherichia coli. Full article
(This article belongs to the Special Issue Plasma Processing, Synthesis, and Nanomaterials)
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8 pages, 1202 KiB  
Article
Synthesis of Highly Energetic PolyNitrogen by Nanosecond-Pulsed Plasma in Liquid Nitrogen
by Danil Dobrynin, Zhiheng Song and Alexander Fridman
Materials 2021, 14(15), 4292; https://doi.org/10.3390/ma14154292 - 31 Jul 2021
Cited by 2 | Viewed by 1727
Abstract
We report on an experimental study of nanosecond-pulsed plasma treatment of liquid nitrogen demonstrating synthesis of a highly energetic nitrogen material. Raman, FTIR analysis of gas phase products of decomposition, and the material explosion characteristics suggest synthesis of polymeric (amorphous) nitrogen compound which [...] Read more.
We report on an experimental study of nanosecond-pulsed plasma treatment of liquid nitrogen demonstrating synthesis of a highly energetic nitrogen material. Raman, FTIR analysis of gas phase products of decomposition, and the material explosion characteristics suggest synthesis of polymeric (amorphous) nitrogen compound which is stable at ambient pressure up to temperatures of about −150 °C. Addition of adsorbents with relatively large characteristic pore sizes (>5 nm) allows marginally improved recovery of the material as determined by temperature-dependent Raman measurements. By analyzing the shock wave propagation resulting from the explosions, we estimated the energy density of the material to be 13.3 ± 3.5 kJ/g, close to the previously predicted value for amorphous polymeric nitrogen. Full article
(This article belongs to the Special Issue Plasma Processing, Synthesis, and Nanomaterials)
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12 pages, 2190 KiB  
Article
ZrN Phase Formation, Hardening and Nitrogen Diffusion Kinetics in Plasma Nitrided Zircaloy-4
by Robert Balerio, Hyosim Kim, Andres Morell-Pacheco, Laura Hawkins, Ching-Heng Shiau and Lin Shao
Materials 2021, 14(13), 3572; https://doi.org/10.3390/ma14133572 - 25 Jun 2021
Cited by 5 | Viewed by 1672
Abstract
Plasma nitridation was conducted to modify the surfaces of Zircaloy-4. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and Raman analysis were used to characterize microstructures and phases. Surface indentation and cross-sectional indentation were performed to evaluate mechanical property changes. Nitridation forms a [...] Read more.
Plasma nitridation was conducted to modify the surfaces of Zircaloy-4. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and Raman analysis were used to characterize microstructures and phases. Surface indentation and cross-sectional indentation were performed to evaluate mechanical property changes. Nitridation forms a thin layer of ZrN phase, followed by a much deeper layer affected by nitrogen diffusion. The ZrN phase is confirmed by both TEM and Raman characterization. The Raman peaks of ZrN phase show a temperature dependence. The intensity increases with increasing nitridation temperatures, reaches a maximum at 700 °C, and then decreases at higher temperatures. The ZrN layer appears as continuous small columnar grains. The surface polycrystalline ZrN phase is harder than the bulk by a factor of ~8, and the nitrogen diffusion layer is harder by a factor of ~2–5. The activation energy of nitrogen diffusion was measured to be 2.88 eV. The thickness of the nitrogen-hardened layer is controllable by changing the nitridation temperature and duration. Full article
(This article belongs to the Special Issue Plasma Processing, Synthesis, and Nanomaterials)
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