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Ultraviolet Light Research and Fabrication
This special issue belongs to the section “Optics and Lasers“.
Special Issue Information
Dear Colleagues,
It is a great pleasure, and an honor, to present this Special Issue of Applied Sciences. This is a feature issue to present recent advances and future prospects of this key, fundamental, research area, especially on deep ultraviolet light and semiconductor exposure equipment.
You are cordially invited to submit your original research or review papers to this Special Issue. All papers need to present original, previously-unpublished work and will be subject to the normal standards and peer-review processes of this journal.
Potential topics include, but are not limited to:
- Ultraviolet light source;
- Deep ultraviolet light source;
- Increase of light extraction efficiency;
- Material of deep ultraviolet light;
- Increase of ultraviolet epitaxy quality;
- Ultraviolet epitaxy structure design;
- Ultraviolet light fabrication;
- Deep ultraviolet light in biomedical research.
Dr. Zhi Ting Ye
Prof. Cheng-Huang Kuo
Prof. Chun-Liang Lin
Prof. Lung-Chien Chen
Prof. Hao Chung Kuo
Prof. Hsiang-Chen Wang
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Applied Sciences is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- Ultraviolet light source
- Deep ultraviolet light source
- Increase of light extraction efficiency
- Material of deep ultraviolet light
- Increase of ultraviolet epitaxy quality
- Ultraviolet epitaxy structure design
- Ultraviolet light fabrication
- Deep ultraviolet light in biomedical research.
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Published Papers
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