Special Issue "Thin Films and Nanostructures by MOCVD: Fabrication, Characterization and Applications"

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".

Deadline for manuscript submissions: 28 February 2021.

Special Issue Editor

Dr. Massimo Longo
Website
Guest Editor
Institute for Microelectronics and Microsystems, National Research Council (CNR-IMM), Agrate Brianza, Italy
Interests: MOCVD; chalcogenides; phase change memories; epitaxy; nanostructures

Special Issue Information

Dear Colleagues,

Metalorganic Chemical Vapor Deposition (MOCVD), introduced by Manasevit in 1968, has been attracting continuous interest, being related to the study and fabrication of many devices, ranging from optoelectronics, microelectronics, sensors, and detectors, to energy harvesting. Nowadays, the scientific and commercial importance of MOCVD is well recognized, since it yields state-of-the art devices that benefit from high process control, and a large variety of good quality materials (either thin films, multilayers, or low-dimensional structures), which can be grown with excellent doping control, large area deposition, and easy industrial transferability. Moreover, being a chemical deposition technique, MOCVD enables conformal growth with relatively low costs and convenient deposition rates, which is particularly useful when the film coating of complex substrate recesses or nanostructures is required. All these advantages cannot be easily found in other advanced deposition techniques. Indeed, different devices of commercial interest are grown by MOCVD, such as light emitting diodes (LEDs), high-efficiency solar cells, and infrared detectors. Efforts to improve the performance of materials and devices grown by MOCVD are being mainly directed toward the realization of better reactors, novel and less harmful chemical precursors, higher material uniformity, implementation of in-situ characterization, and larger area growth.

The scope of this Special Issue is to gather different contributions from different areas of MOCVD research activity, to provide an overview of the most recent results and discoveries, with a special focus on materials functionality, thus providing an update on how this important technique is evolving and what the future trends are. Therefore, contributions will be welcome on the following topics:

  • III-V and nitride semiconductors and devices;
  • II-VI semiconductors and devices;
  • Group IV semiconductors and devices;
  • IV-V-VI semiconductors and devices;
  • Functional and smart complex oxides;
  • Structural and functional coatings;
  • Epitaxy, multilayered materials, and nanocomposites;
  • Nanowires and nanodots;
  • 2D materials and Van der Waals heterostructures;
  • Materials for energy conversion;
  • Topological insulators, and materials for spintronics;
  • Materials for information and communication technology;
  • Surface chemistry, catalyzed growth, and selective area deposition;
  • Process simulation and in-situ monitoring.

Dr. Massimo Longo
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • MOCVD
  • MOVPE
  • thin films
  • nanostructures
  • multilayers
  • 2D materials
  • functional coatings

Published Papers

This special issue is now open for submission.
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